The invention relates to the technical field of
resistor chips, in particular to a method and a
system for optimizing a manufacturing process of a
thermistor chip. According to the method, multi-scale process entropy analysis is carried out on a process parameter dynamic flow, the
coupling strength between key processes is analyzed, and a process parameter cluster with strong non-monotonic correlation and a process
system entropy increase path of the process parameter cluster are identified, so that a collaborative stability domain
boundary model is constructed; according to transient fluctuation characteristics extracted from a process parameter dynamic flow obtained in real time, in combination with the collaborative stability domain
boundary model, determining a parameter subset exceeding a collaborative stability operation interval as a drift parameter cluster, executing an optimization
instruction set to perform trial production, synchronously collecting collaborative trajectory data of a process parameter cluster, and performing collaborative trajectory prediction; and the collaborative stability is verified by calculating the entropy change rate of the process
system and is fed back to the collaborative stability domain
boundary model for boundary
toughness strengthening, dynamic collaborative convergence of relevant parameters such as the
sintering gradient and the
electrode pressure is achieved, and the product consistency and the yield stability are improved.