37results about How to "Continuous movement" patented technology

The object of the invention is a control arrangement of a transport system and a method in connection with a transport system. The transport system comprises a motor (2) for moving the transport appliance; a power supply circuit (5) of the motor, said power supply circuit being connected between the motor and a power source (4) that is limited (Plim) in its dimensioning; an energy storage that is limited (Elim) in its capacity fitted in connection with the power supply circuit of the motor, for supplying power between the energy storage and the power supply circuit (5) of the motor. The control arrangement comprises a determination (7) of the charging status (EQ) of the energy storage; a determination (8) of the movement reference of the transport appliance; and also a control (9) of the movement of the transport appliance as a response to the determined movement reference (10) of the transport appliance. The movement reference (10) of the transport appliance is determined on the basis of the amount of energy that can be discharged from the energy storage (6) and / or on the basis of the amount of energy that can be charged into the energy storage as well as on the basis of the travel distance (11, 11') of the transport appliance.

A bathtub device provided with a bathtub (2), a water discharge section (3), a water discharge drive section (4), and a control section (5). The bathtub has a first bathtub wall surface and a second bathtub wall surface provided facing the first bathtub wall surface. The water discharge section is provided to the second bathtub wall surface and discharges a water jet flow to the foot soles of a person bathing in the bathtub. The water discharge drive section is connected to the water discharge section and adjusts the flow rate of the water jet flow discharged from the water discharge section. The control section controls the water discharge drive section. The control section controls the water discharge drive section to cause the water discharge section to intermittently discharge a water jet flow having strength capable of actively bending a leg of the person bathing in the bathtub by the water jet flow.

The invention discloses a flat-type opening and closing transmission device for mechanical transportation, comprising a transmission device main body, a first pusher is arranged on one side of the inner end of the transmission device main body, and the side ends of the first pusher are engaged and connected in position There are first drive teeth and second drive teeth, the center position of the first drive teeth is rotatably connected with a first guide rod, and the center position of the second drive teeth is rotatably connected with a second guide rod, the first push rod A second pusher is rotatably connected to the front end of the element, a base frame is provided at the bottom of the first and second drive teeth, and the first pusher includes an action end, a drive end and a drive end. The acting end is slidably connected to one side of the inner end of the first pushing member, and the side end position of the acting end is rotatably connected to the driving end. The invention is a flat type opening and closing transmission device for mechanical transportation, and the purpose of opening and closing the inner end is realized by the arrangement of the first pusher and the second pusher.

The invention provides a sulfuryl fluoride reaction device, comprising a reaction chamber and a heat exchange chamber, the reaction chamber and the heat exchange chamber are arranged at intervals; the gas inlet of the heat exchange chamber is connected with the gas outlet of a reaction chamber, and the gas outlet of the heat exchange chamber It is connected to the gas inlet of another reaction chamber; a packing layer is arranged in the reaction chamber, and the packing layer is detachably connected with the inner wall of the reaction chamber; a vertical heat exchange tube is arranged in the heat exchange chamber, and an air inlet pipe is connected to the top of the heat exchange tube. The bottom end of the heat exchange tube is connected with an air outlet pipe; a filter plate is installed between the vertical heat exchange tubes, and the filter plate is detachably connected with the outer wall of the vertical heat exchange tube. Using this device for the synthesis of sulfuryl chloride can effectively prevent the activity of the packing layer from being affected by the high temperature of the process gas and ensure the yield of sulfuryl fluoride; the device can effectively reduce the particulate impurities in the process gas and prevent the particulate impurities from entering the next reaction The chamber affects the composition and structure of the packing, ensuring the consistent quality of sulfuryl fluoride produced by the synthesis device and ensuring the quality of the product.

The invention discloses a wafer cleaning and drying method, which comprises: the wafer enters the box and is completely immersed in the cleaning liquid, the bottom is supported and limited by a fixed support seat; a horizontal limiting mechanism moves vertically upwards to limit the swing of the wafer ; The propulsion mechanism moves vertically upwards for the first stroke to contact the wafer. The first stroke is the distance between the propulsion mechanism and the wafer; the propulsion mechanism moves upward with the wafer, and the horizontal limit mechanism moves upward in coordination, and maintains contact with the wafer. In the contact state, to limit the tilt of the wafer, the wafer moves upward continuously and extends out of the liquid surface, and the spray mechanism sprays dry gas on the wafer; when the horizontal limit mechanism is close to the liquid surface, it stops moving upward, and the propulsion mechanism keeps moving upward at this time , to ensure the continuous upward movement of the wafer until the wafer is completely detached from the cleaning solution. The invention also discloses a wafer cleaning and drying mechanism. The wafer of the present invention is in contact with the bottom propulsion mechanism from the beginning of rising, so as to ensure that the wafer is continuously sent out under force all the time, and the cleaning effect is guaranteed.