The application relates to the technical field of semiconductors, and particularly discloses a
MOSFET device with low gate charge and a preparation method thereof, which comprises a P-type
Si substrate, a
LOCOS isolation layer, a shallowly-buried P-type
electric field regulating layer under a channel, a transversely-doped gradient channel, a
gate dielectric layer, a main gate, a shielding gate structure, an asymmetric LDD region, a source-side
doping concentration of 1*10 18 cm ‑3 , a width of 0.1 mu m and a depth of 50 nm, a drain-side
doping concentration of 5*10 17 cm ‑3 , a width of 0.15 mu m and a depth of 50 nm, two-stage stepped grooves in a drain region, a source-drain heavily-doped region and a
metal electrode comprising a source, a main gate, a shielding gate and a drain. The application reduces the gate-drain
coupling capacitance and the
gate capacitance, suppresses the
Miller effect, reduces the gate driving loss by combining the ultrathin gate and the NiSi
silicide, simultaneously suppresses the sub-threshold leakage, doubly reduces the static and dynamic
power consumption and prolongs the endurance of a sensor.