The invention discloses an
etching pattern consistency evaluation method based on
image texture features, and particularly relates to the technical field of
etching pattern evaluation, which comprises the following steps: acquiring an etched
wafer surface image, and carrying out
wafer identification, batch identification,
etching machine table identification and cavity identification, formula version identification, acquisition
point location information and acquisition
timestamp binding; generating an
imaging quality vector and calculating an imaging credibility gating quantity; performing pattern unit positioning, geometric alignment and scale normalization to obtain a standardized ROI image, and dividing
pattern type layers according to
layout type information or structural density indexes; constructing a texture reference version under the management
granularity, performing benchmarking, calculating a consistency
score, and calculating a drift credibility comprehensive quantity in a
sliding time window to judge slow drift; and during triggering, generating a candidate texture reference version, comparing the candidate texture reference version with a shadow of the currently effective texture reference version, determining version switching and recording a version chain relationship based on the shadow comparison security comprehensive quantity, or freezing, updating and outputting a closed-
loop control suggestion.