1 results about "Pattern type" patented technology

The application discloses a fabric layout automatic layout and merging method, system, medium and processor, and relates to the technical field of fabric cutting and pattern layout. The method receives a graphic data set and extracts key geometric features, identifies pattern types and matches corresponding layout strategies, realizes automatic close arrangement and position optimization of graphics, and generates a layout set containing coordinates and rotation angles. Then, the common edges of adjacent graphics are automatically identified and merged, and the graphic set is converted into a non-redundant line segment path, which is directly used for cutting. The application effectively reduces material waste and cutting path length, improves cutting efficiency and product quality, is suitable for batch automatic production, and has high practical value.