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142 results about "First flush" patented technology

First flush is the initial surface runoff of a rainstorm. During this phase, water pollution entering storm drains in areas with high proportions of impervious surfaces is typically more concentrated compared to the remainder of the storm. Consequently, these high concentrations of urban runoff result in high levels of pollutants discharged from storm sewers to surface waters.

Method and device for jointly separating hydrogen through pressure swing adsorption and unpowered membrane separation

The invention discloses a method for jointly separating hydrogen through pressure swing adsorption and unpowered membrane separation. The method comprises a one-stage pressure swing adsorption, a two-stage pressure swing adsorption and a regeneration step, wherein the regeneration step specifically comprises the following steps that: reverse release is carried out after uniform pressure drop of a one-stage pressure swing adsorption tower, the reverse release is carried out after the uniform pressure drop of a two-stage pressure swing adsorption tower, the one-stage pressure swing adsorption tower is subjected to the first washing by the reverse gas release of the two-stage pressure swing adsorption tower, uniform pressure rise of the two-stage pressure swing adsorption tower is carried out, then the two-stage pressure swing adsorption tower is subjected to high-pressure washing by using hydrogen, and at the same time, the high-pressure washing gas is introduced in a membrane separation device, permeate gas with high hydrogen content is recycled, un-permeate gas is used for carrying out the second washing on the one-stage pressure swing adsorption tower, and the one-stage pressure swing adsorption tower is subjected to the uniform pressure rise after the washing is accomplished. The invention further discloses a device for jointly separating hydrogen through pressure swing adsorption and unpowered membrane separation. The method and device have the advantages of high yield, high hydrogen purity, low cost investment and low energy consumption.
Owner:SICHUAN TECHAIRS

Slurry loop circulation system for slurry shield

The invention discloses a slurry loop circulation system for slurry shield. The slurry loop circulation system comprises an excavation bin and an air cushion bin, a slurry inlet pump is connected witha main slurry inlet pipeline, the main slurry inlet pipeline communicates with the excavation bin through a plurality of first shunt slurry inlet pipelines, and the lower side of the air cushion bincommunicates with the main slurry inlet pipeline through a plurality of second shunt slurry inlet pipelines; the lower side of the excavation bin communicates with a main slurry discharging pipeline through first shunt slurry discharging pipelines, and the lower side of the air cushion bin communicates with the main slurry discharging pipeline through second shunt slurry discharging pipelines; a first flushing system is connected to the position between a cutterhead panel and the main slurry inlet pipeline, the tops of a stirrer, a slurry door and the excavation bin are connected with a secondflushing system, and the main slurry inlet pipeline communicates with the main slurry discharging pipeline through a by-pass pipeline; and an output end opening of the slurry inlet pump and an inputend opening of a slurry discharging pump are provided with sensors correspondingly, a ball valve and the sensors are connected with a control system, by optimizing the slurry circulation mode, standbypipelines are additionally arranged to improve the treatment efficiency of slurry, and the plugging probability of a slurry outlet is reduced.
Owner:CHINA RAILWAY 16 BUREAU GRP BEIJING METRO ENG CONSTR +1

Intelligent closestool and nozzle device capable of spraying swirling water current of intelligent closestool

The invention discloses an intelligent closestool and a nozzle device capable of spraying swirling water current of the intelligent closestool. The nozzle device comprises a base and a bottom cover, wherein an inner spray nozzle is arranged on the base and is communicated with an inlet at the tail of the base through a channel at the bottom of the base; a swirling chamber with a conical surface at the top is arranged between the inner spray nozzle and the channel; a conical lug pillar is arranged on the bottom cover corresponding to the center of the bottom of the swirling chamber; the channel comprises a first channel and a second channel; the first channel is tangentially communicated with the swirling chamber along the side wall of the swirling chamber; and the second channel is radially communicated with the swirling chamber along the conical lug pillar. Due to the adoption of the swirling chamber with the lug pillar and two channels, two strands of water current form a swirling water jet with an axial speed, a radial speed and a tangential speed during confluence; the stripped cleaning for stubborn dirt can be finished by using a normal impact force and a tangential stripping force of the swirling jet and the first-time flushing effect after defecation is improved; low water-pressure spin also brings excellent comfort to people; and no small droplet in the swirling water jet splashes so as to prevent other parts of a human body from being wetted.
Owner:NINGBO SOOJEE SANITARY WARE

Method for washing NF membranes and RO membranes

The invention discloses a method for washing NF/RO membranes. The method comprises the steps: S1. subjecting an NF or RO membrane to circulating alkali cleaning with an alkaline cleaning solution of specific ingredients, stopping circulating until the temperature of the cleaning solution reaches 38 DEG C to 39 DEG C, subjecting the membrane to soaking and cooling treatment, and then, continuing tocarry out circulating alkali cleaning, wherein a pH value is controlled to 10.5 to 11 during alkali cleaning; S2. carrying out first flushing on the membrane obtained in the step S1 with product water; S3. subjecting the membrane obtained in the step S2 to circulating acid cleaning with an acidic cleaning solution of specific ingredients, stopping circulating until the temperature of the cleaningsolution reaches 38 DEG C to 39 DEG C, subjecting the membrane to soaking and cooling treatment, and then, continuing to carry out circulating acid cleaning treatment, wherein a pH value is controlled to 2 to 3 during acid cleaning; and S4. carrying out second flushing on the membrane obtained in the step S3 with product water. According to the method, the damage to the membranes can be reduced,the process operations are simple, the pertinency of chemicals is high, the washing effect is good, and thus, the physicochemical properties and treatment capacity of the NF or RO membranes can be restored to the maximum.
Owner:HUNAN JUNXIN ENVIRONMENTAL PROTECTION CO LTD

Semiconductor chip cleaning system

The present invention related to a semiconductor wafer cleaning system comprising a preliminary cleaning station for removing particles on a wafer in advance by spraying deionized water thereon; a first cleaning station for cleaning remaining particles firstly by rotating frictionally a pair of brushes disposed to be contacted with a front surface and a back surface of the wafer and by spraying chemicals thereon through a chemical sprayer being provided independently; a first rinsing station for rinsing by spraying a cleaning liquid onto the firstly cleaned wafer at the first cleaning station; a second cleaning station for cleaning particles secondly remained on the front surface and the back surface of the wafer by spraying the chemicals onto the firstly rinsed cleaned wafer at the first rinsing station through a chemical sprayer being provided independently using the same structure and manner as those of the first cleaning station; a second rinsing station for rinsing by spraying the cleaning liquid onto the secondly cleaned wafer at the second cleaning station; and a dry station for drying the remained cleaning liquid using centrifugal force generated by rotating the rinsed wafer at the second rinsing station at a high speed. According to the present invention, a waiting time of entry into each cleaning station is minimized by processing a cleaning operation and a rinsing operation of a surface-polished wafer in a cleaning station and a rinsing station which are provided separately and independently thereby improves wafer productivity significantly by solving a delayed phenomenon in a whole process of wafer manufacturing.
Owner:K C TECH

Anti-blocking blocking-relieving method and apparatus for coke oven flue gas SCR (selective catalytic reduction) denitration catalyst

The invention relates to an anti-blocking blocking-relieving method and apparatus for coke oven flue gas SCR (selective catalytic reduction) denitration catalyst. One side of a lower ash bucket of a denitration reactor is provided with a flue gas inlet, the other side of the top end of an upper straight barrel is provided with a purified flue gas outlet, a metal strainer and multiple layers of denitration catalyst are arranged in the upper straight barrel sequentially from bottom to top, a first flushing pipe is arranged above the metal strainer, a second flushing pipe and a heating air pipe are arranged above each layer of denitration catalyst, the first flushing pipe and the second flushing pipes are connected with an external flushing water supply device through a pressure pump after being communicated, the heating air pipes are connected with an external heating device after being communicated, and the bottom of the lower ash bucket is provided with a drain valve. The metal strainer is disposed at the front of the denitration catalyst to intercept ammonia salts and sticky particles in the coke oven flue gas and prevent blocking of the denitration catalyst; the flushing pipes are arranged above the denitration catalyst to flush blockage; therefore, efficient denitration of the denitration catalyst is guaranteed, and the life of the denitration catalyst is extended.
Owner:ACRE COKING & REFRACTORY ENG CONSULTING CORP DALIAN MCC
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