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This invention discloses an exposure method and apparatus for a holographic two-dimensional grating, as well as a method for calculating the exposure beam, relating to the field of holographic two-dimensional grating technology. The method for calculating the exposure beam includes determining the wave vectors k1 and k2 of the exposure beam of the three-dimensional grating vector KG1 and the wave vectors k1 and k3 of the exposure beam of the three-dimensional grating vector KG2 based on the three-dimensional grating vector KG1 and the three-dimensional grating vector KG2. Wave vector k1 is the wave vector of the common exposure beam of the three-dimensional grating vectors KG1 and KG2. An inclined vector is introduced and a vector triangle is constructed for rotation and iterative calculation, thereby realizing the single exposure of three beams of a holographic two-dimensional grating with two three-dimensional grating vectors. The exposure method and apparatus are set according to the parameters of the exposure beam obtained by the calculation method, solving the problem that the fabrication of a holographic two-dimensional grating requires multiple exposures with two beams, which is difficult to operate.