31results about How to "Process does not affect" patented technology

The invention relates to a comprehensive electroplating wastewater treatment method. The electroplating wastewater is divided into six brand-new classes, a chemical and biochemical combined process is adopted, a separate system drainage pipe network is adopted, the electroplating wastewater is divided into ink wastewater, complex wastewater, pretreatment wastewater, cyanogen-containing wastewater, chromium-containing wastewater and common electroplating wastewater, the six classes of wastewater respectively flows into respective underground adjusting tank through the pipe network, and is treated by respective process, and the effluent is discharged after reaching a standard. Because of the scientific water separating and stepwise pretreatment of a front-end chemical treatment part, different pollutants are respectively removed in different process sections according to characteristics, crossed enrichment and mutual reaction of the different pollutants are reduced to the greatest extent, and the pressure of microorganisms in the biochemical process is reduced. Treatment facilities for the six classes of wastewater are mutually connected and relatively dependent, and when inlet water quality fluctuates, a corresponding section is only required to be adjusted, the whole process is not influenced, the management is scientific and orderly, and operational risks are reduced.

The invention provides a method and a device for controlling processes of abnormal pages. The method comprises the following steps: acquiring a page address list of the abnormal pages, wherein the abnormal pages comprise pages which cause a browser to be broken down and/or jammed; judging whether a page address which a user requests to access is in the page address list; and if yes, creating a page independent subprocess by a browser host process and rendering a page corresponding to the page address which the user requests to access by the page independent subprocess. According to the invention, the normal use of the browser can be protected from influences when the user accesses the high risk page.

An embodiment is a method including forming a first gate over a substrate, the first gate having first gate spacers on opposing sidewalls, forming a first hard mask layer over the first gate, forming a second hard mask layer over the first hard mask layer, the second hard mask layer having a different material composition than the first hard mask layer, forming a first dielectric layer adjacent and over the first gate, etching a first opening through the first dielectric layer to expose a portion of the substrate, at least a portion of the second hard mask layer being exposed in the first opening, filling the first opening with a conductive material, and removing the second hard mask layer and the portions of the conductive material and first dielectric layer above the first hard mask layer to form a first conductive contact in the remaining first dielectric layer. The invention also provides a self alignment contact scheme, a semiconductor device and a method for manufacturing the same.

The invention provides a method for forming a non-planar transistor. The method includes: firstly, providing a substrate defining an active region and a peripheral region, with a plurality of ultra-shallow channel isolators connected to the active region of the substrate; secondly, removing the ultra-shallow channel isolators to expose part of a sidewall of the substrate; forming a conductive layer on the active region and the peripheral region on the substrate to cover the part of the sidewall of the substrate; patterning the conductive layer to allow the conductive layer to form a gate of a planar transistor in the peripheral region and form a gate of at least one non-planar transistor in the active region; and forming a source and a drain on two sides of the gate of each non-planar transistor.

The invention discloses a device and a process for preparing dimethyl carbonate. The device comprises a reactive distillation column and an extractive distillation column. A methyl alcohol inlet and a propylene carbonate inlet of the reactive distillation column are arranged on the side of the reactive distillation column. A column top outlet of the reactive distillation column is arranged at the top of the reactive distillation column, and a column bottom outlet of the reactive distillation column is arranged at the bottom of the reactive distillation column. A raw material inlet and an extraction agent inlet of the extractive distillation column are arranged on the side of the extractive distillation column. A column top outlet of the extractive distillation column is arranged at the top of the extractive distillation column, and a column bottom outlet of the extractive distillation column is arranged at the bottom of the extractive distillation column. The column top outlet of the reactive distillation column is connected with the raw material inlet of the extractive distillation column. The column top outlet of the extractive distillation column is connected with the methyl alcohol inlet of the reactive distillation column. The device and the process have the advantages that the process is simple and good in effect, operability is high, industrial production is easy to expand, and market prospect is wide.

The invention discloses a process for removing impurities in calcium hydrogen phosphate, which is characterized in that: it consists of the following steps: preparation of ore pulp, acidolysis reaction, crystallization to remove impurities, one-stage neutralization, crystallization to remove impurities, second-stage neutralization, and three-stage One-stage neutralization, which is characterized in that under the condition of controlling the reaction pH, the process of crystallization and impurity removal is added before the process of one-stage neutralization and two-stage neutralization, so that the impurities existing in the liquid gradually form crystals during the flow process Reduce impurities.

The invention discloses a network resource conflict processing method, device and equipment and a storage medium. The method comprises the following steps: querying a target virtual machine associated with a network resource when determining that the resource conflict occurs when the network resource is allocated to a virtual machine to be created currently; judging whether the target virtual machine is deleted or not; and if the target virtual machine is deleted, releasing the network resources. According to the method and the device, under the condition that the network resources provided for the virtual machine to be created currently are determined to have conflicts, whether the target virtual machine is deleted or not is judged by querying the target virtual machine, and when the target virtual machine is determined to be deleted, the network resources are released, so that the situation that the network resources are deleted under the condition that the network resources are remained is avoided; if a virtual machine is created subsequently and the same network resource as the network resource remaining before is created for the virtual machine, the problem of network resource conflict occurs.

The embodiment of the invention provides a method for processing processes in containers. The method is used for a physical machine. The multiple containers are deployed on the physical machine. The physical machine comprises a watchdog driver. The watchdog driver receives a first operation instruction of the first container through a device file dev, wherein the first operation instruction includes a first process identifier (PID), and the first PID represents that the first operation instruction is issued under the first process in the first container; a first namespace corresponding to thefirst container is determined according to the first PID; all the processes in the first container are deleted according to the first namespace. Thus, the watchdog driver can delete all the processesin the specific container through the determined namespace of the container without influencing the processes in the other containers, and the process processing of container granularity is realized.

The invention relates to a power MOS device and a manufacturing method thereof. The power MOS device comprises a semiconductor substrate. The first surface of the semiconductor substrate is provided with an epitaxial layer. The epitaxial layer includes a drift region and a well region and a source region located on the drift region. The second surface of the semiconductor substrate is provided with a drain metal layer, wherein a conductive plug is arranged in the semiconductor substrate and the resistivity of the conductive plug is less than that of the surrounding semiconductor substrate. Theconductive plug is arranged so that the effect of reducing the on-resistance can be achieved without excessively thinning the semiconductor substrate and the on-resistance of the power MOS device canbe reduced and the reliability of the device can also be improved.

The invention provides a method for dragging a cement production line rotating machine by adopting a steam turbine. The method comprises the steps: A, a driving part of the rotating machine adopts the steam turbine; B, a steam boiler produces steam and fees the steam into the steam turbine through a pipe; C, the steam turbine drives the rotating machine to rotate; D, dead steam produced by the steam turbine in working is discharged into a coagulator; E, water coagulated by the coagulator is fed into a deaerator; F, deoxidized water in the deaerator is fed into a deoxidizing water tank; G, water in the deoxidizing water tank is fed into the steam boiler; H water in the steam boiler is heated to form steam and the steam is fed into the steam turbine. A high-power high-voltage electric motor is replaced by the steam turbine, the output rotation speed and power of the steam turbine can be adjusted by adjusting the steam quantity of the boiler, the power requirement of the rotating machine is met, stepless speed regulation is achieved, energy consumption is reduced, and throttle and low-efficiency loss caused by process parameter adjustment in the cement production process are reduced.