108results about How to "Reduce measurement bias" patented technology

To provide a consistent, high-speed, high-precision measurement method based on an electron beam simulation by reflecting the apparatus characteristics of a CD-SEM in an electron beam simulation, the present invention discloses a method for measuring a measurement target pattern with a CD-SEM, the method comprising the steps of performing an electron beam simulation on various target pattern shapes, which is reflected apparatus characteristic and image acquisition conditions; creating SEM simulated waveforms; storing a combination of the created SEM simulated waveforms and pattern shape information corresponding to the created SEM simulated waveforms as a library; comparing an acquired actual electron microscope image with the SEM simulated waveforms; selecting the SEM simulated waveform that is most similar to the actual electron microscope image; and estimating the shape of the measurement target pattern from the pattern shape information corresponding to the selected SEM simulated waveform.

A detecting apparatus and method of a robot cleaner is disclosed. The apparatus includes a detecting unit provided with a transmitting unit for sending a signal to detect the floor and a receiving unit for receiving a signal sent from the transmitting unit to be reflected on the floors an optic angle adjusting unit disposed at least one of the transmitting unit and the receiving unit and configured to adjust optic angles of the signals, and a light shielding unit configured to partially shield a signal sent through the optic angle adjusting unit in order to reduce a deviation of each signal of the transmitting unit and the receiving unit. Accordingly, a measurement deviation with respect to color and feel of the floor can be reduced. Also, an amount of light received at the receiving unit can be obtained as much as required, which allows an accurate detection of the detecting apparatus. In addition, even if there are both drop-off and bump on the floor, the robot cleaner can smoothly operate.

The invention relates to a method for manufacturing a semiconductor three-dimensional Hall sensor suitable for a high-temperature working environment, belonging to the field of semiconductor magneticsensors. The technical solution is that all main electrodes and sensing electrodes of the three-dimensional Hall sensor are integrated on the surface of a single semiconductor material, each electroderegion is defined by the photolithography technology and an electrode deposition window is formed, a multilayer metal film ohmic contact electrode is grown by using a common metal deposition technique, and the alloy annealing process is optimized to form metal / semiconductor ohmic contact. The method has the advantages that the electrode regions are effectively isolated, the measurement sensitivity of a device can be improved while the leakage current of the device is effectively suppressed, since the spatial three-dimensional magnetic field detection can be realized in the same semiconductor,a Hall sensor chip in the invention has advantages of simple package, small size and low cost, and the sensor can work normally in an environment with high temperature above 300 DEG C and other extreme environments such as high pressure and high radiation and still maintain good linearity.