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46results about How to "Formed easily and precisely" patented technology
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Heat sink fan and method for manufacturing heat sink that is used for the heat sink fan
ActiveUS7123483B2Expansion quantityImprove heating efficiencySemiconductor/solid-state device detailsSolid-state devicesEngineeringHeat spreader
Owner:NIDEC CORP
Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
InactiveUS20070224537A1Efficiently and uniformly thickenedFormed easily and preciselyPhotosensitive materialsRadiation applicationsResistDevice material
The present invention provides a resist composition which enables uniformly thickening a resist pattern with a resist pattern thickening material, regardless of the direction, spacing variations of the resist pattern, and the components of the resist pattern thickening material and enables forming a fine space pattern of resist, exceeding exposure limits of light sources of exposure devices at low cost, easily, and efficiently. The resist composition contains an alicyclic compound (melting point: 90° C. to 150° C.), and a resin. The method for manufacturing a semiconductor device includes forming a resist pattern on a surface of a workpiece to be processed by using a resist composition and applying a resist pattern thickening material on the surface of the workpiece so as to cover the surface of the resist pattern to thicken the resist pattern; and patterning the surface of the workpiece by etching thereof using the thickened resist pattern as a mask.
Owner:FUJITSU LTD
Hybrid drive device
InactiveUS20110239818A1Effectively cool the clutchReduce axial sizeGearingFluid actuated clutchesEngineeringClutch
The present invention relates to a hybrid drive device including a first shaft coupled to an internal combustion engine, a rotary electric machine, a second shaft disposed coaxially with the first shaft and coupled to the rotary electric machine and a speed change mechanism, a clutch is provided to switch on and off transfer of a drive force between the first shaft and the second shaft, and a case houses the first shaft, the second shaft, the rotary electric machine, and the clutch. A rotor of the rotary electric machine is fixed to an outer peripheral portion of the clutch housing. A first seal mechanism is disposed in contact with an outer peripheral surface of the large diameter portion of the second axially projecting portion and the inner peripheral surface of the first axially projecting portion, and side by side with the first support mechanism in the axial direction.
Owner:AISIN AW CO LTD
Ball screw device having deflecting member background of the invention
ActiveUS20080134822A1Effectively and smoothly receivingEffectively and smoothly and guidingPortable liftingToothed gearingsBall screwHelix
A ball screw device includes a ball nut having an inner thread formed by a number of helical groove portions and helical ridges, and an opening and a depression communicating with each other, and a channel communicating with the depression of the ball nut, a radially inserted deflecting member has a block engaged into the opening of the ball nut and an extension extended from the block and engaged into the depression of the ball nut for anchoring the deflecting member to the ball nut. A fastener may be engaged through the deflecting member and engaged with the ball nut for securing the deflecting member to the ball nut.
Owner:HIWIN TECH
Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
InactiveUS20060188807A1Improve corrosion resistanceImpossible to thicken the resist patternRadiation applicationsSolid-state devicesResistDevice material
The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern to be thickened; and which is suited for forming a fine space pattern or the like, exceeding exposure limits. The present invention also provides a process for forming a resist pattern and a process for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.
Owner:FUJITSU LTD
Organic Luminescence Transistor Device and Manufacturing Method Thereof
InactiveUS20090179208A1Improve performanceHigh dimensional accuracyElectroluminescent light sourcesSolid-state devicesCharge injectionAuxiliary electrode
The invention is an organic luminescence transistor device including: a substrate; an assistance electrode layer provided on an upper surface of the substrate; an insulation film provided on an upper surface of the assistance electrode layer; a first electrode provided locally on an upper surface of the insulation film, the first electrode covering an area of a predetermined size; an electric-charge-injection inhibiting layer provided on an upper surface of the first electrode, the electric-charge-injection inhibiting layer having the same size as the first electrode in a plan view; an electric-charge injection layer provided on the upper surface of the insulation film at an area not provided with the first electrode and on an upper surface of the electric-charge-injection inhibiting layer; a luminescent layer provided on an upper surface of the electric-charge injection layer; and a second electrode layer provided on the luminescent layer.
Owner:DAI NIPPON PRINTING CO LTD +2
Resist underlayer film forming composition containing phenylindole-containing novolac resin
ActiveUS20150044876A1Excellent resist pattern shapeReduce reflectionPhotomechanical apparatusSemiconductor/solid-state device manufacturingUnit structureChemistry
A composition for forming a resist underlayer film having heat resistance, which is used for a lithography process of semiconductor device production. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1):Preferably, both rings A and B are benzene rings, n1, n2, and n3 are 0, R4 and R6 are hydrogen atoms, or R5 is naphthyl. A method for producing a semiconductor device including: forming an underlayer film by use of the resist underlayer film forming composition onto a semiconductor substrate; forming a hard mask on the underlayer film; forming a resist film on the hard mask; forming a resist pattern by irradiation with light or an electron beam and development; etching the hard mask using the resist pattern; etching the underlayer film by use of the patterned hard mask; and processing the semiconductor substrate by use of the patterned underlayer film.
Owner:NISSAN CHEM IND LTD
Ball screw device having deflecting member background of the invention
ActiveUS7523681B2Effectively and smoothly receivingEasy swivel movementPortable liftingToothed gearingsBall screwEngineering
A ball screw device includes a ball nut having an inner thread formed by a number of helical groove portions and helical ridges, and an opening and a depression communicating with each other, and a channel communicating with the depression of the ball nut, a radially inserted deflecting member has a block engaged into the opening of the ball nut and an extension extended from the block and engaged into the depression of the ball nut for anchoring the deflecting member to the ball nut. A fastener may be engaged through the deflecting member and engaged with the ball nut for securing the deflecting member to the ball nut.
Owner:HIWIN TECH
Manufacturing method of planar optical waveguide device with grating structure
ActiveUS20110053095A1Formed easily and preciselyFunction increaseOptical articlesPhotomechanical exposure apparatusGratingRefractive index
A method for manufacturing a planar optical waveguide device including a core of which a top face is provided with a groove section filled with a groove section filler made of a low refractive index material having a refractive index lower than that of the core, the method including; a first high refractive index material layer forming step of forming a high refractive index material layer; a low refractive index material layer forming step of forming a low refractive index material layer made of the low refractive index material on the high refractive index material layer; a groove section filler forming step of forming the groove section filler by trimming both lateral portions of the low refractive index material layer; and a second high refractive index material layer forming step of forming a high refractive index material layer so as to fill the both sides of the lateral portions of the groove section filler.
Owner:ADVANCED MICRO FOUNDRY PTE LTD
Ball screw device having circulating device background of the invention
ActiveUS20090107273A1Effectively and smoothly receiving and guidingEasy swivel movementPortable liftingToothed gearingsBall screwEngineering
A ball screw device includes a screw shaft rotatably engaged with a ball nut, and a number of bearing members received between the ball nut and the screw shaft, and a circulating device for circulating the bearing members, the circulating device includes an elongate member having two end blocks for engaging into the ball nut and having a passage for receiving the bearing members, and includes a housing member and a casing member each having a portion of the passage of the elongate member for allowing the passage of the elongate member to be opened and exposed and for allowing the housing member and the casing member to be formed with molding procedures.
Owner:HIWIN TECH
Resist underlayer film forming composition that contains novolac resin having polynuclear phenol
ActiveUS20150184018A1High resistanceSufficient etch resistanceOrganic chemistrySemiconductor/solid-state device manufacturingComposite materialPhenols
There is provided a composition for forming a resist underlayer film which has high dry-etching resistance and wiggling resistance, and achieves excellent planarizing properties for a semiconductor substrate surface having level differences or irregular portions. A resist underlayer film-forming composition including a phenol novolac resin that is obtained by causing a compound that has at least three phenolic groups, in which each of the phenolic groups has a structure bonded to a tertiary carbon atom or has a structure bonded to a quaternary carbon atom to which a methyl group binds, to react with an aromatic aldehyde or an aromatic ketone in the presence of an acid catalyst. The phenol novolac resin preferably contains a unit structure of Formula (1), a unit structure of Formula (2), a unit structure of Formula (3), a unit structure of Formula (4), or a combination of these unit structures:
Owner:NISSAN CHEM IND LTD
Resist underlayer film forming composition containing phenylindole-containing novolac resin
ActiveUS8993215B2Easy to shapeReduce reflectionPhotosensitive materialsSemiconductor/solid-state device manufacturingHydrogen atomLithography process
A composition for forming a resist underlayer film having heat resistance, which is used for a lithography process of semiconductor device production. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1):Preferably, both rings A and B are benzene rings, n1, n2, and n3 are 0, R4 and R6 are hydrogen atoms, or R5 is naphthyl. A method for producing a semiconductor device including: forming an underlayer film by use of the resist underlayer film forming composition onto a semiconductor substrate; forming a hard mask on the underlayer film; forming a resist film on the hard mask; forming a resist pattern by irradiation with light or an electron beam and development; etching the hard mask using the resist pattern; etching the underlayer film by use of the patterned hard mask; and processing the semiconductor substrate by use of the patterned underlayer film.
Owner:NISSAN CHEM CORP
Ball screw device having circulating device background of the invention
ActiveUS7934438B2Effectively and smoothly receiving and guidingEasy swivel movementPortable liftingToothed gearingsBall screwEngineering
A ball screw device includes a screw shaft rotatably engaged with a ball nut, and a number of bearing members received between the ball nut and the screw shaft, and a circulating device for circulating the bearing members, the circulating device includes an elongate member having two end blocks for engaging into the ball nut and having a passage for receiving the bearing members, and includes a housing member and a casing member each having a portion of the passage of the elongate member for allowing the passage of the elongate member to be opened and exposed and for allowing the housing member and the casing member to be formed with molding procedures.
Owner:HIWIN TECH
Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
ActiveUS20140235060A1Excellent shapeEfficiently reflectSemiconductor/solid-state device detailsSolid-state devicesUnit structureChemistry
There is provided a resist underlayer film used in lithography process that has a high n value and a low k value, and can effectively reduce reflection of light having a wavelength of 193 nm from the substrate in a three-layer process in which the resist underlayer film is used in combination with a silicon-containing intermediate layer. A resist underlayer film-forming composition used in lithography process including: a polymer containing a unit structure including a product obtained by reaction of a condensed heterocyclic compound and a bicyclo ring compound. The condensed heterocyclic compound is a carbazole compound or a substituted carbazole compound. The bicyclo ring compound is dicyclopentadiene, substituted dicyclopentadiene, tetracyclo[4.4.0.12,5.17,10]dodeca-3,8-diene, or substituted tetracyclo[4.4.0.12,5.17,10]dodeca-3,8-diene.
Owner:NISSAN CHEM IND LTD
Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
InactiveUS7585610B2Improve corrosion resistanceImpossible to thicken the resist patternPhotosensitive materialsRadiation applicationsResistEngineering
The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern to be thickened; and which is suited for forming a fine space pattern or the like, exceeding exposure limits. The present invention also provides a process for forming a resist pattern and a process for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.
Owner:FUJITSU LTD
Method and device for forming tire's annular member
InactiveUS20060055082A1Formed easily and preciselyWell-balanced mass and volumeConfectioneryPneumatic tyre reinforcementsEngineeringMechanical engineering
A method and device for manufacturing tire's annular member having a stretch mainly in radial direction by use of simple devices and simple way of pressing with high precision and easiness, as to produce tire product in high quality with no fluctuation of mass and / or uniformity, comprising: a first mold including a profile mold having an annular recess; a second mold which faces the first mold; and an extruder that continuously extrudes a rubber body into the recess of the profile mold. Concurrent with such extruding, the profile mold is rotated by one turn so as to charge the rubber body into the annular recess in a manner as annularly continuous. Then, the first and the second molds are brought abut each other so as to press the rubber body between the profile and second molds; thus shaping the rubber body into a shape defined by the profile mold.
Owner:TOYO TIRE & RUBBER CO LTD
Solid-state imaging device and method of manufacturing the same
ActiveUS7230289B2Forming carrier pocketsHigh densityTransistorTelevision system detailsImpurity ionsEngineering
The MOS type solid-state imaging device has plural pixels each of which comprises a photo-diode and a MOS transistor on a substrate. A gate electrode is formed on the channel dope layer formed in the surface of the p-type well layer. By ion implantation of n-type impurity ions via the gate electrode as the mask, the n-type source region and the drain region are formed in the region corresponding to the MOS transistor, and the n-type impurity region is also formed in the region corresponding to the photo-diode. In the well layer, a high impurity density region as a hole pocket is self-aligned to the gate electrode.
Owner:INNOTECH CORP
Heat Sink Fan and Method for Manufacturing Heat Sink That Is Used for the Heat Sink Fan
ActiveUS20060176668A1Expansion quantityImprove heating efficiencyPrinted circuit assemblingSemiconductor/solid-state device detailsEngineeringHeat spreader
A heat sink fan includes a heat sink (2) that is placed on a heat generating electrical component and a fan motor unit (4) having an axial flow fan (18) for supplying cooling air to the heat sink (2). A engaging portions (14a) of an arm portions (14) of the fan motor unit (4) is engaged with a recesses (10b) of the heat sink (2). Thus, movement of the fan motor unit (4) in the axial direction of the heat sink (2) is restricted so that the fan motor unit (4) is attached to the heat sink (2) securely.
Owner:NIDEC CORP
Method for forming resist pattern, semiconductor device and production method thereof
InactiveUS20080044769A1Good conditionImprove performancePhotosensitive materialsSemiconductor/solid-state device manufacturingCooking & bakingResist
It is an object of the present invention to provide a method for forming a resist pattern, in which ArF excimer laser light can be utilized as the exposure light for the patterning, the resist patterns can be thickened stably to an intended thickness independently of the sizes of the resist patterns, and the fineness of the fine space patterns can surpass the limit in terms of exposure or resolution of exposure devices.The method for forming a resist pattern of the present invention comprises at least forming a resist pattern, coating a resist pattern thickening material to cover the surface of the resist pattern, baking the resist pattern thickening material, and developing and separating the resist pattern thickening material, wherein at least one of the coating, the baking and the developing is carried out plural times.
Owner:FUJITSU LTD
Retaining device for heat sink
InactiveUS7631402B2Simple structureLow costSnap fastenersSemiconductor/solid-state device detailsRelative motionEngineering
A retaining device for a heat sink includes a retaining piece, a retaining arm, a connection seat and a control member. The retaining piece has one end formed with a retaining hole and a top end formed with two tabs. The retaining arm has a vertical surface formed with a retaining hole. The tabs penetrate through the retaining arm and then the connection seat having an accommodating slot. The control member has a disk and a handle connected thereto. The disk in the accommodating slot has a hollow eccentric control slot. A pivot mounted to the tabs may slide in the control slot. The control member is rotated to move the pivot, which causes a relative movement between the retaining piece and the connection seat so that the retaining hole retains a mounting seat of the heat sink while the retaining arm tightly presses against the heat sink.
Owner:HUANG PO HUI
Manufacturing method of planar optical waveguide device with grating structure
ActiveUS8227178B2Formed easily and preciselyShorten the lengthOptical articlesPhotomechanical exposure apparatusGratingRefractive index
A method for manufacturing a planar optical waveguide device including a core of which a top face is provided with a groove section filled with a groove section filler made of a low refractive index material having a refractive index lower than that of the core, the method including; a first high refractive index material layer forming step of forming a high refractive index material layer; a low refractive index material layer forming step of forming a low refractive index material layer made of the low refractive index material on the high refractive index material layer; a groove section filler forming step of forming the groove section filler by trimming both lateral portions of the low refractive index material layer; and a second high refractive index material layer forming step of forming a high refractive index material layer so as to fill the both sides of the lateral portions of the groove section filler.
Owner:ADVANCED MICRO FOUNDRY PTE LTD
Atom cell, quantum interference device, atomic oscillator, electronic apparatus, and moving object
InactiveUS9654125B2Improve frequency stabilityRadiated or cooled more easilyPulse automatic controlApparatus using atomic clocksLiquid stateEngineering
A gas cell includes an alkali metal, a pair of window parts, a body part provided between the pair of window parts and forming an internal space in which the alkali metal in a gaseous state is enclosed with the pair of window parts, and a space within a recessed part forming a part of the internal space or communicating with the internal space, in which a liquid-state or solid-state alkali metal is placed, and a bottom part as a wall part between the space within the recessed part and an outside has a smaller thickness than the window parts.
Owner:SEIKO EPSON CORP
Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring
ActiveUS9261790B2Good body shapeSolve the lack of resistanceSemiconductor/solid-state device manufacturingCoatingsResistHydrogen atom
A resist underlayer film-forming composition for forming a resist underlayer film having both dry etching resistance and heat resistance. A resist underlayer film-forming composition comprising a polymer containing a unit structure of Formula (1):In Formula (1), R3 is a hydrogen atom, and both n1 and n2 are 0. A method for producing a semiconductor device comprising the steps of: forming an underlayer film on a semiconductor substrate using the resist underlayer film-forming composition; forming a hard mask on the underlayer film; further forming a resist film on the hard mask; forming a resist pattern by irradiation with light or electron beams and development; etching the hard mask using the resist pattern; etching the underlayer film using the hard mask patterned; and fabricating the semiconductor substrate using the patterned underlayer film.
Owner:NISSAN CHEM IND LTD
Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
InactiveUS7550248B2Swelling amount (thickening amount) is alteredEasy to controlPhotosensitive materialsRadiation applicationsResistWater soluble
Owner:FUJITSU LTD
Method of manufacturing a display substrate
ActiveUS20120171793A1Formed easily and preciselyLoss of timeSolid-state devicesSemiconductor/solid-state device manufacturingPhotoresistEngineering
A method of manufacturing a display substrate includes forming a common electrode line, a gate line, a data line and a switching element connected to the gate and data lines on an insulation substrate. A first pixel electrode and an insulation layer are sequentially formed on the insulation substrate. A first photoresist pattern having a first hole and a second hole is formed from a first photoresist layer on the insulation substrate. A first transparent electrode layer is coated on the insulation substrate. A second photoresist layer is coated on the insulation substrate. The second photoresist layer is exposed and developed to form a second photoresist pattern remaining in the first hole and the second hole. The first transparent electrode layer is patterned using the second photoresist pattern, to form a second pixel electrode.
Owner:SAMSUNG DISPLAY CO LTD
Grid for radiography and manufacturing method thereof, and radiation imaging system
InactiveUS20120051509A1Increase transmittance of radiationImprove performanceImaging devicesHandling using diffraction/refraction/reflectionAspect ratioStress radiography
To produce a grid for radiography, grooves with a high aspect ratio are formed in an X-ray transparent substrate, and a colloidal gold solution is dripped into the grooves in such an amount that the colloidal gold solution does not overflow the grooves. The applied colloidal gold solution flows into the grooves by capillarity. The X-ray transparent substrate is heated from beneath by a laser beam at a portion charged with the colloidal gold solution. Thus, the colloidal gold solution is dried with leaving colloidal gold particles behind. The charging and drying of the colloidal gold solution are repeated, until the grooves are filled with the colloidal gold particles. The grooves and the colloidal gold particles compose X-ray absorbing portions of the grid.
Owner:FUJIFILM CORP
Retaining device for heat sink
InactiveUS20070212905A1Simple structureLow costSnap fastenersSemiconductor/solid-state device detailsRelative motionEngineering
A retaining device for a heat sink includes a retaining piece, a retaining arm, a connection seat and a control member. The retaining piece has one end formed with a retaining hole and a top end formed with two tabs. The retaining arm has a vertical surface formed with a retaining hole. The tabs penetrate through the retaining arm and then the connection seat having an accommodating slot. The control member has a disk and a handle connected thereto. The disk in the accommodating slot has a hollow eccentric control slot. A pivot mounted to the tabs may slide in the control slot. The control member is rotated to move the pivot, which causes a relative movement between the retaining piece and the connection seat so that the retaining hole retains a mounting seat of the heat sink while the retaining arm tightly presses against the heat sink.
Owner:HUANG PO HUI
Resist underlayer film forming composition that contains novolac resin having polynuclear phenol
ActiveUS9469777B2High dry etch resistanceSufficient etching resistanceOrganic chemistrySemiconductor/solid-state device manufacturingPolymer sciencePtru catalyst
There is provided a composition for forming a resist underlayer film which has high dry-etching resistance and wiggling resistance, and achieves excellent planarizing properties for a semiconductor substrate surface having level differences or irregular portions. A resist underlayer film-forming composition including a phenol novolac resin that is obtained by causing a compound that has at least three phenolic groups, in which each of the phenolic groups has a structure bonded to a tertiary carbon atom or has a structure bonded to a quaternary carbon atom to which a methyl group binds, to react with an aromatic aldehyde or an aromatic ketone in the presence of an acid catalyst. The phenol novolac resin preferably contains a unit structure of Formula (1), a unit structure of Formula (2), a unit structure of Formula (3), a unit structure of Formula (4), or a combination of these unit structures:
Owner:NISSAN CHEM IND LTD
Etching method, a method of forming a trench isolation structure, a semiconductor substrate and a semiconductor apparatus
InactiveUS20060033178A1Improve reliabilityFormed easily and preciselyDecorative surface effectsElectrostatic cleaningHydrogen fluorideSilicon
An etching method of subjecting a base material to an etching process using an etching agent containing hydrogen fluoride and ozone is disclosed. The base material has a first region constituted from silicon as a main material and a second region constituted from SiO2 as a main material. The etching method includes the steps of: preparing the base material; and supplying the etching agent onto the base material to form a step between the first and second regions using a feature that an etching rate of silicon by the etching agent is higher than an etching rate of SiO2 by the etching agent, so that the height of the surface of the first region is lower than the height of the surface of the second region.
Owner:SEIKO EPSON CORP +1
Liquid discharge recording head and liquid discharge apparatus
A liquid discharge recording head which discharges a liquid includes a substrate on which liquid-discharge-energy-generating elements are provided and which constitutes a part of a flow path for supplying the liquid; and a covering resin layer which is provided on the substrate, which constitutes a part of the flow path, and which includes orifices for discharging the liquid, wherein the covering resin layer is composed of an oxetane resin composition containing an oxetane compound having at least one oxetanyl group in its molecule and a photocationic polymerization initiator as essential components.
Owner:SONY CORP
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