102 results about "Alicyclic compound" patented technology

The invention is a combination of at least one dense phase fluid and at least one dense phase fluid modifier which can be used to contact substrates for electronic parts such as semiconductor wafers or chips to remove photoresist materials which are applied to the substrates during manufacture of the electronic parts. The dense phase fluid modifier is one selected from the group of cyclic, aliphatic or alicyclic compounds having the functional group:wherein Y is a carbon, oxygen, nitrogen, phosphorus or sulfur atom or a hydrocarbon group having from 1 to 10 carbon atoms, a halogen or halogenated hydrocarbon group having from 1 to 10 carbon atoms, silicon or a fluorinated silicon group; and wherein R1 and R2 can be the same or different substituents; and wherein, as in the case where X is nitrogen, R1 or R2 may not be present. The invention compositions generally are applied to the substrates in a pulsed fashion in order to remove the hard baked photoresist material remaining on the surface of the substrate after removal of soft baked photoresist material and etching of the barrier layer.

The present invention provides a resist composition which enables uniformly thickening a resist pattern with a resist pattern thickening material, regardless of the direction, spacing variations of the resist pattern, and the components of the resist pattern thickening material and enables forming a fine space pattern of resist, exceeding exposure limits of light sources of exposure devices at low cost, easily, and efficiently. The resist composition contains an alicyclic compound (melting point: 90° C. to 150° C.), and a resin. The method for manufacturing a semiconductor device includes forming a resist pattern on a surface of a workpiece to be processed by using a resist composition and applying a resist pattern thickening material on the surface of the workpiece so as to cover the surface of the resist pattern to thicken the resist pattern; and patterning the surface of the workpiece by etching thereof using the thickened resist pattern as a mask.

A photoresist and post etch cleaning solution for semiconductor wafers comprising:A. a polar aprotic solvent,B. an inorganic base;C. a co-solvent for said inorganic base;D. a unsaturated cycloaliphatic compound having a ring ether group and at least one substituent bearing a primary hydroxyl group;E. an organic base comprising an amine compound; andF. a nonionic surfactant bearing at least one ether group.The wafer containing photoresist residue or post etch residue can be cleaned by contacting the solution in a spray or immersion.

A method for manufacturing a semiconductor device includes: forming a source electrode and a drain electrode on a substrate; forming an organic semiconductor layer including a π conjugated organic compound at least between the source electrode and the drain electrode; applying an application liquid on the organic semiconductor layer, the application liquid being made of a polymer of an alicyclic compound dissolved in a paraffin hydrocarbon solvent that is a carbocyclic compound without having aromaticity; forming a gate insulation layer including the polymer of the alicyclic compound by removing the paraffin hydrocarbon solvent from the application liquid; and forming a gate electrode on the gate insulation layer.

An aryl-substituted alicyclic compound of the formula (I): wherein U is 1,4,5,6-tetrahydropyrimidin-2-yl, etc., A is phenylene, etc., B is piperidine-1,4-diyl, etc., Z is -CONH-, etc., R<3 >is hydrogen, etc., R<5 >is hydrogen, aryl, etc., R<6 >is a mono-substituted amino (e,g., benzyloxycarbonylamino), R<7 >is hydrogen, etc., and a process for preparation thereof, and a pharmaceutical composition containing the same. The compound of the present invention has a high selectivity for alphavbeta3 integrin, and exhibits a potent inhibitory activity thereto, and hence, it is useful as a preventive or / and a therapeutic agent for a disease in which alphavbeta3 integrin is involved.

To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface.A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.

The invention relates to a method for using a solid borne heteropoly acid catalyst to catalyze and synthesize alicyclic epoxy resin. The method comprises the following steps: halogenated methane polystyrene resin and compound with active tertiary amine groups are dissolved in an organic solvent and react to form solid borne quaternary ammonium salt resin; H3PO4OM12 xH2O is treated in acidic aqueous solution by an oxidizer and reacts with the solid borne quaternary ammonium salt resin, wherein, M is tungsten, molybdenum or vanadium, and then the solid borne heteropoly acid catalyst is prepared; the solid borne heteropoly acid catalyst, unsaturated alicyclic compound and a cocatalyst are dissolved in the organic solvent, then the oxidizer is added to form acidic mixed reacting solution, stirring is carried out continuously till the reaction is completed, the solid borne heteropoly acid catalyst is recovered and the filtrate is cleaned to remove the organic solvent and then the alicyclic epoxy resin is obtained. The invention has high yield and purity, safe and simple technique, convenient operation and low cost, is environment-friendly and is completely suitable for industrial production on large scale.

To provide a microporous film having excellent permeability and mechanical strength as well as excellent SD function at low temperatures and film-breaking resistance at high temperatures. A microporous film made of a resin composition at least comprising 1 to 50% by weight of a ring-opening polymer of an unsaturated condensed alicyclic compound, and 1 to 50% by weight of one or more resin components selected from the group consisting of polyolefins having a weight-average molecular weight of 500000 or less, thermoplastic elastomers and graft copolymers.

The present invention relates to a heat transfer medium composition which contains water, a glycol, alcohol and / or glycol ether as a main ingredient and a pH buffering agent. The composition provides improved and long lasting buffering in actual use to maintain the pH value of the medium within the appropriate range of pH 6 to pH 10. The pH buffering agent is prepared of an alicyclic compound where two members selected from among carboxyl and its salts are bonded to a ring-constituting carbon atom, or at least two members selected from the group are respectively bonded to as many neighboring carbon atoms. Alternatively, the pH buffering agent is prepared of a heterocyclic compound in which at least one ring-constituting carbon atom of the alicyclic compound is substituted by a nitrogen or oxygen atom, where two members selected from the group are bonded to a ring-constituting carbon atom, or at least two members selected from the group are respectively bonded to as many neighboring carbon atoms.

The invention discloses a method for preparing a nitro compound from a low-valent nitric oxide. The method comprises that a low-valent nitric oxide such as nitric oxide, nitrogen dioxide, nitrous oxide, nitrogen trioxide, dinitrogen tetroxide and the like react with an alicyclic compound, an aromatic compound or a heterocyclic compound through promoting effects of molecular oxygen and effects of catalysts comprising a transition metal oxide, a triphenylphosphine metal organic complex, transition metal ion clay and heteropoly acid salts such as aluminosilicate, silicoaluminophosphate, sodium phosphomolybdate and the like. The method can replace the traditional industrial method for preparing a nitro compound from a high-valent (V-valent) nitrogen compound such as nitrogen pentoxide, hydrogen nitrate, nitric acid salts, nitric acid esters and the like. The method improves an atom utilization rate of a reaction in industrial nitration preparation of a nitro compound, and has atom economic characteristics of industrial preparation of a nitro compound.

A method of manufacturing a polyelectrolyte having the step of sulfonating polystyrene resin in a state where the polystyrene resin has been dissolved or dispersed in solvent composed of alicyclic compounds.

An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.

A method of manufacturing a polyelectrolyte having the step of sulfonating polystyrene resin in a state where the polystyrene resin has been dissolved or dispersed in solvent composed of alicyclic compounds.

Disclosed is a resin composition for a retardation thin film, which can form a thin film having high transparency and high birefringency by applying the composition onto a substrate without the need of an alignment or stretching process. The composition comprises a polyimide precursor produced by reacting at least one tetracarboxylic acid dianhydride with at least one diamine and an organic solvent, wherein at least either one of the at least one tetracarboxylic acid dianhydride and the at least one diamine is an alicyclic compound. The composition can be used in a liquid crystal display device for forming a retardation thin film having an optically negative uniaxial anisotropy, an optical axis approximately perpendicular to a the surface of the thin film and a birefringence (delta n) in the thicknesswise direction of 0.01 to 0.3.

A resist material includes a base polymer containing a compound having a unit represented by a general formula of the following Chemical Formula 1: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 is a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R6 is a group having a cyclic ester compound, a group having an alicyclic compound including a hydroxyl group or a group having a compound including hexafluoroisopropyl alcohol.

A film, laminated product, and other packaging materials are disclosed, each including an oxygen scavenger composition including mer units derived from a substituted alicyclic compound having non-aromatic, ethylenic functionality, mer units including an ionomeric group, and mer units of a di- or polyfunctional hydrocarbon compound. Certain oxygen scavenger compositions have been found to act as an oxygen scavenger under both ambient and refrigeration conditions, to be compatible with conventional film forming packaging materials, to inhibit undesirable oligomer formation and oxidation by-product formation, and to be readily formable and processable using conventional film forming equipment.

A process for cleaning a semi-conductor wafer comprising providing etched wafer containing metal pillars, contacting the etched wafer with a cleaning solution, removing the wafer from the cleaning solution, wherein the resulting wafer is substantially free of post etch residues and photoresist residues without etching the metal pillars by the cleaning solution, the cleaning solution comprising:A. a polar aprotic solvent,B. an inorganic base;C. a co-solvent for said inorganic base;D. a unsaturated cycloaliphatic compound having a ring ether group and at least one substituent bearing a primary hydroxyl group; andE. an organic base comprising an amine compound.The wafer containing photoresist residue or post etch residue can be cleaned by contacting the solution in a spray or immersion.

The present invention relates to a resin composition for sealing a surface of an organic electroluminescent (EL) element, said resin composition including: an alicyclic compound (A) having an oxetanyl group or an epoxy group; and a cyclic compound (B) which has an oxetanyl group or an epoxy group, and which satisfies the following condition (condition for cyclic compound (B): that the ring in cyclic compound (B) be either an aliphatic ring or a heterocycle, and in cases when the ring is an aliphatic ring, that the cyclic compound have a structure different to that of the compound used as alicyclic compound (A)). This resin composition for sealing a surface of an organic EL element exhibits an excellent liquid refractive index, and is cured by heat or energy rays such as light to obtain a cured product exhibiting excellent visible light transmission, excellent light resistance, a high Tg, low cure shrinkage, and a low water vapour transmission rate, and thus is particularly suitable as a surface sealant for an organic EL element.

A sulfur-containing cycloaliphatic compound, useful as a crosslinker for filled sulfur-vulcanizable elastomer compositions, is represented by the general formula:G[-CaH2a—S[C(═O)]bR]n wherein G is selected from the group consisting of:saturated, monocyclic aliphatic group of valence n containing from 5 to 12 carbon atoms and optionally containing at least one halogen, andsaturated monocyclic silicone [RSiO—]n[R2SiO—]p group of valence n;wherein each R independently is a hydrogen or monovalent hydrocarbon of up to 20 carbon atoms; each occurrence of subscripts a and b independently is an integer wherein a is 2 to 6 and b is 0 or 1; p is an integer of from 0 to 3; and, n is an integer of from 3 to 6, with the provisos that when b is 0, R is a hydrogen atom, and when G is a non-halogenated, saturated monocyclic aliphatic group of 6 carbon atoms, n cannot be 3.

The present invention discloses a color toner providing highly gloss image and documents with excellent long term storability; an electrostatic latent image developer; and an image forming method. Disclosed is a color toner comprising a binder resin and colorant, wherein the weight average molecular weight of the binder resin is from 6000 to 45000, the toner's glass transition temperature (Tg) is from 40 to 70° C., the loss tangent tan δ of dynamic viscoelasticity is from 0.1 to 2.5 in the temperature of from the toner's glass transition temperature (Tg) to the temperature at which the loss modulus (G″) is 1×105 Pa, and the toner comprises 3 to 20% by mass of an ester derivative of an alicyclic compound having 1 or more carboxyl groups, and an electrostatic latent image developer and an image forming method, which use the color toner.

A polyurethane resin having a total concentration of the urethane group and the urea group of not less than 15% by weight is prepared by reacting a diisocyanate component (e.g., an aromatic diisocyanate) with a diol component (e.g., a C2–8alkylene glycol). The repeating unit of the polyurethane resin may contain a constitutive unit of an aromatic or alicyclic compound. The polyurethane resin may be shaped into a film for use as a gas barrier film. The film may be a gas barrier composite film composed of a base film layer and a resin layer at least comprising the polyurethane resin. The present invention provides a polyurethane resin excellent in gas barrier properties against water vapor, oxygen, aromatics, and others, and a film containing the same.

This invention relates to a process for the preparation of 1,1-difluoroolefins, e.g., difluorovinyl cycloaliphatic compounds such as difluorovinylcyclohexane and derivatives by the dehydrofluorination of a trifluoromethyl-substituted cycloaliphatic compound and the resulting compositions. This method utilizes a “sterically hindered super-base” system represented by the formula M+−NRR−; where M is Na or K and R is a secondary, or tertiary alkyl or cycloalkyl group of amines for effecting dehydrofluorination of the trifluoromethyl group leading to the difluorovinyl based cycloaliphatic compounds. The sterically hindered super base can be formed by the, in situ, reaction of a sodium or potassium alkoxide, e.g., KtBuO with a lithium dialkylamide where the lithium is bonded to nitrogen atom of an amine bearing secondary or tertiary aliphatic groups.

An N-substituted benzimidazole-containing bridged alicyclic compound is provided. The compound is represented by following Formula (1-1):In the formula, Z3 represents a bridged alicyclic skeleton; Y11 represents a single bond or a divalent organic group; Y2 represents a single bond or a di- or tri-valent organic group; X3 represents a hydrogen atom or a reactive functional group; Ra represents a hydrogen atom or a hydrocarbon group; A3 represents a group represented by one of following Formulae (a) and (b):wherein R10 represents a monovalent organic group, wherein, in each of Formulae (a) and (b), the left side is to be bonded to Y11, and the right side is to be bonded to Y2; “n4” denotes an integer of 2 to 7; “m3” denotes an integer of 0 to 5; and “k2” denotes an integer of 0 to 2, wherein the total of “n4” and “m3” equals 2 to 7, and wherein two or more Y11s, Y2s, X3s, A3s, and R10s per molecule, and two or more X3s and Ras, if present per molecule, may be the same as or different from one another, respectively.

There are provided steps of forming a lower resist layer on a patterning objective layer, forming an organic intermediate layer made of organic material, that contains no Si—O bond in its structure, on the lower resist layer, forming an upper resist layer made of alicyclic resin on the organic intermediate layer, forming a pattern by exposing / developing the upper resist layer, transferring the pattern of the upper resist layer onto the organic intermediate layer by etching the organic intermediate layer while using the upper resist layer as a mask, transferring a pattern of the organic intermediate layer onto the lower resist layer by etching the lower resist layer while using the organic intermediate layer as a mask, and etching the patterning objective layer while using the lower resist layer as a mask. Accordingly, a semiconductor device manufacturing method containing patterning steps employing a multi-layered resist structure, that is capable of suppressing deformation of the pattern of the upper resist layer formed of alicyclic compound, can be provided.