100 results about "Alicyclic compound" patented technology

The present invention provides a resist composition which enables uniformly thickening a resist pattern with a resist pattern thickening material, regardless of the direction, spacing variations of the resist pattern, and the components of the resist pattern thickening material and enables forming a fine space pattern of resist, exceeding exposure limits of light sources of exposure devices at low cost, easily, and efficiently. The resist composition contains an alicyclic compound (melting point: 90° C. to 150° C.), and a resin. The method for manufacturing a semiconductor device includes forming a resist pattern on a surface of a workpiece to be processed by using a resist composition and applying a resist pattern thickening material on the surface of the workpiece so as to cover the surface of the resist pattern to thicken the resist pattern; and patterning the surface of the workpiece by etching thereof using the thickened resist pattern as a mask.

An aryl-substituted alicyclic compound of the formula (I): wherein U is 1,4,5,6-tetrahydropyrimidin-2-yl, etc., A is phenylene, etc., B is piperidine-1,4-diyl, etc., Z is -CONH-, etc., R<3 >is hydrogen, etc., R<5 >is hydrogen, aryl, etc., R<6 >is a mono-substituted amino (e,g., benzyloxycarbonylamino), R<7 >is hydrogen, etc., and a process for preparation thereof, and a pharmaceutical composition containing the same. The compound of the present invention has a high selectivity for alphavbeta3 integrin, and exhibits a potent inhibitory activity thereto, and hence, it is useful as a preventive or/and a therapeutic agent for a disease in which alphavbeta3 integrin is involved.

To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface.

A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.

The invention relates to a method for using a solid borne heteropoly acid catalyst to catalyze and synthesize alicyclic epoxy resin. The method comprises the following steps: halogenated methane polystyrene resin and compound with active tertiary amine groups are dissolved in an organic solvent and react to form solid borne quaternary ammonium salt resin; H3PO4OM12 xH2O is treated in acidic aqueous solution by an oxidizer and reacts with the solid borne quaternary ammonium salt resin, wherein, M is tungsten, molybdenum or vanadium, and then the solid borne heteropoly acid catalyst is prepared; the solid borne heteropoly acid catalyst, unsaturated alicyclic compound and a cocatalyst are dissolved in the organic solvent, then the oxidizer is added to form acidic mixed reacting solution, stirring is carried out continuously till the reaction is completed, the solid borne heteropoly acid catalyst is recovered and the filtrate is cleaned to remove the organic solvent and then the alicyclic epoxy resin is obtained. The invention has high yield and purity, safe and simple technique, convenient operation and low cost, is environment-friendly and is completely suitable for industrial production on large scale.

The present invention relates to a heat transfer medium composition which contains water, a glycol, alcohol and/or glycol ether as a main ingredient and a pH buffering agent. The composition provides improved and long lasting buffering in actual use to maintain the pH value of the medium within the appropriate range of pH 6 to pH 10. The pH buffering agent is prepared of an alicyclic compound where two members selected from among carboxyl and its salts are bonded to a ring-constituting carbon atom, or at least two members selected from the group are respectively bonded to as many neighboring carbon atoms. Alternatively, the pH buffering agent is prepared of a heterocyclic compound in which at least one ring-constituting carbon atom of the alicyclic compound is substituted by a nitrogen or oxygen atom, where two members selected from the group are bonded to a ring-constituting carbon atom, or at least two members selected from the group are respectively bonded to as many neighboring carbon atoms.

The invention discloses a method for preparing a nitro compound from a low-valent nitric oxide. The method comprises that a low-valent nitric oxide such as nitric oxide, nitrogen dioxide, nitrous oxide, nitrogen trioxide, dinitrogen tetroxide and the like react with an alicyclic compound, an aromatic compound or a heterocyclic compound through promoting effects of molecular oxygen and effects of catalysts comprising a transition metal oxide, a triphenylphosphine metal organic complex, transition metal ion clay and heteropoly acid salts such as aluminosilicate, silicoaluminophosphate, sodium phosphomolybdate and the like. The method can replace the traditional industrial method for preparing a nitro compound from a high-valent (V-valent) nitrogen compound such as nitrogen pentoxide, hydrogen nitrate, nitric acid salts, nitric acid esters and the like. The method improves an atom utilization rate of a reaction in industrial nitration preparation of a nitro compound, and has atom economic characteristics of industrial preparation of a nitro compound.

A method of manufacturing a polyelectrolyte having the step of sulfonating polystyrene resin in a state where the polystyrene resin has been dissolved or dispersed in solvent composed of alicyclic compounds.

A method of manufacturing a polyelectrolyte having the step of sulfonating polystyrene resin in a state where the polystyrene resin has been dissolved or dispersed in solvent composed of alicyclic compounds.

Disclosed is a resin composition for a retardation thin film, which can form a thin film having high transparency and high birefringency by applying the composition onto a substrate without the need of an alignment or stretching process. The composition comprises a polyimide precursor produced by reacting at least one tetracarboxylic acid dianhydride with at least one diamine and an organic solvent, wherein at least either one of the at least one tetracarboxylic acid dianhydride and the at least one diamine is an alicyclic compound. The composition can be used in a liquid crystal display device for forming a retardation thin film having an optically negative uniaxial anisotropy, an optical axis approximately perpendicular to a the surface of the thin film and a birefringence (delta n) in the thicknesswise direction of 0.01 to 0.3.

A resist material includes a base polymer containing a compound having a unit represented by a general formula of the following Chemical Formula 1:

wherein R¹, R² and R³ are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R⁴ is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R⁵ is a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R⁶ is a group having a cyclic ester compound, a group having an alicyclic compound including a hydroxyl group or a group having a compound including hexafluoroisopropyl alcohol.

A film, laminated product, and other packaging materials are disclosed, each including an oxygen scavenger composition including mer units derived from a substituted alicyclic compound having non-aromatic, ethylenic functionality, mer units including an ionomeric group, and mer units of a di- or polyfunctional hydrocarbon compound. Certain oxygen scavenger compositions have been found to act as an oxygen scavenger under both ambient and refrigeration conditions, to be compatible with conventional film forming packaging materials, to inhibit undesirable oligomer formation and oxidation by-product formation, and to be readily formable and processable using conventional film forming equipment.

The alicyclic compound of the present invention has a five- or more membered ring structure having an epithioethylene linkage and/or an epidithioethylene linkage, and has tow or more sulfur atoms in its molecule. Optical materials produced by curing the alicyclic compound or a composition containing the alicyclic compound by polymerization show high refractive index.

The present invention relates to a resin composition for sealing a surface of an organic electroluminescent (EL) element, said resin composition including: an alicyclic compound (A) having an oxetanyl group or an epoxy group; and a cyclic compound (B) which has an oxetanyl group or an epoxy group, and which satisfies the following condition (condition for cyclic compound (B): that the ring in cyclic compound (B) be either an aliphatic ring or a heterocycle, and in cases when the ring is an aliphatic ring, that the cyclic compound have a structure different to that of the compound used as alicyclic compound (A)). This resin composition for sealing a surface of an organic EL element exhibits an excellent liquid refractive index, and is cured by heat or energy rays such as light to obtain a cured product exhibiting excellent visible light transmission, excellent light resistance, a high Tg, low cure shrinkage, and a low water vapour transmission rate, and thus is particularly suitable as a surface sealant for an organic EL element.

A sulfur-containing cycloaliphatic compound, useful as a crosslinker for filled sulfur-vulcanizable elastomer compositions, is represented by the general formula:

G[-C_aH_2a—S[C(═O)]_bR]_n

wherein G is selected from the group consisting of:

• • saturated, monocyclic aliphatic group of valence n containing from 5 to 12 carbon atoms and optionally containing at least one halogen, and
  • saturated monocyclic silicone [RSiO—]_n[R₂SiO—]_p group of valence n;

wherein each R independently is a hydrogen or monovalent hydrocarbon of up to 20 carbon atoms; each occurrence of subscripts a and b independently is an integer wherein a is 2 to 6 and b is 0 or 1; p is an integer of from 0 to 3; and, n is an integer of from 3 to 6, with the provisos that when b is 0, R is a hydrogen atom, and when G is a non-halogenated, saturated monocyclic aliphatic group of 6 carbon atoms, n cannot be 3.

A polyurethane resin having a total concentration of the urethane group and the urea group of not less than 15% by weight is prepared by reacting a diisocyanate component (e.g., an aromatic diisocyanate) with a diol component (e.g., a C2–8alkylene glycol). The repeating unit of the polyurethane resin may contain a constitutive unit of an aromatic or alicyclic compound. The polyurethane resin may be shaped into a film for use as a gas barrier film. The film may be a gas barrier composite film composed of a base film layer and a resin layer at least comprising the polyurethane resin. The present invention provides a polyurethane resin excellent in gas barrier properties against water vapor, oxygen, aromatics, and others, and a film containing the same.

An N-substituted benzimidazole-containing bridged alicyclic compound is provided. The compound is represented by following Formula (1-1):

In the formula, Z³ represents a bridged alicyclic skeleton; Y¹¹ represents a single bond or a divalent organic group; Y² represents a single bond or a di- or tri-valent organic group; X³ represents a hydrogen atom or a reactive functional group; R^a represents a hydrogen atom or a hydrocarbon group; A³ represents a group represented by one of following Formulae (a) and (b):

wherein R¹⁰ represents a monovalent organic group, wherein, in each of Formulae (a) and (b), the left side is to be bonded to Y¹¹, and the right side is to be bonded to Y²; “n4” denotes an integer of 2 to 7; “m3” denotes an integer of 0 to 5; and “k2” denotes an integer of 0 to 2, wherein the total of “n4” and “m3” equals 2 to 7, and wherein two or more Y¹¹s, Y²s, X³s, A³s, and R¹⁰s per molecule, and two or more X³s and R^as, if present per molecule, may be the same as or different from one another, respectively.

The invention relates to a light shading resin composition for color filter, the characteristic of which is that it contains 80~90 wt% of solvent and solid content; relative to solid content, it contains 8~35 wt% of acrylic acid series photosensitive resin, 45~65 wt% of black pigment, silicon surfactant or fluorin surfactant and initiator for photopolymerization whose HLB value is below 8. The viscosity of the resin composition is between 1.0 and 10.0mPa.s; relative to all solvents, it contains 30~50 wt% of the first solvent having a acetoxyl group in molecule, 0~25 wt% of propylene-glycol diacetate as the second solvent, 30~50 wt% of the third solvent having structure of 3-ethoxy propionic acid in molecule, 10~30 wt% of alicyclic compound having a carbonyl as the fourth solvent. Consequently, it has excellent evenness when coating, dryness of coating substrate and solid components' solubility.