42results about How to "High atomic ionization rate" patented technology

The invention discloses method and equipment for prolonging the life of a push rod component in a sealed relay. In the method, a superhard wear-resistant film layer with good insulating property is deposited on the surface of a push ball in the push rod component by a low-energy ion beam technology; and the film is prepared by the following steps: injecting a layer of metal 'pinning layer' capable of improving binding force of the film into glass surface by a metal vapor vacuum arc (MEVVA) ion source method; depositing a first metal film transition layer for releasing internal stress on the metal 'pinning layer' by a magnetic filtered cathodic vacuum arc (FVCA) deposition method; and depositing a superhard wear-resistant DLC layer on the first transition layer by the magnetic FVCA deposition method, wherein the total thickness of the film is 0.1-5 microns. Through the invention, the life of the push ball in the push rod component of the sealed relay can be obviously prolonged by depositing the superhard DLC film on the push rod component of the sealed relay.

The invention discloses a making method and a making apparatus for depositing a metal film with ultrahigh bonding strength on the surface of a polytetrafluoroethylene substrate based on an ion beam technology, and a making method and a making apparatus of a circuit board. The making method for depositing the metal film with ultra strong bonding force comprises the following steps: 1, making a metal "injection + diffusion" layer: carrying out large-beam cleaning on the substrate by using a gas ion source, and injecting a metal element to the substrate layer by using a 40KV high-energy metal vapor vacuum arc (MEVVA) ion source to form the metal "injection + diffusion" layer; and 2, making the metal film: depositing the metal film with the thickness of 1-10[mu]m by using a 90DEG magnetic filtered cathode vacuum arc (FCVA) system. The metal film and a polytetrafluoroethylene base material made by adopting the making methods and the making apparatuses have very high bonding force and very high stripping resistance.

The invention discloses a self-supporting tin thin film with a mass thickness of 700-1000 microgram / cm<2> and a preparation method thereof. The method comprises the following steps that a potassium chloride release agent is deposited on the surface of a substrate; (2) a copper oxide buffer thin film is deposited on the surface of the substrate by adopting a 90-degree magnetic filtration cathode vacuum arc (FCVA) system; (3) a sample is rotated by 180 degrees, and a straight-pipe magnetic filtration cathode vacuum arc (FCVA) system is adopted for depositing the tin thin film again; (4) the obtained substrate is put into a container filled with an ethanol solution for a de-molding treatment; and (5) the tin thin film is fished up by using a fishing plate to obtain the self-supporting tin thin film with the mass thickness of 700-1000 microgram / cm<2>. By adopting the preparation method, the self-supporting tin thin film which has the mass thickness with 700-1000 microgram / cm<2>, stress islow, uniform and compact can be prepared; and the process is simple.

The invention relates to a Cr / CrNx heat insulating film for the top surface of an aluminium alloy piston and a preparation method of the Cr / CrNx heat insulating film. The Cr / CrNx heat insulating filmis formed by a pure metal Cr layer attached to the top surface of the aluminium alloy piston and a CrNx layer coating the pure metal Cr layer uniformly. The preparation method of the Cr / CrNx heat insulating film comprises the following steps: firstly, the cleaned and dried aluminium alloy piston is placed in an FCVA (filtered cathodic vacuum arc) deposition system, a magnetic filtered Ti power arcis switched on, and the pure metal Cr layer is deposited with a pure metal Cr target as a cathode; the aluminium alloy piston with the pure metal Cr layer on the top surface is obtained; then the pure metal Cr target is taken as the cathode, nitrogen is taken as working gas, the nitrogen introducing amount is regulated, and the CrNx layer is generated on the pure metal Cr layer of the aluminium alloy piston with the pure metal Cr layer on the top surface. The strength, the wear resistance and the heat insulation performance of the obtained product are all better than those of the existing products, requirements of modern engines for high power and low emission can be met, and large-scale industrial application is facilitated.

The invention discloses a manufacturing method and equipment for a conductive layer in a novel electronic cigarette atomizer device based on the ion beam technology. The preparation method for preparing the conductive layer in the electronic cigarette atomizing device comprises the following steps of: taking porous aluminum nitride ceramic as a basal body, adopting a magnetic filter metal cathode vacuum arc (FCVA) technology, depositing a first metal nitride conductive layer on the surface of the basal body, and depositing on the first layer by adopting the FCVA process to obtain a second metal layer; and depositing on the second metal layer by adopting the FCVA depositing method to obtain a third conductive metal nitride layer, wherein the total thickness of the three layers of composite films is 1-10 microns, and the resistance is 1-10 ohms. According to the manufacturing method and the equipment, the novel electronic cigarette atomizer device with a long service life can be manufactured.

The invention relates to a preparation method for a super-thick energy absorption coating layer. The preparation method comprises the steps that S01, a substrate is subjected to gas ion source cleaning; S02, the substrate is subjected to high-power pulse metal ion cleaning; S03, acetylene and nitrogen are injected for CrAlNC deposition; S04, an acetylene valve is closed, and ZrN is deposited through high-power pulse magnetic control; S05, the nitrogen is stopped, and the acetylene is injected for CrAlC deposition; and S06, a film layer is circularly deposited till the thickness of the film layer is larger than 20 [mu]m. According to the preparation method provided by the embodiment of the invention, through the mode of combining a gas ion source technology and a high-power pulse magnetic control technology with a multi-arc ion plating technology, the deposited super-thick coating layer is small in internal stress and good in toughness, impact resistance and energy absorption performance. The preparation method is simple, easy to implement, low in cost and high in efficiency, and then is quite suitable for batch production.

The invention discloses a large-scale self-supporting gallium thin-film and a preparation method thereof. The preparation method comprises the following steps that (1) a potassium chloride release agent is deposited on the surface of a substrate; (2) a magnesium oxide buffer thin-film is deposited on the surface of a substrate by adopting a 90-degree magnetic filtration cathode vacuum arc (FCVA) system; (3) a sample is rotated by 180 degrees, and a gallium thin-film is deposited again by adopting a straight tube magnetic filtration cathode vacuum arc (FCVA) system; (4) the obtained substrate is put into a container filled with ethanol solutions for demoulding treatment; and (5) the gallium thin-film is fished with a fishing plate to obtain a self-supporting gallium thin-film with mass thickness of 500-1000[mu]g / cm<2>. According to the large-scale self-supporting gallium thin-film and the preparation method thereof, the self-supporting gallium thin-film with the mass thickness of 500-1000[mu]g / cm<2>, low stress, uniformity and density is prepared, and process is simple.