48results about How to "Improve focus characteristics" patented technology

A zoom lens including a first lens unit exhibiting a positive refractive power and always being statically positioned along an optical axis when a power of the zoom lens is varied or the focusing is conducted and including a reflective optical element for bending an optical path, a second lens unit exhibiting a negative refractive power and including a negative lens, a negative lens and a positive lens, along the optical axis in this order from an object side, a third lens unit exhibiting a positive refractive power, a fourth lens unit exhibiting a positive refractive power, and including at least two positive lenses, and a fifth lens unit exhibiting a negative refractive power, wherein the second lens unit, the fourth lens unit and the fifth lens unit are moved for varying the power of the zoom lens.

A field emission display (FED) is provided. The FED has an emitter structure where the emitter, a conductor and a cathode electrode are so arranged to produce a certain electric field about the emitter. The electric field about the emitter causes the electron beam emitted from the emitter to have improved focus and have less dispersion. This causes the electron beam to hit the intended pixel without exciting phosphor layers in neighboring pixels, thus improving image quality.

An optical pickup device includes a single objective lens that focuses a light beam to irradiate an optical disk, and an objective lens actuator that drives the objective lens. The objective lens actuator includes a lens holder that holds the objective lens. Two gaps (Ga, Gb) are formed between the lens holder and the objective lens. In an xy plane in which the center of the objective lens is defined as an origin, the tracking direction is defined as an y axis, and the tangential direction of tracks of the optical disk is defined as an x axis, the gap (Ga) is positioned at least in the first quadrant of the xy plane, and the gap (Gb) is positioned at least in the third quadrant of the xy plane.

A field emission display (FED) is provided. The FED has an emitter structure where the emitter, a conductor and a cathode electrode are so arranged to produce a certain electric field about the emitter. The electric field about the emitter causes the electron beam emitted from the emitter to have improved focus and have less dispersion. This causes the electron beam to hit the intended pixel without exciting phosphor layers in neighboring pixels, thus improving image quality.

Provided are a solid-state imaging device (1), a method of manufacturing the solid-state imaging device, and electronic equipment. A solid-state imaging device includes a substrate (22) in which a plurality of pixels (2) are formed. In addition, a plurality of grooves (27) are formed in the substrate, particularly in pixel isolation regions (31) between adjacent pixels. The groove extends from the first surface of the substrate toward the second surface of the substrate. A buried film (29) extends into the groove. At least some of the grooves include a first level adjacent to the first surface of the substrate and a second level adjacent to the second surface of the substrate, the first level and the second level being defined by walls of the groove, wherein the first level is wider than the second level, and wherein there is a step (15) between the first level and the second level. Additionally, the device includes a light shielding film (30) on the groove adjacent to the first surface of the substrate. A part of the light-shielding film is buried in the buried film extending into the groove.

A shadow mask is arranged to face a phosphor screen formed on an inner surface of a panel. A plurality of aperture columns are formed in parallel in the shadow mask. Each aperture column includes a plurality of apertures arranged in line at a predetermined interval. On both sides of each aperture column on the surface of the shadow mask facing the electron gun, stripe-shaped dielectric layers for acting on electron beams toward the apertures are formed respectively, and extend in substantial parallel with the aperture columns. The shadow mask is manufactured in such a manner that stripe-shaped insulating material layers are formed on the surface of a mask base material facing the electron gun, the mask base material is thereafter shaped into a predetermined shape, and the insulating material layers on the shaped mask are sintered.

The invention discloses a self-adaptive closed-loop control flying optical path mechanism and a control method thereof. The flying optical path mechanism comprises a laser, a flying optical path and a drive control system; the flying optical path comprises a flying focusing head and a binocular system; the binocular system comprises an eyepiece and an object lens; the flying focusing head comprises a plane mirror and a focusing mirror; the laser and the eyepiece are relatively fixedly arranged; light beams which are emitted by the laser are reflected to the focusing mirror for focusing by sequentially passing through the eyepiece and the object lens; and the drive control system can drive the object lens and the focusing mirror to carry out the reciprocating motion along an optical axial line according to the position signals of the flying focusing head and the focusing mirror. The flying optical path mechanism has high-performance self-adaptability, and can improve the focusing feature of the flying light beams, accurately and reliably compensate the change of the depth of focus of a laser focus point and obtain the set focus size and the depth of the focus through controlling the positions of the beam expanding object lens and the focusing mirror along with the change of the flying distance; furthermore, the method is simple and reliable, a complicated control unit of a deformable mirror is eliminated, the structure is simple, and the cost is low.