A piezoelectric micromirror structure comprises a substrate
wafer, a reflector
metal surface, a
cantilever beam structure, a
metal connecting wire, a piezoelectric film, a cover plate
wafer, a bondinginterface and a
getter box, wherein the substrate
wafer is used as a supporting and structural layer of the micromirror, the
metal connecting wire is a film-shaped connecting wire, and the piezoelectric film is arranged on the
cantilever beam structure. According to the preparation method for the piezoelectric micromirror structure, the substrate wafer is used as a supporting and structural layerof the micromirror, and a cavity is formed after
wafer bonding; a metal reflecting mirror surface of the micromirror is manufactured by utilizing a
physical vapor deposition plan, a photoetching technology, an
etching or stripping technology and a
polishing technology; the piezoelectric film is prepared on the
cantilever beam by using a
physical vapor deposition or
chemical vapor deposition technology, the photoetching technology and the
etching technology. The structure has the advantages that the
processing is simple, the cantilever beam structure is adopted, the piezoelectric material is deposited on the cantilever beam structure, the metal surface is used as a reflector, one or more groups of arranged mirror surfaces can be packaged, the function of an
optical switch and a higher
deflection angle are realized, and the
displacement control is accurate.