A piezoelectric micromirror structure comprises a substrate wafer, a reflector metal surface, a cantilever beam structure, a metal connecting wire, a piezoelectric film, a cover plate wafer, a bondinginterface and a getter box, wherein the substrate wafer is used as a supporting and structural layer of the micromirror, the metal connecting wire is a film-shaped connecting wire, and the piezoelectric film is arranged on the cantilever beam structure. According to the preparation method for the piezoelectric micromirror structure, the substrate wafer is used as a supporting and structural layerof the micromirror, and a cavity is formed after wafer bonding; a metal reflecting mirror surface of the micromirror is manufactured by utilizing a physical vapor deposition plan, a photoetching technology, an etching or stripping technology and a polishing technology; the piezoelectric film is prepared on the cantilever beam by using a physical vapor deposition or chemical vapor deposition technology, the photoetching technology and the etching technology. The structure has the advantages that the processing is simple, the cantilever beam structure is adopted, the piezoelectric material is deposited on the cantilever beam structure, the metal surface is used as a reflector, one or more groups of arranged mirror surfaces can be packaged, the function of an optical switch and a higher deflection angle are realized, and the displacement control is accurate.