47results about How to "Uniform annealing" patented technology

At edges of laser light on an irradiation surface or in the vicinity thereof, the energy density is attenuated gradually due to aberration of a lens or the like. Since such regions (attenuation regions) do not have enough energy density for annealing of an irradiation object, uniform annealing of the irradiation object is not possible.

In the present invention, one of the plural laser beams is divided into two laser beams so that each section of the two laser beams serves as an edge of the resultant laser light. Each attenuation region of the two laser beams is synthesized with an attenuation region of another laser beam. In this way, laser light every part of which has an energy density suitable for satisfactory annealing of an irradiation object can be obtained from plural laser beams having attenuation regions.

The speed of the laser scanned by the scanning means such as a galvanometer mirror or a polygon mirror is not constant in the center portion and in the end portion of the scanning width. As a result, the object, for example an amorphous semiconductor film, is irradiated with the excessive energy and therefore there is a risk that the amorphous semiconductor film is peeled. In the present invention, in the case where the laser spot of the energy beam output continuously on the irradiated object is scanned by moving it back and forth with the use of the scanning means or the like, the beam is irradiated to the outside of the element-forming region when the scanning speed of the spot is not the predetermined value, for example when the speed is not constant, and accelerates, decelerates, or is zero, for example in the positions where the scanning direction changes, or where the scanning starts or ends.

The invention relates to an annealing process for growing a large-size sapphire crystal by a kyropoulos method. After a large-size sapphire crystal grows by a kyropoulos method, the vacuum degree in a single crystal furnace is maintained, the heater power is gradually reduced, and the cooling is performed in five stages until the heater power is zero; through staged thermal insulation annealing, the dislocation density of large-size sapphire can be effectively reduced, internal stress of the crystal is eliminated, and the quality and the utilization rate of the crystal are improved; the annealing time is short, the energy consumption is reduced, and the growth period of the large-size sapphire crystal is shortened; moreover, the sapphire crystal is rotated in a thermal insulation stage so that the sapphire crystal annealing is uniform and the influence of non-uniform temperature field in annealing is eliminated.

The invention discloses a high-frequency annealing device of a semi-automatic bearing. The high-frequency annealing device comprises a machine frame and a high-frequency power supply device, wherein the high-frequency power supply device is fixed on a left-side supporting plate of the machine frame; a feeding device, a rotating device, a lifting device and a discharging device are fixed on the right-side supporting plate of the machine frame, the lifting device is fixed on the reverse side of the right-side supporting plate of the machine frame, the rotating device is fixed on a push rod of the lifting device, and a rotating shaft of the rotating device is inserted and sleeved in a circular through hole formed in the right-side supporting plate; an induction coil is mounted on the high-frequency power supply device, and is above the right-side supporting plate, and the induction coil and the rotating shaft share the same central axis; the feeding device and the discharging device are fixed on the upper plane of the right-side supporting plate, a feed end of a feed plate of the feeding device faces to the circular through hole, and a discharging end of a discharging plate of the discharging device faces to the circular through hole. The high-frequency annealing device can automatically feed to anneal, the hardness of the inner ring of the bearing is ensured, annealing is even, the secondary quenching phenomenon is not generated, the processing quality is increased, and the stability is good.

An object of the present invention is to provide a compact laser irradiation device and a laser irradiation method using an optical system including an electric mirror and an fθ lens, which can suppress interference caused by secondary beams on the back side of a substrate Therefore, uniform laser annealing can be performed on the irradiated object, and the throughput can be improved. In the present invention, when it is assumed that the thickness of the substrate on which the object to be irradiated is formed is d, the refractive index is n, and the speed of light in vacuum is defined as c, the pulse width t of the laser beam satisfies the inequality ct<2nd. In the above structure, even if an optical system including an electric mirror and an fθ lens is used, the influence of interference due to the secondary beams on the backside of the substrate can be reduced, so that uniform laser annealing can be performed on the object to be irradiated.

The present invention discloses the semiconductor device having the substrate that reflects the laser beam on a surface; that absorbs the laser beam therein; or that partially reflects the laser beam on the surface and partially absorbs the laser beam in the laser annealing. Moreover, the substrate has a poly-crystalline semiconductor film having a large grain size. The present invention suppresses the effect due to the reflected light from a rear surface of the substrate and therefore the uniform laser annealing can be performed.

The invention relates to an annealing technique and an annealing device. The annealing technique for chunk foam glass is as follows: the annealing is performed in a kiln, and the chunk foam glass is annealed by adoption of the continuous mesh-belt conveying means; and the temperature of a hearth of the kiln is gradually reduced from the high temperature on an inlet to the normal temperature on an outlet. The annealing device for the chunk foam glass comprises the kiln, wherein, the inside of the furnace is provided with a continuous mesh-belt conveyer, provided with 20 to 50 temperature decreasing regions from the inlet to the outlet, and is also provided with a temperature control system. Due to adoption of continuous mesh-belt conveying of the chunk foam glass, continuous operation is realized; due to adoption of gradual temperature reduction in the kiln, the uniform annealing for a long time is realized, thereby high-performance foam glass with difficulty in fracture, high strength and low thermal conduction is produced; and due to arrangement of a plurality of temperature regions inside the furnace, the temperature is convenient to control independently.

The invention relates to the technical field of double zero aluminum foil annealing and discloses an annealing technology for 8006-alloy double zero aluminum foil. The annealing technology for the 8006-alloy double zero aluminum foil comprises the following specific steps that firstly, outside-furnace standing is conducted; secondly, inside-furnace pretreatment is conducted; thirdly, uniform annealing is conducted; fourthly, intermediate temperature annealing is conducted; fifthly, low temperature annealing is conducted; sixthly, inside-furnace cooling is conducted; and seventhly, the aluminumfoil is discharged from the furnace. By means of the annealing technology for the 8006-alloy double zero aluminum foil, the number of hot-bulged rolls and the hot bulging depth can be lowered; the scrapping amount generated by hot bulging is lowered; and the production cost is lowered.

The invention relates to a glass rod material preparation method and a glass rod material preparation device. The glass rod material preparation method comprises the following steps: (a) putting a material into a material barrel; (b) feeding protection gas into the material barrel, a forming mold and a collimating mold; (c) controlling a heating unit to perform heating, preserving the heat till the temperature in the heating unit reaches softening temperature Ts of the material, controlling an annealing unit to be heated, and preserving the heat till the temperature in the annealing unit reaches annealing temperature of the material; (d) extruding the softened material, wherein after passing through the material barrel and being prepared into a rod material through the forming mold, the material enters the collimating mold; (e) enabling the heating unit to stop heating, naturally cooling the heating unit, preserving the heat of the annealing unit, and after the annealing unit is subjected to heat preservation for T, naturally cooling the annealing unit; and (f) after the annealing unit is cooled, taking out the material, and collimating and forming the material through the collimating mold, thus preparing the glass rod material. The forming mold is detachable, thus facilitating production of glass rod materials with different sizes; and furthermore, one forming mold can be provided with multiple through holes, so that the glass rod material production efficiency is improved.

The invention relates to a method for preventing weld seam strip breakage of thin material strip steel. The method is characterized by comprising the following steps of (1) welding control; (2) entryloop control; (3) continuous annealing control; (4) air knife control; and (5) leveling and withdrawing-straightening control. The method effectively avoids the technical problem of the weld seam strip breakage of the strip steel through the coordinated control of multiple steps.

The invention discloses an annealing and drawing device for an oxygen-free copper tube, with high diameter-to-thickness ratio, for a mobile phone heat pipe. The annealing and drawing device comprisesa box body; a drawing die is mounted in the box body; an annealing pipe is mounted between the drawing die and the box body; a heating wire is wound around the side wall of the annealing pipe; a fixing plate is arranged on one side of the drawing die; a supporting roller is rotationally connected onto the fixing plate; a tension adjusting mechanism is arranged on one side of the supporting roller;a mounting plate is arranged on the outer side of one end, close to the tension adjusting mechanism, of the box body; the mounting plate is mounted on the ground; a supporting frame is fixed to one side of the upper end of the mounting plate; a servo motor is fixed to the upper end of the supporting frame; a rotating shaft is fixed to the end part of an output shaft of the servo motor; a windingwheel is in keyed connection onto the rotating shaft; and a supporting mechanism is arranged at one end, far from the servo motor, of the rotating shaft. Through the adoption of the structure, the oxygen-free copper tube for the mobile phone heat pipe is uniform in annealing, and uniform in drawing traction, and the production quality of a rope is improved.

A laser exposure apparatus is disclosed. The laser exposure apparatus includes: a laser light source including a multi-transverse mode semiconductor laser; a far-field pattern forming optical system for forming a far-field pattern of multi-transverse mode laser light emitted from the laser light source; a condensing optical system for condensing the laser light emitted from the far-field pattern forming optical system and applying the condensed laser light to a substance to be exposed; and a coherency reducing means disposed in an optical path between the laser light source and the substance to be exposed, for reducing coherency of two wavefront components that are contained in high-order transverse mode light of each order emitted from the laser light source and propagate in substantially symmetrical directions with respect to the optical axis.

The invention discloses an aluminum wire straightening method of an enamelling machine annealing furnace and a mechanism of the enamelling machine annealing furnace. The method comprises the following step of straightening an aluminum wire in an annealing furnace body by bypassing more than two straightening wheels sequentially, thereby improving the straightness of an enamelled wire after annealing. According to the invention, the straightness of the aluminum wire can be improved effectively; the problem of naked aluminum lead surface scratch caused by poor straightness is solved; the product performance is improved; additionally, the cooling effect in the annealing working procedure is ideal, and the quality problem of instability of paint membrane continuity, breakdown voltage and the like which are troubled for a long time in the aluminum enamelling wire manufacturing industry is solved. Meanwhile, the aluminum wire straightening method of the enamelling machine annealing furnace and the mechanism of of the enamelling machine annealing furnace are simple in structure, low in cost and suitable for industrialization.

The invention discloses a conveying mechanism for penicillin bottles during annealing of penicillin bottles. The conveying mechanism comprises an annealing furnace net belt and transmission chains arranged on two sides of the annealing furnace net belt, wherein the transmission chains comprise chain links and chain pins; the transmission chains are characterized in that chain pins are arranged inwards in an extending manner to be provided with connecting pins; the annealing furnace net belt comprises a plurality of conveying rollers which are arranged in parallel; the end parts of the conveying rollers are connected with the connecting pins; a plurality of V-shaped pillow plate groups are arranged in parallel along the conveying direction on the annealing furnace net belt; and each of the V-shaped pillow plate groups consists of at least two V-shaped pillow plates which are axially arranged on the conveying rollers along the conveying rollers from one end to the other end. The conveying mechanism disclosed by the invention has the advantages of being suitable can be for automated production line, capable of effectively guaranteeing the quality of the penicillin bottles, and being simple in structure and simple and convenient to produce.

The invention discloses a preparation device for a high-strength corrosion-resistant alloy plate, and a corrosion-resistant alloy plate thereof. A limiting plate is welded at the top end of a sintering placement plate, and a shaping box is clamped at the side end of the limiting plate; an inner extrusion plate is placed at one end of the shaping box, and an extrusion spring is welded at one end of the inner extrusion plate; the outer side of the extrusion spring is sleeved with a double-layer protection sleeve; one end of the extrusion spring is spot-welded on an outer extrusion plate, and a cooling fan is installed at the top end of a sintering furnace; an exhaust pipe penetrates through the top end of an air collecting box, and an inlet-outlet pipe penetrates through the top end of an inlet-outlet box; the air inlet end of the inlet-outlet pipe is installed at the top end of the gas tank in a penetrating mode. Liquid-phase metal is extruded through the inner extrusion plate an the extrusion spring, and therefore the occupied space of molten metal is reduced; meanwhile, gas contained in liquid phases can be extruded during extrusion, and therefore the amount of the gas in the metal is reduced; the gas in the metal is exhausted through repeated pumping and inflating of the gas tank, and the influence of the gas on the metal in a solid-liquid state during sintering is reduced; and the quality and yield of the metal are guaranteed.

The invention discloses an efficient annealing system suitable for heat treatment of amorphous nano steel. The efficient annealing system comprises a feeding chamber, a treatment chamber for centralized annealing treatment and a material taking chamber for receiving treated materials. An annealing device is arranged in the treatment chamber. The annealing device comprises a heating box. A heat dissipation box is welded to one side of the heating box in a penetrating mode. A cooling box is welded to one side of the heat dissipation box in a penetrating mode. Materials are placed in the heatingbox, the heat dissipation box and the cooling box. A water tank is installed below the cooling box. A water pump is installed on one side of the water tank. A transparent window is installed on the front surface of the water tank. A control box is installed on the upper surface of the cooling box. Chains are installed on the front surfaces of the heating box, the heat dissipation box and the cooling box. A motor is installed on one side of the heating box. A heat dissipation fan is installed on the upper surface of the heat dissipation box. According to the efficient annealing device for heattreatment of amorphous nano steel, the heating box, the heat dissipation box and the cooling box are arranged, the annealing structure is reasonable, the cooling device is provided with a heat dissipation structure, and the structure of the device is simple.