11 results about "CHOLINE HYDROXIDE" patented technology

The invention provides compositions useful in the etching of polysilicon in the presence of silicon oxide and silicon nitride. The compositions comprise choline hydroxide, an oxidizing agent such as periodic acid, and optionally a surfactant, and are useful in the etching of polysilicon in general, and in particular in both the operation of polysilicon trim as well as polysilicon exhume. The utilization of an added oxidizing agent was found to reduce selectivity of silicon etching based on the silicon crystal orientation, which was found to reduce roughness and the presence of residual silicon residues, such as silicon (111) residues after the etching step.

The application discloses a kind of choline-amino acid ionic liquid for efficiently enriching TG, EPA or DHA in oil, and a preparation method and application thereof, and belongs to the technical field of ionic liquid preparation.The method comprises dissolving amino acid in water, adding choline hydroxide, then heating to 50-70 DEG C to react, after reaction is completed, purification is carried out, and choline-amino acid ionic liquid is obtained, wherein the molar ratio of amino acid to choline hydroxide is 1: (0.5-2.5).The choline-amino acid ionic liquid is green and pollution-free, and can be used for crude oil refining in food, medicine and other fields, especially suitable for crude oil containing DHA, EPA, such as algal oil and fish oil, and can complete degumming, deacidification and decolorization process in one step, significantly simplifying the crude oil refining process, reducing energy consumption and waste discharge.

The application belongs to the technical field of medicine, and specifically discloses a glycyrrhetinic acid injectable hydrogel as well as a preparation method and application thereof. The preparation method of the glycyrrhetinic acid injectable hydrogel comprises the following steps: glycyrrhetinic acid and choline hydroxide are added into pure water, heated and stirred to fully react, and a mixed solution is obtained; the mixed solution is first spin-evaporated and then vacuum-dried to obtain glycyrrhetinic acid-choline; the glycyrrhetinic acid-choline is added into pure water, heated to completely dissolve and cooled at room temperature to form an injectable hydrogel. The hydrogel is used for preparing an antitumor drug in an injectable dosage form. In the application, the glycyrrhetinic acid and the choline hydroxide are self-assembled into a hydrogel with a three-dimensional network microstructure by losing one molecule of water without adding any cross-linking agent and organic solvent. The hydrogel can quickly recover to the original gel state after injection, and the problems of low drug loading, low bioavailability and difficult degradation existing in the prior art are solved.

The application provides a degradable water-based ink and a preparation method thereof, and belongs to the technical field of novel ink preparation. Unsaturated vegetable oil is used as raw material, non-isocyanate polyhydroxy polyurethane is prepared through epoxidation, CO2 carbonation and diamine ring-opening polymerization, carboxyl groups are introduced through acid anhydride, and water-phase self-emulsifying dispersion is realized through main neutralization of arginine and auxiliary neutralization of choline hydroxide, so that biological base and low odor and low VOCs are considered from the source; the obtained polyhydroxy polyurethane has the functions of connecting material and pigment anchoring and dispersing, the dependence on traditional dispersants and a large amount of surfactants is reduced through segmented pulping and ink releasing process; nanocellulose is introduced to realize shear thinning and thixotropic recovery to improve printing adaptability, and a cobalt-free manganese / iron catalytic drying system is used to improve the scratch resistance and water resistance under mild conditions; through the above multi-link cooperation, the comprehensive balance of sustainability, stable dispersion and printing performance is realized.

The present invention relates to a cleaning composition and a cleaning method for a CMP process performed during the manufacturing process of a glass substrate-based Through Glass Via (TGV) structure. The cleaning composition comprises a quaternary ammonium salt, an alkanolamine, a glycol ether, an azole compound, a surfactant, and water. By including tetramethylammonium hydroxide and choline hydroxide as the quaternary ammonium salt in a specific ratio, the cleaning composition effectively removes polishing particles and organic residues remaining after the CMP process even under high alkaline conditions of pH 12 or higher, while suppressing excessive corrosion of the glass substrate and metal wiring, allowing the cleaning solution to penetrate uniformly into the high aspect ratio via, and simultaneously removing residual contaminants and preventing re-adsorption.

The invention discloses a preparation method of a catalyst for preparing acrolein through propylene oxidation, and relates to the technical field of acrolein catalytic synthesis. Ammonium molybdate, potassium nitrate and a crystal growth modifier are prepared into a mixed solution A; preparing bismuth nitrate and an acidic reagent into an acidic bismuth nitrate solution, and further mixing the acidic bismuth nitrate solution with the metal salt solution containing iron, cobalt and nickel to obtain a mixed solution B; carrying out precipitation reaction on the mixed solution A, the mixed solution B and a precipitator in a supergravity reactor, and obtaining precursor slurry after the reaction is completed; carrying out hydrothermal treatment on the precursor slurry, washing, drying, calcining, mixing with a carrier and an auxiliary agent, tabletting, and carrying out secondary calcining to obtain the catalyst. According to the preparation method of the acrolein catalyst, the catalyst prepared by using the crystal growth modifier and the choline hydroxide precipitator in combination with the supergravity coupling hydrothermal reaction has a relatively high active crystal face exposure proportion and relatively good catalyst selectivity.

The application provides a method for selectively recovering metal elements in waste batteries by using a functional deep eutectic solvent, which comprises the following steps: mixing choline chloride, phosphoric acid and a choline hydroxide solution to obtain a deep eutectic solvent DES; pretreating a positive electrode of a waste lithium iron phosphate (LFP) battery and a waste lithium cobalt oxide (LCO) battery; and immersing the positive electrode in the deep eutectic solvent DES to make Li + enriched into the leaching solution, Fe is converted into FePO4 and left in the residue, and then cobalt is recovered by "ethanol-induced precipitation", lithium is recovered by "pH-controlled precipitation", and the DES is regenerated. 2+ This method realizes the closed loop of lithium iron phosphate and lithium cobalt oxide battery recycling in a green and economic way through the strategies of segmented targeted leaching and selective coordination precipitation, combined with solvent regeneration.

This invention relates to the field of wet electronic chemicals technology and discloses a neutral metal cleaning agent for photomasks and its preparation method, comprising: 1.8% to 2.2% free acidic phytic acid, 0.55% to 0.75% ethoxylated acetylenic glycol with a specific EO addition number (3.5), a choline hydroxide-acetic acid buffer pair to maintain a neutral environment, and ultrapure water. This invention utilizes a geometrically complementary anti-dilution desorption adsorption layer formed on the metal surface by phytic acid and ethoxylated acetylenic glycol at a specific mass ratio (2.8:1-3.2:1). This layer maintains a negative Zeta potential and provides steric hindrance during the non-equilibrium process of ultrapure water rinsing, blocking the reverse pinning of submicron particles. This adsorption layer can inhibit intergranular corrosion and pitting on the metal surface, achieving non-destructive cleaning of precision patterns.

The invention discloses a method for preparing lignin with high hydroxyl content and low condensation degree by using moso bamboo as a raw material, and belongs to the technical field of renewable energy sources. According to the method, 1, 4-butanediol is adopted to assist alkaline choline hydroxide DES, and under the condition of microwave radiation, the moso bamboo is subjected to microwave pretreatment; after the pretreatment is finished, performing centrifugal solid-liquid separation, performing enzyme hydrolysis on the solid, and treating the filtrate to obtain the lignin with high hydroxyl content and low condensation degree. According to the method, moso bamboo lignocellulose can be effectively deconstructed, phenolic hydroxyl condensation is reduced, the weight-average molecular weight of the obtained lignin is not higher than 1200 g / mol, the number-average molecular weight of the obtained lignin is not higher than 700 g / mol, and the total hydroxyl content of the obtained lignin is larger than 6 mmol / g.

This invention discloses an environmentally friendly and efficient 4H-SiC polishing slurry and its preparation method, belonging to the technical field of polishing compositions. The 4H-SiC polishing slurry of this invention comprises the following components: 1.5 wt.%~6 wt.% abrasive, 0.2 wt.%~0.4 wt.% photocatalyst, 2 wt.%~4 wt.% H2O2, an organic base pH adjuster to adjust the pH value of the 4H-SiC polishing slurry to 8~11, and the balance being water; wherein the organic base pH adjuster includes at least one of tetramethylammonium hydroxide, tetraethylammonium hydroxide, and choline hydroxide. The composition design of this invention is simple and easy to prepare. It has a high material removal rate for 4H-SiC, significantly reduces surface roughness after polishing, and is environmentally friendly and pollution-free, possessing the advantages of being environmentally friendly and efficient, and has broad application prospects in high-precision polishing of 4H-SiC.

The invention relates to a carbonized organic matter cleaning solution. The cleaning solution is composed of an oxidizing agent, an alkaline activator, a chelating dispersant, a cleaning aid, a surface wetting low-foaming agent, a slow-release film-forming agent and deionized water. The oxidant is hydrogen peroxide; the alkaline activator is at least one of potassium hydroxide, choline hydroxide and tetramethylammonium hydroxide; the chelating dispersant is at least one of tetrasodium glutamate diacetate and 1-hydroxyethylidene-1, 1-diphosphonic acid; the cleaning auxiliary agent is capryloyl hydroximic acid, and the surface wetting low-foaming agent is at least one of ethoxylated alkynediol and dodecyl dihydroxyethyl amine oxide; the corrosion inhibition-film forming agent is at least one of 5-amino tetrazole and polysiloxane quaternary ammonium salt-17. The cleaning solution can oxidize, degrade and completely dissolve coke-shaped oxygen-enriched carbon network pollutants, has good removal capability on metal impurities in a tank body, and is suitable for carbonized organic pollutants which are formed in a cleaning tank in a semiconductor cleaning process and are difficult to remove.