The latest invention patents collect the data information of China invention patents from 2000 to 2024, typesetting according to the date of patent publication, including patent number, application date, invention Bibliographic data, abstracts, and specification data of people are convenient for scientific researchers to quickly browse and search for patents.
ActiveCN110868095BRealize the power conversion functionWith current limiting functionEmergency protective circuit arrangementsAc-dc conversionNetwork communicationAlternating current
ActiveCN106570343BImprove collection efficiencyRealize self-service collectionMedical data managementApparatus for meter-controlled dispensingThird partyCollection system
InactiveCN101411757BOvercome residualOvercome the lack of antibacterial efficacyOrganic active ingredientsPharmaceutical delivery mechanismEscherichia coliTherapeutic effect
ActiveCN111440228BHigh sensitivityShorten the steps to prepare monoclonal antibodiesSsRNA viruses negative-senseViral antigen ingredientsAntigen epitopeVirus Protein
ActiveCN104974128BImprove stabilityExtended service lifeOrganic chemistryOrganic-compounds/hydrides/coordination-complexes catalystsPhosphonium saltReaction temperature
ActiveCN113499278BImproved ability to stabilize water systemsImprove stabilityCosmetic preparationsToilet preparationsSODIUM METAPHOSPHATESodium phosphates
ActiveCN112671534BPrevent leakageAvoid using effectsKey distribution for secure communicationUser identity/authority verificationInternet privacyEngineering
InactiveCN102948320BAccurately determineDetermining the method is comprehensive and scientificCultivating equipmentsHorticultureHorizontal distributionVertical projection
ActiveCN112355958BAct as a short-term supportTo achieve the effect of replacementPower driven toolsMetal-working hand toolsElectric machineArchitectural engineering
InactiveCN1287440CSo as not to damageImprove protectionSemiconductor/solid-state device manufacturingSemiconductor devicesStructural engineeringDielectric layer
InactiveCN103399465BSolve the problem of achieving double-sided lithographyReduce processing costsPhotomechanical exposure apparatusMicrolithography exposure apparatusMicro nanoEngineering
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI