The invention provides a de-edged super back seal layer structure for a silicon wafer. The structure comprises a silicon dioxide back seal layer, wherein the silicon dioxide back seal layer is covered on the back surface of the silicon wafer; and a polycrystalline silicon back seal layer, wherein the polycrystalline silicon back seal layer is covered on the outer side of the silicon dioxide back seal layer and covers the back surface of the silicon wafer, a back surface slope edge area and an edge area. According to the de-edged super back seal layer structure for the silicon wafer, the positive surface slope edge of the silicon wafer only has monocrystalline silicon serving as a body material, and has a high-quality smooth surface, which hardly has no difference with a polished surface. The monocrystalline silicon layer is grown on the positive surface slope edge and the polished surface of the silicon wafer during epitaxy, so that seamless connection can be realized, stratification phenomenon does not occur, the problems of particle pollution, edge dislocation and pyramid in epitaxy are also solved, and process yield rate is improved.