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34results about How to "Short current path" patented technology

Vacuum switch tube for helical coil longitudinal magnetic field electrode

The invention provides a thread-coil type longitudinal magnetic field electrode vacuum switching tube which relates to the technical field of vacuum switches. The invention aims at providing a vacuum switching tube which has the arrangement disposal of the thread-coil type longitudinal magnetic field electrode so that the contradiction between the current conduction capacity and the short circuit current on-off capacity can be solved better. The vacuum switching tube comprises a moving conducting rod, a fixed conducting rod, a spiral coil, a spiral groove, a moving contact and a fixed contact which form a conducting loop. A coil of the vacuum switching tube takes the shape of a spiral body, and the turning direction of two thread coils arranged on a moving conductor and a fixed conductor is the same, and the moving contact and the fixed contact connected with the two thread coils are oppositely and longitudinally arranged. In the invention, the produced longitudinal magnetic field causes the vacuum arc produced between the contacts to keep in a non-aggregated state during the live cut-off; and the vacuum arc is extinguished when the current of an external circuit exceeds zero point, thereby the on-off of the circuit is finished.
Owner:湖北汉光科技股份有限公司

Semiconductor device and process for fabricating the same

A thin stacked semiconductor device suitable for high speed operation. A plurality of specified circuits are formed on one surface of a semiconductor substrate while being arranged, and wiring and insulating layers being connected electrically with the circuits are laminated and formed sequentially in a specified pattern to form a multilayer wiring part. At the stage for forming the multilayer wiring part, a filling electrode is formed on the semiconductor substrate such that the surface is covered with an insulating film, a post electrode is formed on specified wiring at the multilayer wiring part, a first insulating layer is formed on one surface of the semiconductor substrate, the surface of the first insulating layer is removed by a specified thickness to expose the post electrode, the other surface of the semiconductor substrate is ground to expose the filling electrode and to form a through-type electrode, forward end of the through-type electrode is projected by etching one surface of the semiconductor substrate, a second insulating layer is formed on one surface of the semiconductor substrate while exposing the forward end of the through-type electrode, bump electrodes are formed on both electrodes and then the semiconductor substrate is divided to form a semiconductor device. A plurality of semiconductor devices thus obtained are stacked and secured at the bump electrodes thus manufacturing a stacked semiconductor device.
Owner:阿奇里斯科技公司

Light emitting diode chip and manufacturing method therefor

ActiveCN105322068AMake sure the area stays the sameShort current pathSemiconductor devicesElectrical conductorOhmic contact
The invention provides a light emitting diode chip. The light emitting diode chip comprises a light emitting epitaxial laminated layer, a dielectric layer, a metal conductive layer, a conductive substrate, and a first electrode, wherein the light emitting epitaxial laminated layer comprises a first type semiconductor layer, a second semiconductor layer and an active layer sandwiched between the first type semiconductor layer and the second semiconductor layer; the dielectric layer is positioned on the lower surface of the light emitting epitaxial laminated layer and provided with a conductive through hole array; the metal conductive layer is positioned on the lower surface of the dielectric layer; the conductive through hole is filled with the metal conductive layer; the metal conductive layer and the light emitting epitaxial laminated layer form ohmic contact; the conductive substrate is positioned on the lower surface of the metal conductive layer for supporting the light emitting epitaxial laminated layer; the first electrode is positioned on the upper surface of the light emitting epitaxial laminated layer; the first electrode comprises a bonding pad electrode and a finger-shaped electrode; a rotation angle is between the conductive through hole array and the finger-shaped electrode; and the selection of the rotation angle enables the conductive through holes with the preferable quantity to be not shielded by the bonding pad electrode and the finger-shaped electrode. The invention also provides a method for manufacturing the light emitting diode chip.
Owner:TIANJIN SANAN OPTOELECTRONICS

Plug-in type miniature circuit breaker housing installation structure

The invention provides a plug-in type miniature circuit breaker housing installation structure, which comprises a housing body (1) of a hexagonal cuboid structure, and is characterized in that the upper portion of the left side surface of the housing body (1) is provided with a button (2), the left side surface is provided with a left wiring terminal 1 (3) and a left wiring terminal 2 (4) below the button (2), guide limiting grooves (101) are formed in the upper portion and/or bottom portion of the front side surface and/or rear side surface of the housing body (1), a right wiring groove 1 (5), an information line wiring groove (6) and a right wiring groove 2 (7) are formed in the right side surface of the housing body (1) from bottom to top in sequence, and buckles (8) are arranged on the upper side surface and/or lower side surface of the housing body (1) on one side of the button (2). The plug-in type miniature circuit breaker housing installation structure adopts a plug-in type customized interface, so that a loop in which a circuit breaker is arranged has the shortest current path in a whole low-voltage power transmission and distribution conductive system, and the installation and wiring spaces are saved, thus the materials are saved, and good economic benefit is generated.
Owner:SHANGHAI LIANGXIN ELECTRICAL

Silicon controlled rectifier electrostatic discharge protection structure

The invention discloses a silicon controlled rectifier electrostatic discharge protection structure which comprises a substrate, an N well, a first isolation groove, a second isolation groove, a third isolation groove, a first N + injection region, a first P + injection region, a second N + injection region, a second P + injection region, a first ESD injection layer and a second ESD injection layer. The N well is arranged in the surface area of the substrate; the N well is sequentially provided with a first isolation groove, a first ESD injection layer, a second isolation groove, a second ESD injection layer and a third isolation groove from one end to the other end; two sides of the first ESD injection layer are respectively connected with the first isolation groove and the second isolation groove, and two sides of the second ESD injection layer are respectively connected with the second isolation groove and the third isolation groove; a first N + injection region and a first P + injection region are arranged on the surface of the first ESD injection layer, and a second N + injection region and a second P + injection region are arranged on the surface of the second ESD injection layer. According to the embodiment of the invention, the electrostatic discharge protection effect can be effectively improved.
Owner:MICROTERA SEMICON (GUANGZHOU) CO LTD

Semiconductor device and process for fabricating the same

A thin stacked semiconductor device suitable for high speed operation. A plurality of specified circuits are formed on one surface of a semiconductor substrate while being arranged, and wiring and insulating layers being connected electrically with the circuits are laminated and formed sequentially in a specified pattern to form a multilayer wiring part. At the stage for forming the multilayer wiring part, a filling electrode is formed on the semiconductor substrate such that the surface is covered with an insulating film, a post electrode is formed on specified wiring at the multilayer wiringpart, a first insulating layer is formed on one surface of the semiconductor substrate, the surface of the first insulating layer is removed by a specified thickness to expose the post electrode, theother surface of the semiconductor substrate is ground to expose the filling electrode and to form a through-type electrode, forward end of the through-type electrode is projected by etching one surface of the semiconductor substrate, a second insulating layer is formed on one surface of the semiconductor substrate while exposing the forward end of the through-type electrode, bump electrodes areformed on both electrodes and then the semiconductor substrate is divided to form a semiconductor device. A plurality of semiconductor devices thus obtained are stacked and secured at the bump electrodesthus manufacturing a stacked semiconductor device.
Owner:TAIWAN SEMICON MFG CO LTD

Electrical connection elastic sheet, connector and electronic equipment

The invention discloses an electrical connection elastic sheet, a connector and electronic equipment. The electrical connection elastic sheet comprises a flat-plate-shaped welding part. A first elastic part and a second elastic part respectively extend upwards from two opposite sides of the welding part along the height direction of the welding part; the first elastic part and the second elastic part are formed by bending for multiple times; one end, far away from the welding part, of the first elastic part extends to form a contact part; the contact part is parallel to the welding part; one end, far away from the welding part, of the second elastic part is propped against a bottom surface of the contact part; the first elastic part and the second elastic part are arranged on the welding part so as to support the contact part, projections of the first elastic part and the second elastic part on the plane where the welding part is located fall on the welding part, the first elastic partand the second elastic part are both in a double-U-shaped runway shape, and the contact part moves back and forth in the height direction of the welding part when being pressed. The electrical connection elastic sheet is advantaged in that the occupied area can be reduced, and the contact stability is improved.
Owner:SHENZHEN KRCONN IND TECH

Vertically-partitioned metallized grid safe film electrode structure

The invention relates to a vertically-partitioned metallized grid safe film electrode structure, which comprises an upper layer metallized safe film and a lower layer metallized safe film. One side of each layer of the metallized safe films is a clad layer-free residual side, and the other side of each layer of the metallized safe films is a clad layer-thickened side; continuous clad layer zones and grid pattern zones which have roughly equal width are vertically distributed on a clad layer between the residual side and thickened side at intervals and alternately; small electrodes in the gridpattern zones do not interconnect directly; when two layers of the metallized safe films are overlaid for wrapping a capacitor, the residual sides and the clad layer-thickened sides of the upper and lower layers correspond to each other alternately; and the continuous clad layer zones and the grid pattern zones of the upper and lower layers correspond to each other alternately at the same time. The vertically-partitioned metallized grid safe film electrode structure has small overall heat productivity, is suitable for manufacturing alternating-current capacitors and high-frequency capacitors,increases safe reliability and service life, reduces the loss rate of the effective area of the film due to the gap stripes of an pattern, and reduces the manufacturing cost of a safe film capacitor.
Owner:浙江南洋华诚科技有限公司

Integrated radiator IGBT power device with low-inductance composite busbar structure

The invention provides an integrated radiator IGBT power device with a low-inductance composite busbar structure, which comprises a radiator, a lining plate, a PCB circuit, a terminal and a low-inductance composite busbar, the lining plate is interconnected with the radiator, the PCB circuit and the terminal are arranged on the lining plate, and the low-inductance composite busbar is connected with the terminal; the low-inductance composite busbar comprises a DC + stage of a half-bridge IGBT device, a DC - stage of the half-bridge IGBT device and an AC stage of the half-bridge IGBT device, wherein the DC + stage of the half-bridge IGBT device and the DC - stage of the half-bridge IGBT device are oppositely arranged, and the AC stage of the half-bridge IGBT device is arranged on one side of the DC + stage of the half-bridge IGBT device and the DC - stage. According to the invention, the low-inductance composite busbar is integrated, so that the IGBT device is more compact, the occupied space is small, and the contact thermal resistance and resistance of the device caused by connection can be effectively reduced; the design freedom degree of the low-inductance composite busbar is high, and parasitic parameters are small; a power assembly formed by assembling the device is large in spatial arrangement freedom degree, and parasitic parameters can also be reduced. The stray inductance is low, the current path is short, the stress borne by the chip can be effectively reduced, and the reliability of the device can be improved.
Owner:ZHUZHOU CRRC TIMES SEMICON CO LTD

Depletion mode field effect transistor device and preparation method thereof

The invention discloses a preparation method of a depletion mode field effect transistor device, which belongs to the field of semiconductor protection devices, and comprises the following steps: S1, forming a first epitaxial layer on a substrate; S2, growing an oxide layer, and forming at least two column regions in the first epitaxial layer; S3, forming a second epitaxial layer; S4, forming at least two well regions; S5, forming a deep groove, forming a gate oxide layer in the deep groove and on the upper surface of the deep groove, forming a channel between the deep groove and the well region, and forming a polycrystalline silicon layer on the upper surface of the gate oxide layer; S6, forming a first N-type injection region, a first P-type injection region and a second N-type injection region which are connected in sequence; S7, forming a dielectric layer, and forming a corresponding contact hole; S8, depositing source electrode metal and grid electrode metal; and S9, carrying out grinding and thinning treatment, and forming drain electrode metal. The beneficial effects of the technical scheme are that on resistance is low, withstand voltage is high during turn-off, and leakage current is small.
Owner:SHANGHAI CHANGYUAN WAYON MICROELECTRONICS

Silicon carbide MOS device

The invention discloses a silicon carbide MOS device which comprises a metal drain electrode. A drain electrode is arranged on the upper end face of the metal drain electrode, an N+ type silicon carbide substrate is arranged on the upper end face of the drain electrode, and an N type silicon carbide drift region is arranged on the upper end face of the N+ type silicon carbide substrate. A siliconcarbide N-epitaxial layer grows on the upper end face of the N type silicon carbide drift region, source trenches are formed at the left upper side and the right upper side of the silicon carbide N-epitaxial layer, and a silicon carbide P+ doped region and a silicon carbide P-type doped region are arranged below the source trenches from top to bottom. Source metal is arranged on the upper end faceof the silicon carbide N-epitaxial layer, and through grooves are formed in the silicon carbide N-epitaxial layer and the source metal. Gate oxide layers are arranged on the inner walls and the outersurfaces of the grooves, gate low-resistance deposits are arranged in the grooves, and a gate oxide layer, a gate low-resistance deposit and gate metal are sequentially arranged at the top ends of the grooves from bottom to top. According to the invention, the gate oxide layer is arranged to be longitudinal and is embedded into the silicon carbide body, and the current path is shorter during conduction, so that the conduction resistance is lower, and the current capability is stronger.
Owner:江西万年芯微电子有限公司
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