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93 results about "Pole figure" patented technology

A pole figure is a graphical representation of the orientation of objects in space. For example, pole figures in the form of stereographic projections are used to represent the orientation distribution of crystallographic lattice planes in crystallography and texture analysis in materials science.

Rolled copper foil

Along with development in downsizing, increase in the integration degree (higher density mounting) and higher performance of electronic equipment in recent years, further higher requirement for flexible fatigue property has been increased more and more than usual for the flexible printed circuit. The invention provides a rolled copper foil with more excellent flexible fatigue property, characterized in that: the rolled copper foil obtained after a final cold rolling step but before a recrystallization annealing includes a crystal grain alignment wherein: when normalized intensity of {200}Cu plane diffraction of a copper crystal in results obtained by an X-ray diffraction pole figure measurement with respect to a rolled surface is plotted against at different values of angle [alpha], the normalized intensity being obtained during a [beta] scanning in the pole figure measurement, a ratio of a maximum value A of the normalized intensity with angle [alpha] in a range of 40[deg.] to 60[deg.] to a maximum value B of the normalized intensity with angle [alpha] in a range of 80[deg.] to 90[deg.] is equal to or greater than 4 (A / B>=4); and [0018] when the normalized intensity increases with increasing angle [alpha] in a range of 25[deg.] to 45[deg.], there is essentially no area in which the normalized intensity increases stepwise. It is possible to provide a rolled copper foil having more excellent flexible fatigue property than usual by the recrystallization annealing.
Owner:JX NIPPON MINING & METALS CORP

Method for measuring inverse pole figure

InactiveCN103323473AAccurately reflect performanceMaterial analysis using wave/particle radiationMeasurement deviceX-ray
The invention discloses a method for measuring an inverse pole figure. The method comprises the following steps of: determining the peak position of each diffraction peak of a sample and a standard sample and the background positions of the left and right sides of each peak; putting the sample on a 1 theta-axis of an X-ray instrument measurement device, and arranging a detector on a 2 theta-axis, wherein the 1 theta-axis and the 2 theta-axis are positioned in the position of 0 degree; acquiring the intensity of the X-ray of the diffraction peak on the detector; acquiring the background intensity of the diffraction peak; calculating the net intensity of the (hkl) diffraction peak; detaching the sample from the 1 theta-axis, loading the standard sample, and measuring the net intensity of the diffraction peak of the standard sample; calculating the ratios of the net intensity of the sample to that of the standard sample, and averaging all the ratios to obtain the net intensity of the (hkl) diffraction peak; and marking the polar density value of each (hkl) diffraction peak on the inverse pole figure of the sample, thus finishing the measurement process. The measurement result contains contribution of crystalline grains which can generate symmetrical diffraction and have small grain orientation errors on the measurement result, and the measurement result can more accurately reflect the performance of the material.
Owner:WUHAN IRON & STEEL (GROUP) CORP

Method for measuring inverse pole figure by inclining and rotating test sample

The invention discloses a method for measuring an inverse pole figure by inclining and rotating a test sample. The method comprises the following steps of determining peak positions of diffraction peaks of the test sample and a standard sample and back bottom positions of the left side and the right side of the peaks; arranging the test sample and a detector at initial positions; obtaining the intensity and the back bottom intensity of all the diffraction peaks of the test sample under different inclination angles during rotation, calculating the net intensity of the diffraction peaks to obtain the net intensity of the diffraction peaks of the standard sample, calculating a ratio of the net intensity of the diffraction peaks of the test sample to the net intensity of the diffraction peaks of the standard sample under the different inclination angles, and calculating an average value of all the ratios to obtain an extreme density value of each diffraction peak; and marking the extreme density values of all the diffraction peaks on the inverse pole figure to finish a measurement process. During the measurement of the inverse pole figure, the test sample can be inclined and is rotated around 360 degrees by taking a normal of the test sample as a rotating shaft, so that all orientation crystal particles make contributions to the extreme density of the inverse pole figure. A measurement result and the material performance have a good corresponding relationship, and the scientificity is high.
Owner:武汉钢铁有限公司

Oriented cutting method for preparing infrared non-linear optics element from yellow copper uniaxial negative crystal

The invention relates to a directional cutting method for preparing infrared nonlinear optical elements from a chalcopyrite uniaxial negative crystal, which comprises the following steps: (1) according to cleavage surfaces {112} and {101} of the chalcopyrite uniaxial negative crystal, utilizing a crystal standard pole figure with Wuwov's intersection ruler and an X-ray diffractometer to determine the direction of a C axis of the crystal through theta-2theta continuous scanning; (2) putting the crystal of which the direction of the C axis is determined on a cutting machine, rotating a sample stage for delta theta far away from the direction of the C axis according to a phase matching angle theta m required by an optical element, and cutting the crystal to obtain an original sample of the optical element, wherein the delta theta= theta m - theta (112); (3) putting the original sample of the optical element on the sample stage of the X-ray diffractometer, determining an oscillation photograph of a cutting surface of the original sample of the optical element, and obtaining a diffraction peak place value theta' and delta theta', wherein the delta theta'=absolute (theta'- theta'(112)); and (4) finishing the optical element, and correcting the cutting surface of the original sample of the optical element until the delta theta'=the delta theta.
Owner:SICHUAN UNIV

Beam forming method and system of microphone voice signals of hearing aid device, and hearing aid device

The invention belongs to the technical field of signal processing, and provides a beam forming method and system of microphone voice signals of a hearing aid device, and the hearing aid device. The invention aims at solving the following problems: spatial orientation information picked up by a double-microphone voice signal beam forming method used on the existing hearing aid device is limited, the spatial resolution is relatively low, and the number of formed pole figures is small, such that when the directional noise is serious, the beams cannot be controlled conveniently and flexibly to form proper pole figures. According to the beam forming method and system provided by the invention, double miniature microphones are used, each miniature microphone comprises two sound pipes with opposite directions in the space to pick up voice signals, thereby improving the spatial resolution of voice pickup and the spatial orientation information of voice. More importantly, weight parameters and adjustable inclination angle parameters of signals are processed, so that the number of the pole figures corresponding to the final output voice signals is greatly increased, convenient and flexible control is realized, proper pole figures are formed, and the speech recognition rate of a user of the hearing aid device is improved.
Owner:SHENZHEN INSTITUTE OF INFORMATION TECHNOLOGY

Oriented cutting method for preparing infrared non-linear optics element from yellow copper positive uni-axial crystal

The invention relates to a directional cutting method for preparing infrared nonlinear optical elements from a chalcopyrite uniaxial positive crystal, which comprises the following steps: (1) according to cleavage surfaces {112} and {101} of the chalcopyrite uniaxial positive crystal, utilizing a crystal standard pole figure with Wuwov's intersection ruler and an X-ray diffractometer to determine the direction of a C axis of the crystal through theta-2theta continuous scanning; (2) putting the crystal of which the direction of the C axis is determined on a cutting machine, rotating a sample stage for delta theta toward the direction of the C axis according to a phase matching angle theta m required by an optical element, and cutting the crystal to obtain an original sample of the optical element, wherein the delta theta= theta (101) - the theta m; (3) putting the original sample of the optical element on the sample stage of the X-ray diffractometer, determining an oscillation photograph of a cutting surface of the original sample of the optical element, and obtaining a diffraction peak place value theta' and delta theta', wherein the delta theta'=absolute (theta'- theta'(101)); and (4) finishing the optical element, and correcting the cutting surface of the original sample of the optical element until the delta theta'=the delta theta.
Owner:SICHUAN UNIV

Polycrystalline gallium-nitride self-supporting substrate and light-emitting element using same

This invention provides a polycrystalline gallium-nitride self-supporting substrate comprising a plurality of gallium-nitride-based single-crystal grains aligned to a specific crystal orientation in a direction that is substantially parallel to the normal direction. The crystal orientations of said gallium-nitride-based single-crystal grains, as measured by subjecting the surface of the self-supporting substrate to electron backscatter diffraction (EBSD) and performing inverse-pole-figure mapping, form a variety of angles with the aforementioned specific crystal orientation, and the mean value of the distribution of said angles is between 1degrees and 10 degrees, inclusive. This light-emitting element comprises the abovementioned self-supporting substrate and a light-emitting functional layer that is formed on top of the substrate and contains one or more layers each comprising a plurality of semiconductor single-crystal grains each exhibiting a single-crystal structure that is substantially parallel to the normal direction. This invention makes it possible to provide a polycrystalline gallium-nitride self-supporting substrate with a reduced defect density in the surface thereof. A light-emitting element that uses said polycrystalline gallium-nitride self-supporting substrate and exhibits a high luminous efficacy can also be obtained.
Owner:NGK INSULATORS LTD

Multi-sample combination method for detecting crystal orientation distribution

The invention provides a multi-sample combination method for detecting crystal orientation distribution. The method comprises the following steps: (1) selecting a plurality of samples at different parts of a steel plate; (2) processing the samples into a plurality of rectangular steel sheets in the same specification, stacking the rectangular steel sheets in a pole figure measurement sample rack and fastening, polishing and corroding the rectangular steel sheets to form R.D section samples; (3) measuring three imperfect pole figures (110), (200) and (211) of the R.D section samples; (4) computing an ODF (Orientation Distribution Function) figure by utilizing the conventional ODF software and acquiring Phi, Phi1, and Phi2 of a Bung coordinate system or Theta, Phi and Psi of a Roe coordinate system; and (5) utilizing the formulas (a) and (b) of the Bung coordinate system or the formulas (c) and (d) of the Roe coordinate system to compute the texture. The multi-sample combination method can reflect the crystal orientation condition of the samples in the whole thickness and has strong representativeness; for a laboratory with conventional ODF analysis software, specially planning or purchasing ODF software for computing the cross sections combined by dozens of samples is not needed, so that the use is convenient; and for a laboratory without the ODF analysis software, the only requirement is to plan or purchase the conventional ODF software, so that the cost is lower.
Owner:WUHAN IRON & STEEL (GROUP) CORP
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