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Vacuum processing apparatus and vacuum processing method

A vacuum processing apparatus, comprising: a processing chamber 3 in which an object to be processed is placed and a predetermined vacuum state is formed; a first processing gas introducing means 12 for converting a first processing gas into a radical state and introducing the resulting first processing gas in the radical state into the processing chamber through first processing gas introducing ports which open to the interior of the processing chamber; a second processing gas introducing means 15 for introducing a second processing gas, which is reactive with the first processing gas in the radical state, into the processing chamber through second processing gas introducing ports which open to the interior of the processing chamber; a temperature controlling means for controlling the temperature within the processing chamber 3 to a first temperature-controlled state, in which the first processing gas in the radical state and the second processing gas process the surface of the object to be processed, thereby producing a reaction product, and to a second temperature-controlled state in which the resulting reaction product is sublimated and removed; and an inert gas introducing means for introducing an inert gas into the processing chamber 3 through the processing gas introducing ports 12 when the temperature controlling means controls the temperature within the processing chamber to the second temperature-controlled state.
Owner:ULVAC INC
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