39results about How to "Improves airflow uniformity" patented technology

A flow equalizer plate is provided for use in a substrate process chamber. The flow equalizer plate has an annular shape with a flow obstructing inner region, and a perforated outer region that permits the passage of a processing gas, but retains specific elements in the processing gas, such as active radicals or ions. The inner and outer regions have varying radial widths so as to balance a flow of processing gas over a surface of a substrate. In certain embodiments, the flow equalizer plate may be utilized to correct chamber flow asymmetries due to a lateral offset of an exhaust port relative to a center line of a substrate support between the process volume and the exhaust port.

A system for catalytically treating a gas stream includes a gas phase reactor containing a catalyst for the treatment of the gas stream in at least one catalyst bed having an upstream end and a downstream end, an axial fan positioned upstream of the at least one catalyst bed and having an impeller for moving the gas stream through the gas phase reactor. The gas flow is modified between the impeller and the gas phase reactor to decrease gas stream velocity and increase gas flow uniformity.

A cryocooler system having at least one flow straightener which has a system of grooves on its perforated surface for enhancing gas flow uniformity through the system wherein pulsing gas which does not initially pass through the flow straightener through a perforation flows along the surface of the flow straightener within a groove prior to passing through a perforation and is effectively redistributed across the surface of the flow straightener and thus the cross section of the regenerator or thermal buffer tube.

The invention relates to an impeller structure for cooking equipment, which comprises a disc-shaped main board, fan blades are arranged at intervals along the circumferential direction on the first disc surface of the main board, and each fan blade has a strip shape and is opposite to the The main board extends along the inner and outer directions and is arranged perpendicular to the first disk surface. The outer peripheral side of the first disk surface of the above-mentioned main board is provided with first hinge seats corresponding to the above-mentioned fan blades at intervals along the circumferential direction, and also includes the first hinge seats corresponding to the above-mentioned fan blades. One-to-one corresponding connecting rods, the first end of each fan blade is respectively rotatably connected with the corresponding first hinge seat and the second end is respectively rotatably connected with the first end of the corresponding connecting rod, and the second ends of each connecting rod are It is located on a track circle centered on the center of the above-mentioned first disk surface and can slide along the track circle circumferentially, and the track circle is located in the middle of the above-mentioned first disk surface. Compared with the prior art, the present invention can change the angle of the fan blade according to its rotation direction, so that the impeller structure can obtain better airflow uniformity in both forward rotation and reverse rotation states.

The invention discloses an energy saving and noise reducing multifunctional decoration wind gap capable of homogenizing air currents and an application method thereof. The wind gap comprises a rotating extension section, a rectification section, multiple external guide plates, at least two one-layer shutters, and a wind gap probe for detecting the exhaust temperature and / or the flowing speed; one end of the rectification section is connected with the rotating extension section, and the external guide plates are uniformly mounted around the other end; the rectification section has an outward concave arched windward surface; angles between the external guide plates and the rectification section are adjustable; the one-layer shutters are arranged in the rectification section; and the rotating extension section can drive the rectification section to change a wind blowing angle. The wind gap optimizes the streamline shape of the air currents sprayed by the wind gap, can increase or reduce actual travel distance of the air currents according to the demands, and improves the uniformity of the air currents and the indoor ventilation effect. The one-layer shutters replace double-layer shutters of a traditional wind gap, so that the wind resistance is reduced, and the noise of the wind gap and the energy consumption are reduced. In addition, the wind gap has a decoration effect.

The invention provides a gas compressor plane cascade experimental system with a suction baffle structure. The gas compressor plane cascade experimental system comprises a suction device and a plane cascade experimental device. The plane cascade experimental device comprises a left end plate, a right end plate, an upper baffle, a plurality of experimental blades and a lower baffle, wherein the upper baffle is arranged between the left end plate and the right end plate, and the multiple experimental blades are distributed at intervals. The upper baffle and the lower baffle are connected between the left end plate and the right end plate through fixing shafts. The upper baffle is provided with suction holes. Left end plate suction holes are formed in the left end plate, and right end plate suction holes are formed in the right end plate. The suction holes are connected with a vacuum pump through a pipeline. A three-hole probe 1 is arranged between the left end plate and the right end plate. In the experimental process, the upper baffle and the lower baffle are adjusted so that a cascade can be good in periodicity, the boundary layer of incoming flow is sucked through the left end plate suction holes and the right end plate suction holes, the influence area of the boundary layer is reduced, and uniform incoming flow is achieved. The gas compressor plane cascade experimental system with the suction baffle structure is an effective path for exploring improvement of the performance of a gas compressor, the influence of the boundary layer of the incoming flow is reduced, and meanwhile, the periodicity of the plane cascade is improved.

A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor includes a plasma chamber, a substrate holder, a microwave coupling configuration for feeding microwaves into the plasma chamber, and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom. The gas flow system includes a gas inlet array having a plurality of gas inlets for directing the process gases towards the substrate holder. The gas inlet array includes at least six gas inlets disposed in a substantially parallel or divergent orientation relative to a central axis of the plasma chamber.

The present invention relates to a gate etching method, including BT step, main etching step and over etching step. It is characterized by that in the described main etching step the used gas contains Cl2, HBr and O2, On the premise of that its hardware design is not changed said method only can change the gas type and matching ratio of main etching step in gate etching process to raise gas flow uniformity of silicon wafer surface process gas so as to meet the requirements of advanced gate etching process.

The invention relates to the technical field of airflow uniformity in wind tunnel experiments, and discloses a device for improving airflow uniformity in an aircraft experiment wind tunnel and a parameter optimization method thereof; the device includes a power section, a steady flow adjustment section and a contraction section; the power section includes a circular tubular power The main body section, the fan installation structure arranged in the power main section, and the fan installed on the fan installation structure; the method includes: S1, initially setting size parameters; S2, modeling the whole wind tunnel; S3, performing fluid simulation; S4. Determine whether the unevenness of wind speed in the target area is less than 5%; if the unevenness is less than 5%, the design is completed; if it is not less than 5%, then modify the size parameters of step S1 and repeat steps S2~S4; the present invention can meet the needs of large aircraft. The wind tunnel test requires large air volume and high wind speed; it can improve the uniformity of airflow.

In order to solve technical problems such as obvious secondary flow on the end wall of the radial flow guide vane with low aspect ratio, relatively large channel vortex size, and poor outlet airflow uniformity, the present invention relates to a radial flow turbine guide vane structure coupled with non-axisymmetric end walls. The non-axisymmetric concave-convex end wall structure is adopted on the front end wall and the rear end wall of the radial turbine guide vane, and can be formed with the radial turbine guide vane having a three-dimensional configuration to more effectively control the secondary flow loss of the flow channel. In the present invention, by modifying the cascade, specifically, setting the inner surfaces of the front end wall and the rear end wall as non-axisymmetric concave-convex end wall structures, the flow area of ​​each flow channel is changed, and the The airflow pressure difference between the pressure surface on one side of each flow channel and the suction surface on the other side is reduced, thereby affecting the secondary flow velocity distribution, delaying the formation and development of channel vortices, reducing the channel vortex intensity, and finally realizing the secondary flow velocity distribution. Reduced secondary flow loss.