32results about How to "Low number of scratches" patented technology

The present invention relates to a sapphire substrate submerged chemical mechanical polishing method. The polishing method is as follows: (1) Pretreatment: attach the sapphire substrate to a hard ceramic disk and install it on the main shaft of the polishing machine; install the polishing pad on the On the rotating chassis; mix reverse osmosis pure water and silica polishing liquid into the polishing machine, and keep the liquid level between the upper limit liquid level line of the polishing liquid and the lower limit liquid level line of the polishing liquid; (2) Polishing: start the polishing machine, Carry out the polishing of sapphire substrate, the polishing processing time is 40-80min, and the polished sapphire substrate is obtained; (3) the finished sapphire substrate is obtained after cleaning; , The adsorption pad has a long service life, and at the same time, it is a chemical mechanical polishing method with no micro scratches on the surface of the sapphire substrate during the polishing process.

The invention discloses a preparation method of marble polishing powder. The method is characterized by comprising the following process steps of adding the following ingredients in percentage concentration by mass into a grinding machine: 47 to 53 percent of oxalate dihydrate, 12 to 15 percent of aluminum oxide and 5 to 10 percent of stannic oxide; performing grinding and uniform mixing; adding 6 to 10 percent of sodium binoxalate and 15 to 21 percent of stearic acid; performing grinding and uniform mixing; then adding 2 to 4 percent of paraffin powder and 0.3 to 1.0 percent of fatty alcohol polyoxy ether, wherein the sum of all ingredients is hundred percent; performing grinding and uniform mixing; obtaining the marble polishing powder with the particle diameter being 2.0 to 10 mu m. The polishing powder has the advantages that chemical reaction is taken between the polishing powder and marble in the polishing process; the chemical polishing characteristics are realized, so that the polishing effect of the polishing powder is good; the luster degree is high; scratch marks are few; the flatness and smoothness degree is high; the consumption is low; the corrosion of oxalic acid can be buffered through the addition of the sodium binoxalate.

The invention discloses undaria pinnatifida stem slicing and shredding integrated equipment which comprises a rack, a connecting frame, a cutting device base, a shredding device support, a belt conveyor and the like, fixing parts are fixedly installed on the two sides of the cutting device base, blades are embedded in the fixing parts, and undaria pinnatifida stems are sliced through the blades; a sliding rail is fixedly installed on the shredding device support, a sliding block is connected into the sliding rail in a sliding mode, the sliding block is fixedly connected with a knife rest, and a shredding knife is installed on the knife rest in a rotating mode and can be used for shredding flaky undaria pinnatifida stems into shreds. And finally conveying the undaria pinnatifida stems. In the using process, the interval between the cutters can be changed according to the requirements of a user, and the applicability is high. According to the undaria pinnatifida stem shredding machine, undaria pinnatifida stems are firstly sliced in a full-automatic mode, then the shredding device is used for shredding, the structure is simple, the processing efficiency and the quality of undaria pinnatifida stem shreds can be improved, and the production cost is reduced.

The invention provides an axillary osmidrosis pumping and scraping needle with a round head. The axillary osmidrosis pumping and scraping needle with the round head is composed of a sucking pipe body, a connector and a handle. The sucking pipe body is a cylindrical hollow pipe, the connector is located at the tail end of the sucking pipe body, the sucking pipe body is connected with the handle through the connector, the front end of the sucking pipe body is in the shape of a closed cone, a relatively-pointed head end is arranged at the front end of the sucking pipe body, and three or four side holes are formed in the portion close to the head end. According to the axillary osmidrosis pumping and scraping needle with the round head, the number, size, arrangement and the like of the side holes are reasonable in design, the side holes can pump, scrape and cover the whole holding position at a time, the pumping and scraping holes are reasonable in arrangement, and a small range can also be pumped and scraped. The design of the conical front end enables the needle to be tightly attached to and inserted into the deep face of the corium along the original layer face, the situations that the skin is penetrated, an operator is injured, and muscles in the deep face are damaged are avoided, and the axillary osmidrosis pumping and scraping needle with the round head meets operation requirements, is safe and effective to use, and easy to popularize and use.

The invention discloses a preparation method of a terrazzo polishing powder. The preparation method is characterized in that the Al2O3 (aluminum oxide)-SiO2 (silicon dioxide)-Fe2O3 (ferric oxide) compound is used as a grinding material, oxalic acid is used as an acid polishing agent, and a dispersant, a surfactant and the like are used as additives, so as to prepare the polishing powder. The preparation method specifically comprises the following steps of adding the following components into a reactor, such as 50 to 58% of water, and 4 to 8% of ferric trichloride; after stirring and dissolving, adding 22 to 28% of aluminum oxide, and 10 to 15% of silicon dioxide, and adding 3 to 6% of ammonia water, wherein the sum of the components is 100%; stirring to react for 30min at room temperature, separating solid and liquid, drying at the temperature of 105+ / -2 DEG C, roasting for 2h at the temperature of 500+ / -10 DEG C, cooling, and crushing by air flow, so as to obtain the Al2O3-SiO2-Fe2O3 compound. The polishing powder has the advantages that the polishing effect is good, the glossiness is high, the number of scratches is fewer, the flatness is high, and the usage amount is small.

The invention discloses a preparation method for marble polishing liquid and its application in the polishing process in marble production and renovation. It is characterized in that it is added according to the following composition mass percentage concentration, deionized water: 48~58%, polymaleic anhydride: 0.5~2.0%, polyethylene glycol: 0.5~2.0%, AlN-CeO2 complex: 40~ 50%, the sum of each component is 100%, stir, adjust the pH to neutral with ammonia water, and get the marble polishing solution. The preparation process is simple, the conditions are easy to control, the production cost is low, and the industrial production is easy. Used in marble polishing process, it has good powder polishing effect, glossiness can reach more than 98 degrees, less scratches, high flatness, and less powder consumption.