The invention relates to a
cobalt oxide film of interrupted
oxide material, which is in a polycrystal state and has a
chemical formula of Co3O4 and a thickness of 200nm. The preparation method comprises the following steps: (1), preparing
ceramic target material of CoOx (x is larger than 0 and less than 4 / 3); (2), fixing the target material of CoOx on a target, fixing a substrate on a substrate platform and arranging the target and the substrate platform in a growth chamber; (3), vacuumizing the growth chamber by a mechanical pump and a molecular pump, closing the mechanical pump, opening an
inlet valve and pumping
oxygen to the growth chamber until
oxygen pressure is 20Pa; (4), focusing
laser beams of a
laser on the target material of CoOx by a lens; (5), heating the substrate platform by a resistance furnace so that the temperature of the substrate reaches a temperature of 660 DEG C; and (6), confirming
sedimentation time according to single-
pulse energy to sedimentate the film of Co3O4 with the thickness of 200nm on the substrate. The film is used to prepare a nonvolatile interrupted memory storage element which adopts a sandwich structure as a basic configuration, i.e., a polycrystal
oxide film of Co3O4 is sedimentated on a
Pt electrode film of a lower
electrode, and a Pt probe is used as an upper
electrode to form a memory unit.