33 results about "Azocane" patented technology

The invention discloses a graphite piece silicon carbide coating and a preparation method thereof, and belongs to the technical field of inorganic non-metallic materials. The method comprises the following steps: firstly, carrying out surface polishing, cleaning and drying pretreatment on a graphite piece; then a solution containing phosphinazine functionalized silazane and a boron-silicon carlamide compound is adopted for spraying the pretreated graphite piece, drying and curing are conducted, and a surface modification layer is formed; and finally, placing the surface-modified graphite piece in chemical vapor deposition equipment, and depositing at specific temperature, pressure and atmosphere to form the silicon carbide coating. According to the method, uniform nucleation and crystallization of the silicon carbide coating are effectively promoted through unique surface modification treatment, and the compactness and uniformity of the coating and the binding force of the coating and a matrix are remarkably improved. The obtained coating graphite piece has excellent thermal corrosion resistance, oxidation resistance and mechanical property, the service life and the use frequency of the coating graphite piece in semiconductor epitaxial equipment are remarkably prolonged, the whole preparation process is environmentally friendly, and the coating graphite piece is suitable for coating treatment of a large graphite base material.

Provided is a novel cross-linked polysilazane which is capable of forming a silicon-containing film having excellent crack resistance while being capable of forming a thick film. The invention relates to cross-linked polysilazane with a certain structure.

The invention discloses a fluoride-free oil-proof agent for paper pulp molding and a preparation method thereof, and belongs to the technical field of paper pulp molding materials. The fluoride-free oil-proof agent is prepared from the following raw materials in parts by weight: 40 to 60 parts of long-chain alkane, 10 to 20 parts of short-chain alkane, 10 to 15 parts of film-forming agent, 5 to 10 parts of modified polysilazane, 3 to 7 parts of nano material, 1 to 3 parts of chitosan derivative, 0.1 to 3 parts of cross-linking agent, 6 to 10 parts of filler and 60 to 100 parts of solvent. Wherein the modified polysilazane is prepared by reacting polysilazane with methyltriethoxysilane and 3-halogenated propylene under the action of a catalyst and chloroplatinic acid isopropanol. The preparation method comprises the following steps: mixing long-chain alkane, short-chain alkane and a solvent, and heating to react; other components are mixed and subjected to ultrasonic treatment; and mixing the two mixtures under ultrasonic and pressure conditions. The fluoride-free oil-proof agent provided by the invention is environment-friendly and safe, has excellent oil-proof performance, and is suitable for surface treatment of paper pulp molded products.

Described herein are coated articles comprising a fluorine-free surface modification layer. In aspects, the surface modification layer includes a partial silica-like network having a ratio of Si-O-Si bonds to Si atoms in the anti-fingerprint coating of from about 2 to about 3. Additionally or alternatively, the surface modification layer further includes an alkylsilane at the outer surface and bonded to Si-O groups in the silica-like network. The method includes evaporating a functionalized polyhedral oligomeric silsesquioxane onto the first major surface. The method includes impinging an ion beam on the first major surface. Alternatively, the method includes disposing and heating a solution including a polysilazane or a polyhedral oligomeric silsesquioxane on the first major surface. In aspects, a method includes reacting a material at the first major surface with an alkylsilane.

The invention relates to a method for efficiently preparing high-alpha-phase silicon nitride powder and application of the high-alpha-phase silicon nitride powder, and the method specifically comprises the following steps: dissolving polysilazane in an organic solvent to prepare a 10wt%-40wt% polysilazane solution; adding 75wt%-95wt% of silicon powder and 5wt%-25wt% of a diluent into the polysilazane solution, and mixing for a period of time to obtain mixed slurry; and adding the obtained mixed slurry into a sintering mold, and roasting the mixed slurry under a certain pressure in a protective atmosphere to finally obtain the high-alpha-phase silicon nitride powder. The method has the advantages of high efficiency, high alpha-phase content and narrow particle size distribution.

This invention discloses a modified polysilazane, a two-component silicone sealant, and a method for preparing the same. The modified polysilazane is prepared through a nucleophilic substitution reaction of dimethyldichlorosilane, vinyltrichlorosilane, and ethylenediamine. The two-component silicone sealant prepared using the modified polysilazane of this invention significantly improves its hardness under sealed conditions without adversely affecting its curing and performance. Furthermore, it requires a small amount and is highly practical. The two-component silicone sealant prepared using the modified polysilazane of this invention exhibits high hardness retention under sealed conditions, significantly slows down the reversion phenomenon, and maintains good mechanical properties and adhesion even after curing at 90°C under sealed conditions. It also demonstrates excellent resistance to reversion under fully sealed conditions.

The invention discloses a high-performance silicon carbide coating embedding process, and relates to the technical field of static pressure graphite coating materials. The preparation method comprises the following steps: firstly, weighing SiC powder, Si powder and carbon powder according to a specific mass ratio, and carrying out ball milling and mixing to prepare embedding powder; the preparation method comprises the following steps: embedding a graphite matrix into embedding powder, and carrying out argon protection and temperature programming sintering to prepare a SiC coating modified graphite matrix; then preparing dendritic polysilazane steeping liquor containing azobenzene groups, putting the modified matrix into a vacuum steeping tank, carrying out ultraviolet irradiation assisted vacuum steeping and gradient drying, and then carrying out temperature programming curing, so as to obtain the composite coating modified graphite material. According to the process, the problems that a traditional embedding method has many coating defects and the mechanical property of a matrix is reduced are solved, through deep penetration repairing of photosensitive dendritic polysilazane, the coating density and the interface bonding strength are improved, and the obtained material has excellent mechanical and thermal properties and structural stability and meets the requirement of high-end working conditions.

To provide a polycarbosilazane making it possible to form a silicon-containing film having resistance to acid etching, and a composition comprising the polycarbosilazane.SOLUTION: The present invention provides a polycarbosilazane comprising repeating units of -[R1R2Si-(CH2)n]- and -(R3R4Si-NR5)- (where, R1, R2, R3 and R4 are each independently a single bond, hydrogen or C1-4 alkyl; R5 is independently a single bond or hydrogen; and n is 1-2, and a composition comprising the polycarbosilazane. The present invention also provides a method for forming a silicon-containing film, comprising coating the composition above a substrate and heating.SELECTED DRAWING: None

The present invention provides a method for coating a substrate comprising applying to the substrate: i. A solution A comprising at least a polysilazane and a solvent, ii. A solution B comprising at least a catalyst promoting crosslinking of the polysilazane and a solvent, where solution A and solution B are applied substantially separately onto the substrate and then mixed.

A compound containing a bis(azanylylidene) sulfonyl structure of formula (I) as a PKR agonist and / or USP9X inhibitor, which can be used for treating related diseases mediated and regulated by PKR and USP9X, wherein the related diseases comprise, but are not limited to: sickle-cell anemia, β-thalassemia, hereditary non-spherocytic hemolytic anemia, hemolytic anemia, hereditary spherocytosis, hereditary elliptocytosis, abetalipoproteinemia, paroxysmal nocturnal hemoglobinuria, acquired hemolytic anemia, congenital anemia, anemia of chronic diseases, colorectal cancer, kidney cancer, pancreatic cancer, breast cancer, lung cancer, esophageal cancer, melanoma, lymphoma, glioblastoma, or multiple myeloma. ;,

The invention provides a self-adaptive strong-plugging plugging agent for drilling fluid as well as a preparation method and application thereof, and belongs to the technical field of drilling engineering. The self-adaptive strong-plugging plugging agent for the drilling fluid is mainly prepared from the following raw materials in parts by weight: 100 parts of hydroxyl-terminated silicone rubber, 1 to 3 parts of a silazane compound KH-CL, 10 to 30 parts of alpha-methyl styrene, 3 to 5 parts of tetraethoxysilane, 10 to 30 parts of filler, 10 to 100 parts of iron oxide powder, 0.05 to 0.1 part of an azo initiator and 0.1 to 0.3 part of a tin catalyst. The density of the self-adaptive strong plugging plugging agent for the drilling fluid can be controlled to be 1.1-3g / cm < 3 >, and the self-adaptive strong plugging plugging agent can be applied to dispersion media with different densities, is tough and high-temperature-resistant, and can play an excellent role in leakage prevention and plugging under the dosage of 20-100g / L.

A method for producing a decorative part which comprises a visible side with a decorative layer and a mounting side with a substrate layer, wherein a polysilazane-containing composition is applied to the visible side of the decorative layer to form a cover layer and is subsequently cured. Also, a decorative part producible by the method.

The invention provides a low-dielectric photosensitive polyimide precursor, a photosensitive resin composition and a preparation method and application of the low-dielectric photosensitive polyimide precursor and the photosensitive resin composition. The low-dielectric photosensitive polyimide precursor is prepared by reacting a polymer obtained by reacting a dianhydride monomer and a diamine monomer with an organic silazane chain segment, the block polymer is formed by alternately arranging organic polyimide chain segments and organic silazane chain segments, and due to the structure, the dielectric constant of the material is effectively reduced, and meanwhile high adhesive force and high heat resistance of the material are ensured. The introduced silazane group can be converted into a SiO2 structure at a high temperature, so that the dielectric constant of the polyimide main body is further reduced, and the heat resistance is enhanced. In addition, the silazane groups can react with hydroxyl groups on the surface of the base material to generate silicon hydroxyl groups, so that the bonding strength between the polyimide and the base material is remarkably improved.

The invention discloses a silicon nitride composite material for a grading wheel and a preparation method of the silicon nitride composite material in the field of silicon nitride composites.A polysilazane structure with a main chain containing a benzene ring is formed through silane ammonolysis and subjected to coordination doping with metal ions and a crosslinking reaction of diisocyanate, the metal ions and an organic carbon chain structure are introduced, and the silicon nitride composite material for the grading wheel is obtained; the preparation method comprises the following steps: forming a three-dimensional cross-linked polysilazane precursor containing metal and organic carbon, carrying out molding and sintering treatment to form a compact biscuit, converting the organic carbon into SiCN in situ at a high temperature, carrying out synergistic growth on Si3N4-SiCN-metal nitride, and finally forming the high-density Si3N4-SiCN-metal nitride composite material, and fine grains and a low-defect structure are combined, the high-load requirement of components such as the grading wheel is met, the high hardness and self-lubricating property of SiCN and the hard spot effect of metal nitride are superposed, and the service life is remarkably prolonged.

A spectacle lens comprising: a base material; a water-repellent layer formed on the base material; and a protective layer formed on the water-repellent layer, the protective layer containing 50 mass% or more of polysilazane.

The application discloses a graphite piece silicon carbide coating and a preparation method thereof in the technical field of inorganic non-metallic materials. The method comprises the following steps: firstly, surface polishing, cleaning and drying pretreatment are performed on the graphite piece; then, a solution containing phosphine azine functionalized silazane and boron-silicon calamine compound is sprayed on the pretreated graphite piece and dried and solidified to form a surface modification layer; finally, the surface modified graphite piece is placed in a chemical vapor deposition device to deposit a silicon carbide coating under specific temperature, pressure and atmosphere. The method effectively promotes the uniform nucleation and crystallization of the silicon carbide coating through unique surface modification treatment, significantly improves the compactness, uniformity and bonding force of the coating and the substrate. The obtained coated graphite piece has excellent thermal corrosion resistance, oxidation resistance and mechanical properties, the service life and service frequency in a semiconductor epitaxial device are significantly improved, the whole preparation process is environmentally friendly, and the method is suitable for coating treatment of large graphite substrates.

The present invention belongs to the technical field of lithium-ion batteries, and specifically relates to a high-voltage electrolyte and a battery including the electrolyte. The electrolyte provided by the present invention contains a triynylborazine compound as a first additive. The triynylborazine compound can undergo an electropolymerization reaction on the surface of the positive electrode to form a polymer interface film rich in boron and nitrogen structures. The polymer interface film has good flexibility and high oxidation resistance, can inhibit the reaction between the electrolyte and the positive electrode, and protect the electrolyte from excessive consumption. At the same time, the generated polymer interface film contains rich B atoms and N atoms, effectively reducing the interfacial impedance while further improving the stability of the interface film, thereby significantly improving the cycle storage performance of the battery.

The invention relates to a method and a system for rapidly and efficiently preparing polysilazane, belongs to the technical field of macromolecules, and is used for solving one of the problems of long ammonolysis time, low synthesis efficiency, high production cost and the like in the existing method. According to the method disclosed by the invention, the evaporation amount of liquid ammonia, the suction amount of ammonia gas and the spraying speed of the chlorosilane and the organic solvent in the spraying mixing device are controlled, so that the chlorosilane can be in full contact with the ammonia gas, the ammonolysis time of the chlorosilane is shortened, the synthesis efficiency of the silazane is improved, and the production cost of the polysilazane is reduced; the method can be used for large-scale production.

A crosslinked polysilazane includes a repeating unit represented by the formula (1) as defined herein:

A cyclosilazane compound, a composition for depositing a silicon-containing thin film including the same, and a method of producing a silicon-containing thin film using the same are described. The silicon-containing thin film produced using the cyclosilazane compound as a silicon precursor has both excellent chemical and thermal stability and has a low dielectric constant. Therefore, it may be usefully applied as an insulating film of a semiconductor device, in particular, a spacer of a semiconductor miniaturization process.

The method for forming a film of the present invention includes: a first step of coating a first solution containing polysilazane on the surface (2a) of a metal substrate (2), and subjecting the first solution to silica conversion by heating to form a first film (1) having an opening defect portion (3) on the surface (2a) of the metal substrate (2); and a second step of coating a second solution containing polysilazane on the surface (1a) of the first film (1) to fill the opening defect portion (3), and subjecting the second solution to silica conversion by heating at a temperature lower than the heating temperature in the first step to form a second film (5) on the surface (1a) of the first film (1).

The application provides a polysilazane-based low-surface-energy multifunctional lubricating protective coating and a coating and application thereof, and relates to the technical field of protective coatings.The polysilazane-based low-surface-energy multifunctional lubricating protective coating provided by the application comprises the following components in mass percentage: 10-30% of polysilazane, 0.4-4% of long-chain flexible high-molecular compound, 0.1-2% of modified two-dimensional nanosheet, 65-89% of solvent, 0.1-0.5% of defoaming agent, 0.1-0.5% of dispersing agent and 0.1-0.5% of leveling agent; the long-chain flexible high-molecular compound comprises a long-chain flexible high-molecular compound containing silicon and / or fluorine.The coating formed by the coating can effectively prevent biofouling, has good corrosion resistance, and can improve the drag reduction and wear resistance of the surface of the coating, and can be applied to the protection of the surface of a sea-going body, effectively reduces the adhesion of marine organisms, prevents seawater corrosion, reduces the sailing resistance, and improves the surface wear resistance.

The application provides a synthesis process of hexamethyldisilazane. The synthesis process comprises the following steps: adding trimethylchlorosilane into liquid ammonia, then performing high-pressure stirring reaction to obtain a reaction liquid; performing layer separation, and performing rectification on the lower layer of the reaction liquid to obtain hexamethyldisilazane; performing pressure relief on the upper layer of the reaction liquid, and ammonia gas is generated after the liquid ammonia is vaporized, and ammonium chloride solid is precipitated; performing reduced-pressure drying on the ammonium chloride solid, desorbing the ammonia gas adsorbed on the ammonium chloride, and obtaining refined ammonium chloride. The reaction does not need to add any solvent, the reaction rate is adjusted by controlling the dropping speed of trimethylchlorosilane, and the generated by-product ammonium chloride is completely dissolved by controlling the addition amount of liquid ammonia, so that the mass and heat transfer effects of the reaction are ensured, the product conversion rate is improved, the reaction time is shortened, and the product is easy to separate. The method avoids the use of solvent, generates less waste liquid, is green and environmental protection, and is low in cost.

The present invention relates to a cyclosilazane compound, a composition for depositing a silicon-containing thin film comprising the same, and a method for preparing a silicon-containing thin film using the same, the silicon-containing thin film prepared using the cyclosilazane compound as a silicon precursor according to the present invention not only has excellent chemical stability and thermal stability, but also has a low dielectric constant, therefore, the present invention can be effectively used as an insulating film for a semiconductor device, in particular, as a spacer for a semiconductor micronization process.

The application belongs to the technical field of protective coating, and particularly relates to a flexible chain graft modified polysilazane-based coating as well as a preparation method and application thereof. The flexible chain graft modified polysilazane-based coating comprises the following components in parts by weight: modified polysilazane 5-20 parts, active filler 5-15 parts, dispersion medium 60-80 parts, and auxiliary agent 0.1-0.5 parts; the modified polysilazane is prepared by grafting reaction of polysilazane and flexible high molecular compound. In the application, the flexible high molecular compound is grafted on the polysilazane, the modified flexible long chain can rotate freely, the coating is endowed with super-lubricating property, the brittleness of the coating is reduced, and the friction coefficient of the coating is reduced. The polysilazane takes Si-NH-Si bond as a repeating unit, can be easily combined with the -OH on the surface of a base material, and can form a covalent structure with metal atoms, so that the combination strength is high, the density after solidification is good, the hardness is high, and the wear resistance and corrosion resistance are strong.

The invention discloses a cubic boron nitride polycrystal and a preparation method thereof, and belongs to the technical field of superhard material preparation, the method comprises the following steps: mixing hexagonal boron nitride with two self-synthesized modified compounds silicon functionalized polyborazine and boric acid functionalized polysilazane, magnesium nitride and nano silicon powder, and carrying out ball milling drying and cold press molding to obtain a biscuit; the preparation method comprises the following steps: carrying out stepped heating heat treatment on a green body in a protective atmosphere to finish the stabilization of a precursor, and then carrying out reactive sintering under high-temperature and high-pressure conditions to finally prepare the cubic boron nitride polycrystal. The two modified compounds are converted into stable ceramic phases in heat treatment, and cooperate with a magnesium nitride catalyst, so that the conversion of hexagonal boron nitride to a cubic phase is remarkably promoted, and a grain boundary structure is optimized. The prepared cubic boron nitride polycrystal has the characteristics of high purity, good compactness, high hardness and excellent thermal stability.

The invention relates to the technical field of high polymer materials, and discloses ablation-resistant metal modified polyborosilazane resin as well as a preparation method and application thereof. The method comprises the following steps: (1) in an argon or nitrogen atmosphere, dropwise adding a part of hexamethyldisilazane into a solution containing metal chloride, and carrying out a first contact reaction to obtain an intermediate compound I; (2) in an argon or nitrogen atmosphere, dropwise adding the other part of hexamethyldisilazane into a mixed solution of boron trichloride and methyl dichlorosilane, and then mixing with the intermediate compound I to carry out a second contact reaction, so as to obtain an intermediate compound II; and (3) in an argon or nitrogen atmosphere, carrying out segmented heating curing treatment on the intermediate compound II to obtain the ablation-resistant metal modified polyborosilazane resin. According to the method, refractory metal elements are introduced into a polymerization system in situ in the form of a prefabricated metal silazane precursor, the polyborosilazane resin with uniformly distributed metal is successfully prepared, the high temperature resistance and ablation resistance of the material are remarkably improved, the controllability of the reaction process is high, and the industrial application prospect is good.

Provided is a method of manufacturing an alkoxysilane compound, the method capable of more effectively removing ammonia generated as a byproduct when the alkoxysilane compound is manufactured with a silazane-based compound by adding and reacting a silazane-based compound. The method includes: adding an alcohol to a silazane-based compound and allowing the alcohol to react with the silazane-based compound to manufacture a first mixture containing an alkoxysilane compound and ammonia; adding an acid having a pKa of 2-6.5 to the first mixture to prepare a second mixture containing the alkoxysilane compound and an ammonium salt; adding an aqueous solvent to the second mixture to dissolve the ammonium salt; and separating and removing the ammonium salt.

Provided is a gas barrier film which can be uniformly coated with a film and a polysilazane resin, and which has stress relaxation properties that do not impair workability. [Solution] A stress-relaxation gas barrier film characterized in that: the stress-relaxation gas barrier film is formed by alternately laminating one or more layers of a cured film layer and a stress-relaxation layer with each other; the cured coating layer is formed by curing a polysilazane composition containing a polysilazane compound represented by the following formula (1), the stress relaxation layer is formed by curing a silicone resin composition containing a linear organopolysiloxane represented by the following formula (A-1), and the film thickness of one layer is 0.1-15.0 [mu] m. ; .