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6 results about "Correlative imaging" patented technology

A Method and System for Imaging Converted Waves of Metal Minerals Using Combined Active and Passive Sources and Reverse Time Migration

This disclosure pertains to the field of exploration geophysics and presents a method and system for combined active and passive source reverse time migration imaging of metallic minerals. The method includes: performing time difference correction on active and passive source seismic data from the same subsurface structure; performing wavefield separation on the time-aligned active and passive source seismic data to reconstruct the P-wave and S-wave fields of the active source and the passive source; performing active and passive source wavefield extrapolation based on the two-way wave equation; obtaining active and passive source PS-converted wave imaging results using cross-correlation imaging conditions; and performing weighted superposition and fusion to obtain the combined active and passive source imaging results. This disclosure leverages the high resolution advantage of active sources combined with the deep detection capability of passive sources, replacing the limitations of single-source detection and achieving high-precision deep reverse time migration imaging.
Owner:JILIN UNIVERSITY

Working-range extending phase plate, associated imaging system, and method

PendingUS20260177791A1Optical elementsNonzero coefficientsOptical axis
A method for extending a working range of an imaging system having an optical axis and an aperture stop includes imparting a wavefront aberration on an optical beam, propagating through the aperture stop, that is representable as an expansion of orthonormal circular Zernike polynomials having non-zero coefficients A11, A22, and A37. A working-range-extending phase plate imparts a wavefront aberration on an optical beam, propagating therethrough, that is representable as an expansion of orthonormal circular Zernike polynomials having non-zero coefficients A11, A22, and A37.
Owner:COGNEX CORP

An optimization method and device for viscoacoustic reverse-time migration imaging

PendingCN122110255ASeismic signal processingImaging conditionWave equation
The application discloses an optimization method and device for viscoacoustic wave reverse-time migration imaging. The method comprises the following steps: under the constraint of a velocity model and a constant Q model of a target block, forward simulation of seismic waves in a stratum is carried out by using a viscoacoustic wave equation to obtain wave field forward simulation records at each time; based on a compensation operator, the wave field forward simulation records at each time are reverse-time extended, and wave field separation is carried out by using a wave field separation condition to obtain upgoing wave fields and downgoing wave fields; the upgoing wave fields and the downgoing wave fields are correlated and imaged by using a cross-correlation imaging condition to obtain reverse-time migration imaging results of the seismic waves; and the reverse-time migration imaging results are optimized according to an X-type operator to obtain optimized reverse-time migration imaging results. The attenuation problem of the propagation of the seismic waves in a viscoelastic medium can be solved, and more accurate reverse-time migration imaging results can be obtained.
Owner:CHINA NAT PETROLEUM CORP

Multi-etch detector pixels fabrication and associated imaging systems and methods

Techniques are disclosed for facilitating multi-etch detector pixels fabrication. In one example, a method includes forming a semiconductor structure. The semiconductor structure includes a substrate layer, an absorber layer disposed on the substrate layer, a barrier layer disposed on the absorber layer, and a first contact layer disposed on the barrier layer. The method further includes forming the pixels from the semiconductor structure. The forming of the pixels includes performing a first etching operation to remove a portion of at least the first contact layer, and performing a second etching operation to remove a portion of the barrier layer and a portion of the absorber layer. Each of the pixels includes a respective portion of each of the substrate layer, the first contact layer, the barrier layer, and the absorber layer. Related systems and devices are also provided.
Owner:TELEDYNE FLIR COMMERICAL SYST INC