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930results about "Resistors adapted for applying terminals" patented technology

Plated terminations

InactiveUS20050046536A1Improved termination featureEliminate and greatly simplifyWave amplification devicesResistor terminals/electrodesTermination problemEngineering
Improved termination features for multilayer electronic components are disclosed. Monolithic components are provided with plated terminations whereby the need for typical thick-film termination stripes is eliminated or greatly simplified. Such termination technology eliminates many typical termination problems and enables a higher number of terminations with finer pitch, which may be especially beneficial on smaller electronic components. The subject plated terminations are guided and anchored by exposed internal electrode tabs and additional anchor tab portions which may optionally extend to the cover layers of a multilayer component. Such anchor tabs may be positioned internally or externally relative to a chip structure to nucleate additional metallized plating material. External anchor tabs positioned on top and bottom sides of a monolithic structure can facilitate the formation of wrap-around plated terminations. The disclosed technology may be utilized with a plurality of monolithic multilayer components, including interdigitated capacitors, multilayer capacitor arrays, and integrated passive components. A variety of different plating techniques and termination materials may be employed in the formation of the subject self-determining plated terminations.
Owner:KYOCERA AVX COMPONENTS CORP

Plated terminations

InactiveUS7154374B2Improved termination featureEliminate or greatly simplify thick-film stripesResistor terminals/electrodesSemiconductor/solid-state device detailsTermination problemEngineering
Improved termination features for multilayer electronic components are disclosed. Monolithic components are provided with plated terminations whereby the need for typical thick-film termination stripes is eliminated or greatly simplified. Such termination technology eliminates many typical termination problems and enables a higher number of terminations with finer pitch, which may be especially beneficial on smaller electronic components. The subject plated terminations are guided and anchored by exposed internal electrode tabs and additional anchor tab portions which may optionally extend to the cover layers of a multilayer component. Such anchor tabs may be positioned internally or externally relative to a chip structure to nucleate additional metallized plating material. External anchor tabs positioned on top and bottom sides of a monolithic structure can facilitate the formation of wrap-around plated terminations. The disclosed technology may be utilized with a plurality of monolithic multilayer components, including interdigitated capacitors, multilayer capacitor arrays, and integrated passive components. A variety of different plating techniques and termination materials may be employed in the formation of the subject self-determining plated terminations.
Owner:KYOCERA AVX COMPONENTS CORP

Method of manufacturing a sensor detecting a physical action as an applied force

A sensor comprises a semiconductor pellet (10) including a working portion (11) adapted to undergo action of a force, a fixed portion (13) fixed on the sensor body, and a flexible portion (13) having flexibility formed therebetween, a working body (20) for transmitting an exterted force to the working portion, and detector means (60-63) for transforming a mechanical deformation produced in the semiconductor pellet to an electric signal to thereby detect a force exerted on the working body as an electric signal. A signal processing circuit is applied to the sensor. This circuit uses analog multipliers (101-109) and analog adders / subtracters (111-113), and has a function to cancel interference produced in different directions. Within the sensor, two portions (E3, E4-E8) located at positions opposite to each other and producing a displacement therebetween by action of a force are determined. By exerting a coulomb force between both the portions, the test of the sensor is carried out. Further, a pedestal (21, 22) is provided around the working body (20). The working body and the pedestal are located with a predetermined gap or spacing therebetween. A displacement of the working body is caused to limitatively fall within a predetermined range corresponding to the spacing. The working body and the pedestal are provided by cutting a same common substrate (350, 350')
Owner:OKADA KAZUHIRO

Electrothermal film and manufacturing method thereof

The invention relates to an electrothermal film and a manufacturing method thereof, belonging to the technical field of semiconductor heating. The electrothermal film is mainly prepared by adopting stannic chloride, titanium tetrachloride, stannic chloride, titanium trichloride, ferric chloride, antimony trichloride, calcium chloride, potassium chloride, cadmium chloride, stannic dioxide, stannictetroxide, hydrofluoric acid, boric acid, ethanol, isopropyl alcohol and inorganic water. By adopting the above formula, the mixture is mixed, stirred and heated to prepare into electrothermal film treating fluid, a semi-finished product of the electrothermal film is obtained by spraying the electrothermal film treating fluid at negative pressure on the electrothermal film carrier, and then silveroxide slurry is coated on the semi-finished product of the electrothermal film for baking to form a finished product of the electrothermal film. The electrothermal film has reasonable proportion andsimple manufacturing process, can be manufactured into various electrothermal film heating devices, has a working temperature capable of being up to 500 DEG C, and has wider application range. The electrothermal film of the invention also has the function of far infrared radiation, can play a role of physical therapy and health care to human body, and can help improve the quality and output of agricultural products.
Owner:GUANGDONG HALLSMART INTELLIGENCE TECH CORP LTD
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