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ActiveCN107145040BMeet the demand for high-precision support surface shapePhotomechanical exposure apparatusMicrolithography exposure apparatusLithographic artistKinematics
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
ActiveCN105138853BSolve the problem that the target is difficult to decomposeSimple methodSpecial data processing applicationsSystems designTransfer path analysis
ActiveCN103962572BAchieve minimal solvationIn line with the characteristics of green cleaning processPolycrystalline material growthSingle crystal growth detailsFiberWater leakage
ActiveCN113179523BImprove monitoring efficiencyIncrease the speed of monitoringTransmissionWireless communicationEnvironmental resource managementVoice communication