48results about How to "Large depth of focus" patented technology

A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.

The present invention provides for x-ray imaging and ultrasound imaging of a body region of interest in a spatially correlatable manner. The resultant x-ray and ultrasound images may be combinatively employed to provide three-dimensional information regarding a location of interest within the body, and is particularly apt for use in the analysis/biopsy of potential lesions and suspicious masses in a female breast. The invention provides for direct body contact by an ultrasound imaging head, as well as targeted ultrasound imaging of a selected portion of the region from which x-ray images are obtained. A user interface system facilitates various procedures including ultrasound guided needle biopsy procedures.

The invention provides an overlay error measurement apparatus and a method. According to the present invention, a wide waveband light source is adopted, the emitted wide waveband measurement light beam turns through a beam splitting prism, then is subjected to normal incidence on an overlay measurement label through an object lens, and produces diffraction, the diffraction light is received by a first detector after passing through the object lens and the beam splitting prism so as to measure the diffraction light intensity, and the asymmetry of the high-order diffraction light spectral intensity is further calculated so as to obtain the overlay error; and the adopted wide waveband has the wide measurement range, the good process adaptability is provided, and the normally-incident light beam is adopted so as to provide large depth of focus and reduce the control difficulty of the focal plane position measurement, such that the feasibility during actual measurement is increased, and the high precision measurement result can be obtained.

A microscope apparatus comprises a focusing unit for changing the relative position between a specimen and the focus position of an object lens; and a setup unit for setting a plurality of import regions in the optical axis of the object lens, with a position at which a specimen is focused being established as a reference. It further comprises a control unit for obtaining a plurality of extended time exposure images by changing the relative positions from each respective start position to the end position of each of the plurality of import regions by means of the focusing unit under an import condition determined by desired exposure time and emission light volume; and an image generation unit for generating a focal-depth enlarged image by adding together the obtained plurality of extended time exposure images.

In an illumination optical system constituted to uniformize the intensity distribution of illumination light by use of an optical integrator, the overall length thereof is shortened. The illumination optical system includes: a light source including a laser irradiating illumination light on an illuminated body such as a two-dimensional SLM and an optical integrator; the optical integrator being placed between this light source and the illuminated body and uniformizes the intensity distribution of the illumination light by passing the light through minute cells. In this system, the size of the minute cell of the optical integrator (S1=S2) is 1.5 mm or less.

An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.

An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.

Provided is a laser irradiation device for use in laser processing, and a laser processing method performed using the same. Provided is a laser irradiation device including: a light source that emits a laser beam; and an irradiation optical system which has one or a plurality of lenses, and is provided for light-guiding and light-converging of the laser beam emitted from the light source to the target substance, in which a birefringent material is used as a material entity of at least one lens of the irradiation optical system. Also provided is a laser processing method. The irradiation optical system may have a beam expander having a first lens that is a concave lens or a convex lens, and a second lens that is a convex lens, in the order along the laser-beam travel direction, the beam expander being configured so as to make the interval between the first lens and the second lens variable, in which a birefringent material may be used as a material entity of the first lens and/or the second lens. Thus, the interval between the lenses can be changed by a convenient operation, whereby relative positions between the plurality of beam waists (interval) can be easily regulated.

A design method of mask plate layout for manufacturing a connecting hole is provided, which comprises a dense pattern containing plural first opening figures is formed, an isolated second opening figure is formed, and the dimension of the second opening figure is larger than the dimension of the first opening hole figure of the dense pattern center; wherein, the first opening figure and the second opening figure are used for forming the connecting hole. The utility model can improve the consistency of the focus depth of the isolated figure and the dense figure, the manufacturing technics of the mask plate is simple and the cost is low.

A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing and causing the irradiation light beams from the light source to be incident on each of a plurality of the second fly-eye type optical integrators.

Disclosed is a semiconductor laser side-coupled axial pumped alkali metal laser, including n semiconductor pump sources, m alkali metal vapor chambers and a resonant cavity. The alkali metal laser further comprises n steering elements corresponding to the n semiconductor pump sources respectively for changing the propagation direction of the pump light emitted by the n semiconductor pump sources. Regardless of how the n steering elements are set, the pump light emitted by the n semiconductor pump sources is ultimately paraxial light in the m alkali metal vapor chambers, where n and m are natural numbers. The pump light emitted from the n semiconductor pump sources is changed in the propagation direction by the corresponding steering elements, and converging points are located at different positions in the alkali metal vapor chambers. According to the invention, the alkali metal laser realizes the large focal depth by the side coupling of multiple semiconductor laser pump modules and makes full use of the alkali metal vapor atoms in the alkali metal vapor chambers to achieve better pattern matching, thus realizing the cascade use of the multiple pump modules and achieving high power output.

PCT No. PCT/NL96/00446 Sec. 371 Date Jul. 14, 1998 Sec. 102(e) Date Jul. 14, 1998 PCT Filed Nov. 13, 1996 PCT Pub. No. WO97/18532 PCT Pub. Date May 22, 1997A counting device that detects intensity differences in reflections coming from stacked thin objects. The device comprises a radiation source generating a radiation beam and a photoelectric detector detecting the intensity differences in the radiation reflected by the objects, and is provided with an optical pathway placed between the objects and the photoelectric detector. The optical pathway comprises a diaphragm having a diaphragm opening which, in relation to the dimension of the beam of reflected radiation reaching the diaphragm, is smaller.

The invention relates to an optical system, a camera module and electronic equipment. The optical system comprises, in order from an object side to an image side along an optical axis: a first lens element with positive refractive power; a second lens element with negative refractive power having an object-side surface being convex in a paraxial region thereof; a third lens element with negative refractive power having a concave image-side surface in a paraxial region thereof; a fourth lens element with positive refractive power having an object-side surface being convex in a paraxial region thereof; the optical system satisfies the following conditions: 0.5 < SD42/ImgH < 0.85, ImgH>4.0mm, SD42 is the maximum effective radius of the image side surface of the fourth lens, and ImgH is half of the image height corresponding to the maximum field angle of the optical system. By means of the design, on one hand, the system has the long-focus characteristic, on the other hand, aberration can be well restrained, the emergent angle of main light rays of an edge view field is restrained when the main light rays emerge from the fourth lens, and therefore the main light ray angle of an inner view field can be better matched with an image sensor.

The invention discloses a method for passivating the aberration of a conformal optical system based on wavefront coding. The method includes the following steps that: an odd-symmetry phase mask plate is additionally installed at the diaphragm of the conformal optical system; the wavefront of the optical system is modulated; a coded image is formed on a detector; and image decoding processing is performed on the coded image by means of a digital filtering means, so that a final clear image can be obtained. Since a wavefront coding technique is introduced, a larger focal depth can be realized with the luminous flux and imaging resolution of the conformal optical system ensured, and astigmatism, spherical aberration, chromatic aberration, and aberration caused by defocusing which is further caused by installation error and temperature change can be suppressed. The method of the invention is simple to operate. With the method adopted, under a condition that the complexity of the conformal optical system is not increased, aberration can be passivated, and image quality can be improved, and therefore, the capture performance and tracking precision of a seeker can be improved.

The invention discloses a refraction-reflection optical fingerprint sensor structure comprising an acquisition prism, a light source, a lens, and an imaging device which are all installed in a housing. The acquisition prism at least comprises an incident surface, an acquisition surface, a total reflection surface, an exit surface 1 and an exit surface 2. The incident surface and the total reflection surface are arranged in the same plane. The exit surface 1 and an exit surface 2 are arranged in parallel. An intersection angle 1 is arranged between the exit surface 1 and the total reflection surface. A reflector is correspondingly disposed on the outer surface of the exit surface 1 of the acquisition surface. An intersection angle 2 is arranged between the exit surface 1 and the reflector. The imaging device is correspondingly disposed on the outer surface of the exit surface 2 of the acquisition surface. A diaphragm is installed between the imaging device and the exit surface 2. An intersection angle 3 is arranged between the exit surface 2 and the imaging device. Optical path reflection and refraction are achieved on the acquisition prism such that the length and focal depth of an optical axis are effectively increased. Therefore, high manufacture precision is achieved and product requirements for easy manufacturability and miniaturization are achieved.

The invention discloses an elliptical airy vortex beam generator based on a metasurface and a beam generation method thereof, the generator is provided with a silicon dioxide substrate, the substrate is provided with a plurality of nano-columns, the nano-columns are distributed in a matrix mode, the length of each nano-column is Wx, the width of each nano-column is Wy, and the rotation angle of each nano-column is alpha; the light beam generation method comprises the steps that the light beam generator generates an elliptical Airy vortex light beam under vertical incidence of circularly polarized light, and the polarization conversion rate and the transmissivity of a transmission light field are changed by controlling the geometric size and the rotation angle of the nano-column. According to the invention, a plurality of nano columns made of monocrystalline silicon are arranged on the silicon dioxide substrate to construct a metasurface device, and compared with a traditional spatial light modulator, the device is simple in structure, lighter in weight and smaller in size on the premise that complex light beams conforming to expectation can be generated, and convenience is brought to generation of the complex light beams in practical application.

A scanning exposure apparatus according to this invention has a light source which can change the central wavelength of exposure light to undergo pulsed oscillation, and scan-exposes a substrate with slit-like exposure light while periodically changing the central wavelength in synchronism with the pulsed oscillation of the exposure light. The scanning exposure apparatus includes a controller which controls the light source so that integrated values Sws and Swl obtained by integrating the intensity of the exposure light for each wavelength in the scanning direction in a short-wavelength range and long-wavelength range, respectively, assuming a target central wavelength as a reference satisfy:

|(Sws−Swl)/(Sws+Swl)|≦0.1

The invention discloses a focal depth expansion type intraocular lens. The intraocular lens comprises an optical main body, a first supporting loop and a second supporting loop, and the optical main body has smooth phase distribution; the optical main body, the first supporting loop and the second supporting loop are of an integrated structure, are made of the same material and are integrally formed; the surfaces of the first supporting loop and the second supporting loop are provided with inclined sawtooth grooves or protruding frosted sand; and the optical main body is composed of two optical surfaces, and one optical surface is additionally provided with an annular belt structure. The free-form surface and the aspheric surface or the spherical surface are combined in the optical area of the optical main body, so that chromatic aberration is eliminated in a visible light range, the focal depth is larger, the image quality is better, high visual independence and few visual side effects are provided, and people have an excellent visual effect under the large-range focal depth.

The invention discloses a method for dynamically regulating the focal depth of a focal lens in photoetching imaging equipment, which comprises the following steps of: (a) selecting any image block in a wafer, measuring a distance d from the surface of the image block to the center of the focal lens; (b) judging whether the distance d satisfies f -|DOF|<= d <= f + |DOF|, wherein f is the focal distance of the focal lens and is more than 0, and DOF is the focal depth of the focal lens; (c) if the inequality is satisfied, executing the step (d); if d is judged to be less than f -|DOF|, driving the driving mechanism to enable the wafer to move from the direction vertical to the surface of the wafer to the direction away from the focal lens until d is not less thanf+|DOF|, and executing the step (d); and if d is judged to be more than f +|DOF|, driving the driving mechanism to enable the wafer to move from the direction vertical to the surface of the wafer to the direction close to the focal lens until d is not more than f + |DOF|, and executing the step (d); and (d) implementing exposure imaging on the image block and returning to the step (a).