The invention discloses a planar magnetron sputtering target, which is composed of a flange, a pressing sleeve, a water cylinder, an excitation coil, an electrical pure iron sleeve, an insulating sleeve, a water nozzle, a pressure plate, a set screw, an electrical pure iron pressure rod, a sealing ring, a gasket, an insulating cover, a pressing ring, bolts, an insulating spacer sleeve, a shielding cover, slotted countersunk head screws, a compressing ring, a neodymium iron boron permanent magnet column, and a positioning bracket part. The planar magnetron sputtering target is unique in shielding cover design, structural arrangement of the excitation coil, electrical pure iron sleeve and permanent magnet, magnetic field adjustability of the magnetron sputtering target, cooling structure design and other aspects, solves the common defects of point discharge, low sputtering rate on magnetic materials, complex cooling structure and the like frequently encountered by magnetron sputtering targets, and improves the target material utilization rate. The planar magnetron sputtering target provided by the invention has the characteristics of simple structure, stable and reliable work, large magnetic field adjustable range, high sputtering efficiency, convenient maintenance and low cost, and can be widely applied to vacuum magnetron sputtering coating equipment.