The invention relates to an inspection device (100, 200, 300, 400, 500) for detecting defects on a substrate, such as a
wafer, comprising:-an illumination module (10) comprising at least one
light source (12) configured to illuminate at least one area of the substrate (30) to be inspected with at least one illumination beam (20, 21); -at least one
detector (51, 52, 53, 54, 54-1, 54-2, 55, 55-1, 55-2, 56-1, 56-2) configured to detect light emitted from the substrate (30) and to generate an inspection
signal; -a light collection module; and-a
processing module configured to generate inspection information as a function of the inspection
signal, in which the light collection module comprises at least one collection lens (40) having a nanostructured surface (90) comprising at least one light collection area (91, 92, 92 ', 93, 94, 95, 96, 97, 98), and a plurality of light collection regions (51, 52, 53, 54, 54-1, 54-2, 55, 55-1, 55-2, 56-1, 56-2) configured to collect light within a predetermined
solid angle (81, 82, 83, 84, 85) emitted from the substrate (30) and to direct the collected light towards respective detectors (51, 52, 53, 54, 54-1, 54-2, 55, 55-1, 55-2, 56-1, 56-2), the light collection regions and the respective detectors forming collection channels (61, 62, 63, 64, 65, 66, 67, 68).