The present invention provides a double gated
transistor and a method for forming the same that results in improved device performance and density. The preferred embodiment of the present invention provides a double gated
transistor with asymmetric gate
doping, where one of the double gates is doped degenerately n-type and the other degenerately p-type. By
doping one of the gates n-type, and the other p-type, the
threshold voltage of the resulting device is improved. Additionally, the preferred
transistor design uses an asymmetric structure that results in reduced gate-to-drain
and gate-to-source
capacitance. In particular, dimensions of the weak gate, the gate that has a workfunction less attractive to the channel carriers, are reduced such that the weak gate does not overlap the source / drain regions of the transistor. In contrast the strong gate, the gate having a workfunction that causes the inversion layer to form adjacent to it, is formed to slightly overlap the source / drain regions. This asymmetric structure allows for the performance benefits of a
double gate design without the increased
capacitance that would normally result.