The invention provides a gas atomization pulverizing device capable of reducing
satellite powder, and belongs to the technical field of
metal powder preparation devices. The problems that in an existing vacuum gas atomization pulverizing technology, the yield of
fine powder is low,
powder adheres and agglomerates, and the number of
satellite ball powder is large are solved. A second
nozzle is additionally arranged at the bottom of an atomizing chamber, bottom
airflow is introduced, the temperature of the atomizing chamber is reduced, and meanwhile the moving track of
backflow airflow is improved. Annular auxiliary gas of an annular gas spraying device promotes atomized liquid drops to be cooled, reverse
argon spraying is carried out at the bottom of an atomization cabin, cooling is accelerated, meanwhile, the collision and bonding probability between
metal molten drops in the powder atomization process is reduced, powder adhesion and agglomeration are avoided, the powder fluidity is improved, and the gas atomization powder
satellite powder content is reduced. The high-standard requirement of industrial production for high-quality spherical
metal powder is met, and meanwhile the working efficiency of
vacuum induction melting gas atomization powder manufacturing equipment of a cold-wall
crucible is improved.