The invention relates to a technique for preparing an anode alumina film, in particular to a method for preparing the anode alumina film which has small aperture, is ultra thin and is controllable in aperture and thickness. In the method, high-pure aluminum is used as an anode, a certain constant-voltage and direct-current power supply is applied onto a sulfuric acid electrolyte to perform anodicoxidation, proper voltages between the cathode and the anode, electrolyte concentration, electrolyte temperature and anode oxidization time are selected, and after the reaction, anode alumina with analuminum substrate is used as an anode and placed in mixed solution of perchloric acid and acetone, anode electrolysis treatment is performed under a voltage which is 5 to 15V higher than an anode oxidization voltage to make an alumina film separate from the aluminum substrate and to remove a baffle layer, and thus, the small-aperture through-hole anode alumina film with controllable aperture andthickness is obtained. When the method is used, the mass, simple, nondestructive, uniform and large-scale preparation of small-aperture and through-hole anode alumina film is realized, and the technical problem that the small-diameter and ultra-thin through hole anode alumina film is not available at present is solved.