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65 results about "Body Patterning" patented technology

The processes occurring in early development that direct morphogenesis. They specify the body plan ensuring that cells will proceed to differentiate, grow, and diversify in size and shape at the correct relative positions. Included are axial patterning, segmentation, compartment specification, limb position, organ boundary patterning, blood vessel patterning, etc.

Semiconductor integrated circuit devices having single crystalline thin film transistors and methods of fabricating the same

Semiconductor integrated circuit devices having single crystalline thin film transistors and methods of fabricating the same are provided. The semiconductor integrated circuit devices include an interlayer insulating layer formed on a semiconductor substrate and a single crystalline semiconductor plug penetrating the interlayer insulating layer. A single crystalline semiconductor body pattern is provided on the interlayer insulating layer. The single crystalline semiconductor body pattern has an elevated region and contacts the single crystalline semiconductor plug. The method of forming the single crystalline semiconductor body pattern having the elevated region includes forming a sacrificial layer pattern covering the single crystalline semiconductor plug on the interlayer insulating layer. A capping layer is formed to cover the sacrificial layer pattern and the interlayer insulating layer, and the capping layer is patterned to form an opening which exposes a portion of the sacrificial layer pattern. Subsequently, the sacrificial layer pattern is selectively removed to form a cavity in the capping layer, and a planarized single crystalline semiconductor body pattern is formed to fill the cavity and the opening.
Owner:SAMSUNG ELECTRONICS CO LTD

Imitated stone slab with preset patterns containing different size grading raw materials and preparation method thereof

The invention provides an imitated stone slab with preset patterns containing different size grading raw materials. The imitated stone slab with the preset patterns containing the different size grading raw materials is characterized in that a product of the imitated stone slab is made of porcelain raw materials; the product of the imitated stone slab contains two to twenty types of body pattern color areas with different preset shapes, wherein the body pattern color areas have different colors which can be obviously distinguished, or the body pattern color areas have the same color with different color depths, or the body pattern color areas have mixed colors with different proportions of colors; the thickness of each multicolour pattern body of each pattern color area of the imitated stone slab is 70-100% of that of a three-dimensional space from the surface layer of the product to the back side of the product; in at least one type of the pattern color areas, 1-10000 patterns are made of colored raw materials which have different preset size grading and comprise 5-95% of large-particle materials with the largest particle size of 6-20mm, 0-90% of middle-particle materials with the largest particle size of 1-6mm, 0-90% of sand powder with the largest particle size of 0.3-1mm, and 5-95% of micro-fine powder with the largest particle size of 0.1-0.3mm; the consumption of the raw materials with different particle sizes and the colors of different color area patterns are determined according to the requirements given in advance.
Owner:陈章武

Semiconductor integrated circuit devices having single crystalline thin film transistors and methods of fabricating the same

Semiconductor integrated circuit devices having single crystalline thin film transistors and methods of fabricating the same are provided. The semiconductor integrated circuit devices include an interlayer insulating layer formed on a semiconductor substrate and a single crystalline semiconductor plug penetrating the interlayer insulating layer. A single crystalline semiconductor body pattern is provided on the interlayer insulating layer. The single crystalline semiconductor body pattern has an elevated region and contacts the single crystalline semiconductor plug. The method of forming the single crystalline semiconductor body pattern having the elevated region includes forming a sacrificial layer pattern covering the single crystalline semiconductor plug on the interlayer insulating layer. A capping layer is formed to cover the sacrificial layer pattern and the interlayer insulating layer, and the capping layer is patterned to form an opening which exposes a portion of the sacrificial layer pattern. Subsequently, the sacrificial layer pattern is selectively removed to form a cavity in the capping layer, and a planarized single crystalline semiconductor body pattern is formed to fill the cavity and the opening.
Owner:SAMSUNG ELECTRONICS CO LTD

Preparation method for mono-firing embossed ceramic tile

The invention relates to a preparation method for a mono-firing embossed ceramic tile. The mono-firing embossed ceramic tile comprises a main tile body and an embossed tile body. The preparation method comprises the following steps that (1) a ground coat is applied to a billet; (2) main tile body pattern printing and embossed tile body pattern printing are conducted on the billet coated with the bottom coat, and an embossed tile billet is produced; (3) protective glaze is applied to the main tile billet and the embossed tile billet obtained in the step (2); (4) an embossed material corresponding to an embossed tile pattern is printed on the embossed tile billet obtained in the step (3), so that a three-dimensional layer is formed; and (5), the main tile billet obtained in the step (3) and the embossed tile billet obtained in the step (4) are fired, so that the mono-firing main tile body and the mono-firing embossed tile body are obtained. By adoption of the preparation method for the mono-firing embossed ceramic tile, the three-dimensional effect of a tri-firing product embossed tile is achieved, deficiencies of the tri-firing product are overcome, the durability of the product is enhanced, the energy source is saved, the labor cost is lowered, and good economical and social benefits can be obtained.
Owner:MONALISA GRP CO LTD

Network security target range system of electric power monitoring system

The invention provides a network security target range system of an electric power monitoring system, which comprises a working area and a machine room area. The working area comprises an attack and defense test area, an electric power monitoring system operation area, a real object target range area and an attack and defense process display area. The machine room area comprises a main station monitoring area, a plant station monitoring area, an attack and defense display monitoring area and a virtual target range machine pool. The system is beneficial for technicians to construct a network security range system which takes a main station monitoring area, a plant station monitoring area, an attack and defense display monitoring area, an attack and defense test area, an electric power monitoring system operation area and a real object range area as a main body pattern. The constructed network security target range system enhances the working association degree and the working coordination degree between the internal unit areas, so that the system pattern tends to be clear, the security degree is improved, and the strain capacity is also improved. The attack and defense target rangecombining virtuality and reality is adopted, the virtual target range with rapid deployment and recovery capacity is achieved, and the physical target range with high intuition and obvious effect is also achieved.
Owner:YUNNAN POWER GRID CO LTD ELECTRIC POWER RES INST
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