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12 results about "Residual gas analyzer" patented technology

A residual gas analyzer (RGA) is a small and usually rugged mass spectrometer, typically designed for process control and contamination monitoring in vacuum systems. Utilizing quadrupole technology, there exists two implementations, utilizing either an open ion source (OIS) or a closed ion source (CIS). RGAs may be found in high vacuum applications such as research chambers, surface science setups, accelerators, scanning microscopes, etc.

Method and device for on-line detection of vacuum degree between multi-layer insulation layers of a cryogenic container

PendingCN122360785AResidual gas analyzerInsulation layer
This invention discloses an online detection method and device for the interlayer vacuum degree of multi-layer insulation in cryogenic containers, belonging to the field of cryogenic insulation vacuum detection technology. The method includes: installing a vacuum-sealed base on the outer wall of the container; penetrating the outer liner with a piercing capillary probe and inserting it into the interlayer gap; constructing a two-stage high-vacuum differential system consisting of an oil-free dry forepump, a turbomolecular pump, a fine-tuning needle valve, a flow-limiting capillary, a differential chamber, and a residual gas analyzer to form a low-speed drainage loop; after pre-evacuating the background gas, adjusting the fine-tuning needle valve to extract the interlayer gas at low speed, simultaneously collecting the total pressure and component partial pressures; calculating the true vacuum degree by combining flow resistance, gas resistance, permeation resistance, and temperature correction; after detection, leaving the end of the piercing capillary probe inside the layer without removing it, and permanently sealing the base port; repeating the detection at different points and depths to complete a full-area scan. This application has the advantages of direct online detection, minimally invasive and leak-free operation, repeatable testing, and accurate tracing of failure causes.
Owner:JIANGSU ZHONGKE JINGYUAN ENERGY SAVING TECH CO LTD

Hierarchical control method and device of residual gas analyzer and medium

PendingCN121721124AMaterial analysis by electric/magnetic meansElectron multiplicationElectron multiplier
The invention provides a hierarchical control method and device for a residual gas analyzer and a medium, and the method comprises the steps: receiving a starting instruction sent by machine station equipment, and starting an ion source when the local vacuum degree is smaller than a first preset threshold value; when the total voltage is smaller than a second preset threshold value, an electron multiplier power supply is started; when the local vacuum degree and the total pressure are smaller than a third preset threshold value, a mass spectrometer power supply is started; receiving a vacuum breaking instruction sent by the station equipment, and disconnecting a functional module power supply of the residual gas analyzer; and receiving a power-off instruction sent by the station equipment, and when the local vacuum degree and the total pressure are greater than or equal to a second preset threshold value, cutting off the power supply of the electron multiplier, and when the local vacuum degree and the total pressure are greater than or equal to a first preset threshold value, disconnecting the ion source and the mass spectrometer power supply in sequence. The problem of hardware damage caused by out-of-control vacuum degree of the residual gas analyzer is solved through vacuum degree pre-judgment, graded protection and intelligent collaborative protection methods.
Owner:YIRUI IMAGING TECH CHENGDU CO LTD

Helicon wave plasma driven deuterium permeation measuring device and permeation measuring method thereof

PendingCN121678485ANuclear energy generationPermeability/surface area analysisResidual gas analyzerHelicon
The invention discloses a helicon wave plasma-driven deuterium permeation measurement device. The device comprises a plasma generation system and a permeation measurement system, the plasma generation system comprises an external magnetic field arranged on the upstream vacuum chamber; deuterium is introduced into one end of the upstream vacuum chamber, and the other end is connected with a downstream vacuum chamber; one end of the downstream vacuum chamber is located in the upstream vacuum chamber and defines a sample to be detected, and the other end is connected with a residual gas analyzer; the plasma generation system applies a magnetic field outside the upstream vacuum chamber through an axial magnetic field unit, generates helicon wave plasma, and enables the helicon wave plasma to be propagated to the surface of the to-be-detected sample in the axial direction and permeate the to-be-detected sample; and the penetration measurement system is used for detecting deuterium penetrating through the to-be-detected sample. The invention discloses a helicon wave plasma driven deuterium permeation measuring device and a permeation measuring method thereof, which can improve the deuterium permeation driving capability and realize stable steady-state deuterium permeation measurement.
Owner:SUZHOU UNIV

residual gas analyzer

ActiveCN309954907SResidual gas analyzerProcess equipment
1. Name of the product in this design: Residual Gas Analyzer. 2. Purpose of this design: To perform qualitative and quantitative analysis of the composition of gases in closed vacuum systems of etching and thin film processing equipment. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key points: a 3D model.
Owner:SHANGHAI CHEYITIAN TECH CO LTD

residual gas analyzer

ActiveCN310017592SResidual gas analyzerPhysical chemistry
1. The name of the design product: residual gas analyzer. 2. The use of the design product: for gas mass spectrometry, detecting gas leakage rate. 3. The design points of the design product: in the shape of the product. 4. The picture or photo that best indicates the design points: perspective view.
Owner:SUZHOU YIYANG INTELLIGENT TECHNOLOGY CO LTD

Method and system for testing gas composition inside a microcavity of a MEMS wafer level package

PendingCN122361583AGas compositionEngineering
This invention relates to the field of microelectromechanical system (MEMS) packaging and testing, and discloses a method and system for testing the gas composition inside a microcavity in a MEMS wafer-level package. The method includes the following steps: acquiring the coordinate information and geometric parameters of a target microcavity on the wafer under test; aligning a locally sealed sampling head with the surface of the region where the target microcavity is located; releasing gas from the target microcavity into the locally sealed sampling cavity; updating the posterior probability distribution of the gas component concentration vector in real time based on a Bayesian inference framework; inputting the enriched sample gas into a residual gas analyzer; and retrieving the gas composition and concentration inside a single microcavity based on gas type and partial pressure information. Precise positioning is achieved by acquiring the coordinate information and geometric parameters of the target microcavity, and adaptive optimal stopping of the accumulated number is achieved by updating the posterior probability distribution of the gas component concentration vector in real time during the sequential opening process based on a Bayesian inference framework.
Owner:MIGELAB

System and method for detecting wafers outgassing in a vacuum load-lock using a residual gas sensor

A system for detecting and / or minimizing outgassing contamination released from a sample into a tool, the system including: a tool configured to characterize a tested sample, wherein operation conditions of the characterization tool includes reaching a vacuum level of 10−6 Torr or higher, a load lock chamber, and a time-of-flight residual gas analyzer (TOF-RGA) sensor in fluid flow communication with the load-lock chamber, the TOF-RGA is configured to provide a real-time measurement of a composition of gasses released from the tested sample into the load lock chamber.
Owner:APPL MATERIALS ISRAEL LTD

System and method for adaptive cleaning of a high-vacuum chamber

ActiveUS20260081122A1Electric discharge tubesResidual gas analyzerThermodynamics
A system and a method for an adaptive plasma-cleaning process for a reaction chamber allow continual monitoring by a residual gas analyzer, while active plasma-cleaning is carried out in the reaction chamber. The system includes a valve system and a pump system that allow the residual gas analyzer to perform continual monitoring at a favorable pressure condition that is independent of the active plasma-cleaning process.
Owner:IBSS GROUP

Battery electrolyte leakage detection system and method

PendingCN121762130ADetection of fluid at leakage pointResidual gas analyzerCalibration gas
The invention provides a detection system and a test method for battery electrolyte leakage. The detection system comprises a mass spectrometer, a four-way sample introduction interface, a capillary sampling tube and a battery detection cavity system, the mass spectrometer is a residual gas analyzer of a closed ion source; the battery detection cavity system comprises a battery detection cavity and a vacuum pump assembly acting on the battery detection cavity; the inlet end of the ionization chamber of the mass spectrometer, the four-way sample introduction interface, the capillary sampling tube and the air outlet end of the battery detection cavity are communicated in sequence; the other two interfaces of the four-way sample introduction interface are respectively connected with a calibration gas path and an auxiliary sample introduction gas path; at least one of the vacuum cavity tube, the four-way sample introduction interface and the capillary sampling tube of the mass spectrometer is provided with a heating suite used for heating gas to be detected. By adopting the detection system provided by the invention, the sensitivity, the response speed and the accuracy of battery electrolyte leakage detection can be greatly improved.
Owner:YIRUI IMAGING TECH CHENGDU CO LTD

Split type residual gas analyzer device

PendingCN121856366Awiden lengthRelaxing strict length restrictionsMaterial analysis by electric/magnetic meansAmplifier combinationsResidual gas analyzerMass Spectrometry-Mass Spectrometry
The invention provides a split type residual gas analyzer device, which relates to the technical field of mass spectrometry instruments, and comprises an electronic unit, a probe and a compensation and amplification unit, the electronic unit is connected with the probe through a cable; the electronic unit comprises a main control module and a radio frequency module, and the main control module is configured to adjust the frequency of the radio frequency module to realize resonance; the compensation and amplification unit comprises a feedback signal compensation module used for compensating the voltage drop loss of the radio frequency feedback signal; the compensation and amplification unit further comprises a signal primary amplification module used for amplifying signals output by the probe. Wherein a signal output by the probe is amplified by the signal primary amplification module and then is transmitted to the electronic unit through a cable. The split type residual gas analyzer provided by the invention can be effectively applied to radiation-containing fields such as synchrotron radiation light sources and nuclear industry, effectively ensures that the electronic unit is used in a non-radiation or weak-radiation environment, and prolongs the service life of the whole analyzer.
Owner:SHANGHAI YUDA INDUSTRIAL CO LTD

System and method for detecting wafer outgassing in vacuum load lock using residual gas sensor

Disclosed herein is a system and method for detecting and / or minimizing outgassing contamination released from a sample into a tool, the system comprising: a tool configured to characterize a sample under test wherein operating conditions characterizing the tool include reaching a vacuum level of 10-6 torr or greater; a load lock chamber; and a time-of-flight residual gas analyzer (TOF-RGA) sensor in fluid flow communication with the load lock chamber, the TOF-RGA configured to provide a real-time measurement of a composition of a gas released from the sample under test into the load lock chamber.
Owner:APPL MATERIALS ISRAEL LTD

PVD (Physical Vapor Deposition) equipment capable of automatically adjusting water vapor content

ActiveCN223951163UVacuum evaporation coatingSputtering coatingData terminalResidual gas analyzer
The utility model discloses PVD (Physical Vapor Deposition) equipment capable of automatically adjusting water vapor content. The PVD equipment comprises a reaction cavity, a data terminal, a residual gas analyzer and a water vapor generating mechanism, the residual gas analyzer and the water vapor generating mechanism are both connected with the data terminal, the reaction cavity is connected with the residual gas analyzer and the water vapor generating mechanism, and the residual gas analyzer is used for monitoring the water vapor content in the reaction cavity and transmitting the water vapor content data to the data terminal. And the data terminal controls the water vapor generating mechanism to automatically convey water vapor into the reaction cavity according to water vapor content data fed back by the residual gas analyzer. The device has the advantages of being compact in structure, convenient to maintain, high in automation degree and the like, an optimal process window is obtained through quantitative control over water vapor, therefore, deposition of films of different batches is more uniform, the performance of the films of different batches is more stable, and the working stability and efficiency of the PVD procedure are remarkably improved.
Owner:HUNAN RED SUN PHOTOELECTRICITY SCI & TECH