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27 results about "Residual gas analyzer" patented technology

A residual gas analyzer (RGA) is a small and usually rugged mass spectrometer, typically designed for process control and contamination monitoring in vacuum systems. Utilizing quadrupole technology, there exists two implementations, utilizing either an open ion source (OIS) or a closed ion source (CIS). RGAs may be found in high vacuum applications such as research chambers, surface science setups, accelerators, scanning microscopes, etc.

Method and device for on-line detection of vacuum degree between multi-layer insulation layers of a cryogenic container

PendingCN122360785AResidual gas analyzerInsulation layer
This invention discloses an online detection method and device for the interlayer vacuum degree of multi-layer insulation in cryogenic containers, belonging to the field of cryogenic insulation vacuum detection technology. The method includes: installing a vacuum-sealed base on the outer wall of the container; penetrating the outer liner with a piercing capillary probe and inserting it into the interlayer gap; constructing a two-stage high-vacuum differential system consisting of an oil-free dry forepump, a turbomolecular pump, a fine-tuning needle valve, a flow-limiting capillary, a differential chamber, and a residual gas analyzer to form a low-speed drainage loop; after pre-evacuating the background gas, adjusting the fine-tuning needle valve to extract the interlayer gas at low speed, simultaneously collecting the total pressure and component partial pressures; calculating the true vacuum degree by combining flow resistance, gas resistance, permeation resistance, and temperature correction; after detection, leaving the end of the piercing capillary probe inside the layer without removing it, and permanently sealing the base port; repeating the detection at different points and depths to complete a full-area scan. This application has the advantages of direct online detection, minimally invasive and leak-free operation, repeatable testing, and accurate tracing of failure causes.
Owner:JIANGSU ZHONGKE JINGYUAN ENERGY SAVING TECH CO LTD

Apparatus to detect and quantify radical concentration in semiconductor processing systems

Embodiments disclosed herein include a processing tool for measuring neutral radical concentrations. In an embodiment, the processing tool comprises a processing chamber, and a neutral radical mass spectrometry (NRMS) analyzer fluidically coupled to the processing chamber. In an embodiment, the NRMS analyzer comprises a first chamber fluidically coupled to the processing chamber, where the first chamber comprises a modulator, and a second chamber fluidically coupled to the first chamber, where the second chamber is a residual gas analyzer or a mass spectrometer. In an embodiment, an unobstructed line of sight passes from the processing chamber to the second chamber.
Owner:APPLIED MATERIALS INC

Enclosed residual gas analyzer

ActiveCN309589843SResidual gas analyzerGas composition
1. The name of the design product: closed residual gas analyzer. 2. The use of the design product: for gas composition analysis in vacuum environment. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view 1.
Owner:YIRUI IMAGING TECH CHENGDU CO LTD

Closed loop residual gas analyzer electronic control unit

ActiveCN309740190SResidual gas analyzerClosed loop
1. The name of the design product: closed residual gas analyzer electronic control unit. 2. The use of the design product: for electronic control closed residual gas analyzer. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view 1.
Owner:YIRUI IMAGING TECH CHENGDU CO LTD

Hierarchical control method and device of residual gas analyzer and medium

The invention provides a hierarchical control method and device for a residual gas analyzer and a medium, and the method comprises the steps: receiving a starting instruction sent by machine station equipment, and starting an ion source when the local vacuum degree is smaller than a first preset threshold value; when the total voltage is smaller than a second preset threshold value, an electron multiplier power supply is started; when the local vacuum degree and the total pressure are smaller than a third preset threshold value, a mass spectrometer power supply is started; receiving a vacuum breaking instruction sent by the station equipment, and disconnecting a functional module power supply of the residual gas analyzer; and receiving a power-off instruction sent by the station equipment, and when the local vacuum degree and the total pressure are greater than or equal to a second preset threshold value, cutting off the power supply of the electron multiplier, and when the local vacuum degree and the total pressure are greater than or equal to a first preset threshold value, disconnecting the ion source and the mass spectrometer power supply in sequence. The problem of hardware damage caused by out-of-control vacuum degree of the residual gas analyzer is solved through vacuum degree pre-judgment, graded protection and intelligent collaborative protection methods.
Owner:YIRUI IMAGING TECH CHENGDU CO LTD

Residual Gas Analyzer (RGA)

ActiveCN309601895SResidual gas analyzerGas composition
1. Name of the product in this design: Residual Gas Analyzer (RGA). 2. Application of this design: This design is used for gas composition analysis in a vacuum environment. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: 3D view 1.
Owner:DONGGUAN HAIRUISI MEASUREMENT & CONTROL TECH CO LTD

Helicon wave plasma driven deuterium permeation measuring device and permeation measuring method thereof

PendingCN121678485ANuclear energy generationPermeability/surface area analysisResidual gas analyzerHelicon
The invention discloses a helicon wave plasma-driven deuterium permeation measurement device. The device comprises a plasma generation system and a permeation measurement system, the plasma generation system comprises an external magnetic field arranged on the upstream vacuum chamber; deuterium is introduced into one end of the upstream vacuum chamber, and the other end is connected with a downstream vacuum chamber; one end of the downstream vacuum chamber is located in the upstream vacuum chamber and defines a sample to be detected, and the other end is connected with a residual gas analyzer; the plasma generation system applies a magnetic field outside the upstream vacuum chamber through an axial magnetic field unit, generates helicon wave plasma, and enables the helicon wave plasma to be propagated to the surface of the to-be-detected sample in the axial direction and permeate the to-be-detected sample; and the penetration measurement system is used for detecting deuterium penetrating through the to-be-detected sample. The invention discloses a helicon wave plasma driven deuterium permeation measuring device and a permeation measuring method thereof, which can improve the deuterium permeation driving capability and realize stable steady-state deuterium permeation measurement.
Owner:SUZHOU UNIV

Device for testing and analyzing purity of high-purity gas

The utility model discloses a high-purity gas purity testing and analyzing device which comprises a dry pump, a molecular pump, a cold trap, a testing cavity, a connecting pipeline and a gas sampler which are connected in sequence, and the testing cavity is connected with a residual gas analyzer and a high vacuum gauge; the gas sampler comprises a double-end self-sealing joint, the double-end self-sealing joint comprises a sealing male head and a sealing female head which are detachably fixed, and the end, away from the sealing female head, of the sealing male head is fixedly connected with a connecting pipeline. According to the gas sampler, the dry pump can assist the molecular pump to establish a high vacuum environment for the side view cavity, the two ends of the gas sampler are arranged to be of detachable self-sealing joint structures, it is guaranteed that the sampler cannot be polluted by external gas in the disassembly and assembly process, and meanwhile the gas sampler can be flexibly used to achieve sampling in different environments; through on-line sampling of the sampling end of the gas sampler, helium sampling of the helium compressor can be completed without shutdown of the GM refrigerating machine system, and the test precision is improved.
Owner:VACREE TECH

residual gas analyzer

ActiveCN309954907SResidual gas analyzerProcess equipment
1. Name of the product in this design: Residual Gas Analyzer. 2. Purpose of this design: To perform qualitative and quantitative analysis of the composition of gases in closed vacuum systems of etching and thin film processing equipment. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key points: a 3D model.
Owner:SHANGHAI CHEYITIAN TECH CO LTD

residual gas analyzer

ActiveCN310017592SResidual gas analyzerPhysical chemistry
1. The name of the design product: residual gas analyzer. 2. The use of the design product: for gas mass spectrometry, detecting gas leakage rate. 3. The design points of the design product: in the shape of the product. 4. The picture or photo that best indicates the design points: perspective view.
Owner:SUZHOU YIYANG INTELLIGENT TECHNOLOGY CO LTD

Method and system for testing gas composition inside a microcavity of a MEMS wafer level package

PendingCN122361583AGas compositionEngineering
This invention relates to the field of microelectromechanical system (MEMS) packaging and testing, and discloses a method and system for testing the gas composition inside a microcavity in a MEMS wafer-level package. The method includes the following steps: acquiring the coordinate information and geometric parameters of a target microcavity on the wafer under test; aligning a locally sealed sampling head with the surface of the region where the target microcavity is located; releasing gas from the target microcavity into the locally sealed sampling cavity; updating the posterior probability distribution of the gas component concentration vector in real time based on a Bayesian inference framework; inputting the enriched sample gas into a residual gas analyzer; and retrieving the gas composition and concentration inside a single microcavity based on gas type and partial pressure information. Precise positioning is achieved by acquiring the coordinate information and geometric parameters of the target microcavity, and adaptive optimal stopping of the accumulated number is achieved by updating the posterior probability distribution of the gas component concentration vector in real time during the sequential opening process based on a Bayesian inference framework.
Owner:MIGELAB

Monitored and controlled plasma waste stream abatement apparatus and method of use thereof

PendingUS20260008084A1Gas treatmentSolid waste disposalResidual gas analyzerOptical spectrometer
The invention comprises an apparatus and / or a method of use thereof for breaking down a waste product in a plasma, comprising the steps of: inputting the waste product through an input line into a plasma housing, the plasma housing containing the plasma; breaking down the waste product into chemical breakdown products in the plasma; generating, with a first sensor, a first signal related to the chemical breakdown products; and controlling, with a main controller provided the first signal, timing of release of the chemical breakdown products from the plasma housing, such as with the optional steps of: detecting, with a spectrometer emission lines originating within the plasma housing and / or generating, with a residual gas analyzer, a signal related to the chemical breakdown products.
Owner:LEE W DAVIS +1

Method of auto tuning one or more sensors

A method for automatically calibrating a sensor for a residual gas analyzer includes measuring a known sample by the sensor and obtaining data measurements at a first mass unit. A peak model function is fitted to the data to determine an existence of a peak. The peak model function is aligned to the data using dynamic time warping to determine peak features. It is determined whether a position of a peak center and a peak width are within a predetermined tolerance and, if so, the previous steps are performed for a next mass unit. If the position peak center or the peak width at the first mass unit are outside the predetermined tolerance, a sensor parameter is adjusted and another iteration of the calibration is performed. A signal is issued after a maximum number of iterations has been performed and the peak center and width are outside the predetermined tolerance.
Owner:INFICON INC

System and method for detecting wafers outgassing in a vacuum load-lock using a residual gas sensor

A system for detecting and / or minimizing outgassing contamination released from a sample into a tool, the system including: a tool configured to characterize a tested sample, wherein operation conditions of the characterization tool includes reaching a vacuum level of 10−6 Torr or higher, a load lock chamber, and a time-of-flight residual gas analyzer (TOF-RGA) sensor in fluid flow communication with the load-lock chamber, the TOF-RGA is configured to provide a real-time measurement of a composition of gasses released from the tested sample into the load lock chamber.
Owner:APPL MATERIALS ISRAEL LTD

High-pressure residual gas analyzer

ActiveCN309605652SResidual gas analyzerGas composition
1. Name of the product in this design: High-Pressure Residual Gas Analyzer. 2. Application of this design: Gas composition analysis in a vacuum environment. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key points: a 3D model.
Owner:YIRUI IMAGING TECH CHENGDU CO LTD

System and method for adaptive cleaning of a high-vacuum chamber

ActiveUS20260081122A1Electric discharge tubesResidual gas analyzerThermodynamics
A system and a method for an adaptive plasma-cleaning process for a reaction chamber allow continual monitoring by a residual gas analyzer, while active plasma-cleaning is carried out in the reaction chamber. The system includes a valve system and a pump system that allow the residual gas analyzer to perform continual monitoring at a favorable pressure condition that is independent of the active plasma-cleaning process.
Owner:IBSS GROUP

Battery electrolyte leakage detection system and method

PendingCN121762130ADetection of fluid at leakage pointResidual gas analyzerCalibration gas
The invention provides a detection system and a test method for battery electrolyte leakage. The detection system comprises a mass spectrometer, a four-way sample introduction interface, a capillary sampling tube and a battery detection cavity system, the mass spectrometer is a residual gas analyzer of a closed ion source; the battery detection cavity system comprises a battery detection cavity and a vacuum pump assembly acting on the battery detection cavity; the inlet end of the ionization chamber of the mass spectrometer, the four-way sample introduction interface, the capillary sampling tube and the air outlet end of the battery detection cavity are communicated in sequence; the other two interfaces of the four-way sample introduction interface are respectively connected with a calibration gas path and an auxiliary sample introduction gas path; at least one of the vacuum cavity tube, the four-way sample introduction interface and the capillary sampling tube of the mass spectrometer is provided with a heating suite used for heating gas to be detected. By adopting the detection system provided by the invention, the sensitivity, the response speed and the accuracy of battery electrolyte leakage detection can be greatly improved.
Owner:YIRUI IMAGING TECH CHENGDU CO LTD

Split type residual gas analyzer device

PendingCN121856366Awiden lengthRelaxing strict length restrictionsMaterial analysis by electric/magnetic meansAmplifier combinationsResidual gas analyzerMass Spectrometry-Mass Spectrometry
The invention provides a split type residual gas analyzer device, which relates to the technical field of mass spectrometry instruments, and comprises an electronic unit, a probe and a compensation and amplification unit, the electronic unit is connected with the probe through a cable; the electronic unit comprises a main control module and a radio frequency module, and the main control module is configured to adjust the frequency of the radio frequency module to realize resonance; the compensation and amplification unit comprises a feedback signal compensation module used for compensating the voltage drop loss of the radio frequency feedback signal; the compensation and amplification unit further comprises a signal primary amplification module used for amplifying signals output by the probe. Wherein a signal output by the probe is amplified by the signal primary amplification module and then is transmitted to the electronic unit through a cable. The split type residual gas analyzer provided by the invention can be effectively applied to radiation-containing fields such as synchrotron radiation light sources and nuclear industry, effectively ensures that the electronic unit is used in a non-radiation or weak-radiation environment, and prolongs the service life of the whole analyzer.
Owner:SHANGHAI YUDA INDUSTRIAL CO LTD

A vacuum apparatus and method for sorbent pump performance testing

The present application provides a kind of vacuum device and method for adsorbent pump performance test, comprising: vacuum pumping system, vacuum gas supply system, vacuum measurement system, auxiliary heating system.The main vacuum chamber air extractor set in vacuum pumping system is made of turbine molecular pump and front stage pump;Vacuum gas supply system is connected by small gas storage tank and standard gas cylinder with main vacuum chamber through vacuum pipeline, for gas supply in experimental process;Vacuum measurement system is made of each type gauge and residual gas analyzer, can measure the gas pressure of vacuum chamber and gas storage tank, analyzes and detects the residual gas composition and state of main vacuum chamber, measures the inflation rate in real time;Auxiliary heating system is made of power supply and its control system, maintains the temperature required for adsorbent pump to work, heats crucible to carry out coating treatment and wall treatment in initial stage.The vacuum air extractor set can be quickly pumped to 10 ‑6 Pa order of magnitude for adsorbent pump pumping speed performance research, and the influence of coating treatment on adsorbent pump performance is studied.
Owner:HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES +1

System for trace krypton measurement in high purity xenon and method thereof

PendingCN122651848AAvoid the cumbersome process of individual calibrationAchieve traceable quantitative analysisKryptonResidual gas analyzer
The application discloses a system and method for measuring trace krypton in high-purity xenon, and belongs to the technical field of rare gas purification analysis and mass spectrometry, and solves the problem that a commercial residual gas analyzer cannot directly detect ppt-level krypton impurities in high-purity xenon due to insufficient sensitivity. The application firstly removes impurity gas by an active impurity removal unit, then captures and retains krypton at low temperature by a cold head thermal coupling pre-enrichment unit, and performs primary enrichment of krypton by utilizing the distribution difference of krypton in gas-liquid xenon, and then most of xenon gas is intercepted by condensation or freezing by a cold trap enrichment unit, and secondary enrichment of krypton is performed, so that the signal ratio of krypton to xenon in the sample entering the residual gas analyzer is greatly improved, and the originally undetectable ppt-level trace krypton by the commercial residual gas analyzer can be effectively distinguished and quantitatively measured.
Owner:SICHUAN RES INST OF SHANGHAI JIAOTONG UNIV

System and method for detecting wafer outgassing in vacuum load lock using residual gas sensor

Disclosed herein is a system and method for detecting and / or minimizing outgassing contamination released from a sample into a tool, the system comprising: a tool configured to characterize a sample under test wherein operating conditions characterizing the tool include reaching a vacuum level of 10-6 torr or greater; a load lock chamber; and a time-of-flight residual gas analyzer (TOF-RGA) sensor in fluid flow communication with the load lock chamber, the TOF-RGA configured to provide a real-time measurement of a composition of a gas released from the sample under test into the load lock chamber.
Owner:APPL MATERIALS ISRAEL LTD

A residual gas analyzer vacuum electrode, a brazing tool and a brazing method thereof

The application provides a residual gas analyzer vacuum electrode, a brazing tool and a brazing method thereof. The vacuum electrode comprises an electrode assembly, a Kovar electrode rod, a ceramic base and a Kovar base. The electrode assembly comprises a signal collection electrode and a shielding electrode. A plurality of Kovar electrode rods are arranged at the periphery of the shielding electrode. The ceramic base is used for accommodating the shielding electrode and the plurality of Kovar electrode rods. The Kovar base is used for positioning the ceramic base. The brazing tool comprises a base, a first pressing block and a second pressing block. The brazing method comprises the following steps: providing the vacuum electrode and the brazing tool; sequentially placing the Kovar electrode rod and the signal collection electrode into the base; sequentially installing the shielding electrode, an insulating ceramic tube, the Kovar base and the ceramic base into the base; placing the first pressing block on the ceramic base; placing the second pressing block on the insulating ceramic tube; and performing brazing after the assembling is completed. The application ensures the brazing reliability and strength of the whole vacuum electrode, and facilitates the batch production of the vacuum electrode.
Owner:YIRUI IMAGING TECH CHENGDU CO LTD

Apparatus to detect and quantify radical concentration in semiconductor processing systems

Embodiments disclosed herein include a processing tool for measuring neutral radical concentrations. In an embodiment, the processing tool comprises a processing chamber, and a neutral radical mass spectrometry (NRMS) analyzer fluidically coupled to the processing chamber. In an embodiment, the NRMS analyzer comprises a first chamber fluidically coupled to the processing chamber, where the first chamber comprises a modulator, and a second chamber fluidically coupled to the first chamber, where the second chamber is a residual gas analyzer or a mass spectrometer. In an embodiment, an unobstructed line of sight passes from the processing chamber to the second chamber.
Owner:APPLIED MATERIALS INC

Particle beam component measurement device

The utility model relates to the technical field of vacuum equipment, and discloses a particle beam component measuring device which comprises a vacuum cavity, a gas source, a low-temperature pump and a residual gas analyzer. The gas source is in vacuum sealing connection with the vacuum cavity and used for generating particle beams. The low-temperature pump comprises a pump cavity, the pump cavity is connected and communicated with the vacuum cavity in a vacuum sealing mode, and the pump cavity comprises a residual gas analyzer connector. And the residual gas analyzer is in vacuum sealing connection with the residual gas analyzer interface and is used for measuring gas components in the pump cavity.
Owner:FERMION INSTR (SHANGHAI) CO LTD

Metalized plastic heat shield enclosure for heated inlet manifold

An insulated gas inlet assembly is provided including a gas inlet assembly disposed on an instrument manifold and a metalized enclosure at least partially disposed on at least one of the gas inlet assembly and the instrument manifold, wherein the metalized enclosure includes a metal layer disposed on a molded plastic shell. Also provided is a method for controlling the temperature of a residual gas analyzer including providing a residual gas analyzer with an instrument manifold and a gas inlet assembly with a gas inlet chassis; positioning the element on the gas inlet chassis, the heating element being thermally coupled to the gas inlet chassis; at least partially disposing a metalized enclosure on at least one of the gas inlet chassis and the instrument manifold; and directing an electrical current through a conduit into the heating element to generate a temperature gradient across the gas inlet chassis.
Owner:INFICON INC

Metalized plastic heat shield enclosure for heated inlet manifold

PCT designated stageWO2025194044A1Particle separator tubesWithdrawing sample devicesResidual gas analyzerThermodynamics
An insulated gas inlet assembly is provided including a gas inlet assembly disposed on an instrument manifold and a metalized enclosure at least partially disposed on at least one of the gas inlet assembly and the instrument manifold, wherein the metalized enclosure includes a metal layer disposed on a molded plastic shell. Also provided is a method for controlling the temperature of a residual gas analyzer including providing a residual gas analyzer with an instrument manifold and a gas inlet assembly with a gas inlet chassis; positioning the element on the gas inlet chassis, the heating element being thermally coupled to the gas inlet chassis; at least partially disposing a metalized enclosure on at least one of the gas inlet chassis and the instrument manifold; and directing an electrical current through a conduit into the heating element to generate a temperature gradient across the gas inlet chassis.
Owner:INFICON INC

PVD (Physical Vapor Deposition) equipment capable of automatically adjusting water vapor content

ActiveCN223951163UVacuum evaporation coatingSputtering coatingData terminalResidual gas analyzer
The utility model discloses PVD (Physical Vapor Deposition) equipment capable of automatically adjusting water vapor content. The PVD equipment comprises a reaction cavity, a data terminal, a residual gas analyzer and a water vapor generating mechanism, the residual gas analyzer and the water vapor generating mechanism are both connected with the data terminal, the reaction cavity is connected with the residual gas analyzer and the water vapor generating mechanism, and the residual gas analyzer is used for monitoring the water vapor content in the reaction cavity and transmitting the water vapor content data to the data terminal. And the data terminal controls the water vapor generating mechanism to automatically convey water vapor into the reaction cavity according to water vapor content data fed back by the residual gas analyzer. The device has the advantages of being compact in structure, convenient to maintain, high in automation degree and the like, an optimal process window is obtained through quantitative control over water vapor, therefore, deposition of films of different batches is more uniform, the performance of the films of different batches is more stable, and the working stability and efficiency of the PVD procedure are remarkably improved.
Owner:HUNAN RED SUN PHOTOELECTRICITY SCI & TECH