The utility model relates to an optical
waveguide structure, which comprises a glass substrate, an optical
waveguide layer and a filling layer, the optical
waveguide layer is composed of a thinned
wafer, the
refractive index of the optical waveguide layer is higher than that of the glass substrate and that of the filling layer, and the optical waveguide layer is arranged on the glass substrate in a bonding manner. The optical waveguide layer is arranged on the glass substrate, the surface, away from the glass substrate, of the optical waveguide layer is provided with an
etching grating structure, the filling layer is embedded in an
etching gap of the
etching grating structure, the outer side surface of the filling layer and the outer side surface of the etching
grating structure are approximately located on the same plane, and / or the filling layer covers the outer side surface of the etching grating structure. According to the utility model, the glass substrate is used as the optical waveguide substrate, the bonded and thinned high
refractive index wafer is used as the optical waveguide layer so as to form the predetermined etching grating structure, and the filling layer with the lower
refractive index is used for filling the etching gap of the etching grating structure, so that the light emitting efficiency is improved, the
coupling-out uniformity is ensured, and the
rainbow pattern is reduced; the method has the advantages of stable process and easy
mass production, and is suitable for large-batch process production.