Embodiments of the present invention disclose a thin film transistor, a method of manufacturing a thin film transistor, an array substrate and a display device, which may ensure electrical connection between source and drain electrodes and an active layer without configuring any through hole due to providing an etch stop layer between the active layer and the source and drain electrodes, a portion of the etch stop layer being in contact with the source and drain electrode is made of metal or metal alloy; and may ensure insulation between the source and the drain electrodes when the thin film transistor is turned-off, ensuring normal operation of the thin film transistor, by oxidating the portion of the etch stop layer at the position between the source and the drain electrodes as an insulating material. The etch stop layer may not only prevent the active layer from being damaged when etching the source and drain electrodes, but also prevent the active layer from other adverse effects from subsequent processes, such as adverse effects from water, hydrogen and oxygen, etc., thereby enhancing performance of the thin film transistor, just because of providing the etch stop layer between the active layer and the source and drain electrodes in the thin film transistor.