The invention relates to a high-performance carbon film resistor, and a preparation method thereof, and belongs to the technical field of thin film resistor. A carbon film slurry comprises, by weight, 15 to 25 parts of graphite, 8 to 16 parts of carbon black, 1 to 3 parts of phenolic resin, 2 to 5 parts of silicon dioxide, 1 to 3 parts of a binder, 2 to 3 parts of silver oxide, 3 to 5 parts of copper oxide, and 30 to 40 parts of propyl alcohol. The preparation method comprises following steps: graphite and carbon black are mixed, an obtained mixture is subjected to ball milling for 30 to 40min, and is subjected to sintering for 20 to 28min under nitrogen protection at 170 to 180 DEG C; the other raw materials are added, an obtained mixed product is subjected to ultrasonic treatment for 30 to 45min, and is delivered through a filter membrane with filtration pore diameter of 130 to 160<mu>m so as to obtain the carbon film slurry; a ceramic substrate is coated with the carbon film slurry via magnetron sputtering so as to obtain finished products, wherein acceleration voltage is controlled to be 300 to 340V, magnetic field intensity is controlled to be 200 to 300G, electric current density is controlled to be 50 to 60mA / cm, power density is controlled to be 30 to 40W / cm, film thickness is controlled to be 0.2 to 0.8<mu>m. The high-performance carbon film resistor possesses excellent performance, low negative temperature coefficient, and excellent high frequency characteristics; influences caused by voltage and frequency are low; noise electrodynamic potential is low; pulse load is stable; resistance range is wide; and production cost is low.