The invention relates to the technical field of semiconductors, and provides a lateral double-diffused transistor and a manufacturing method thereof. The lateral double-diffused transistor includes a straight part and a curved part, and the straight part includes a straight drain end, a straight drift region, a straight source gate and a substrate. , the straight source gate and the substrate are arranged on both sides of the straight drain end, the straight drift region is arranged between the straight drain end, the straight source gate and the substrate; the curved part includes the curved drain end, the curved source gate and the lining The bottom and the curved drift region located between the curved drain end and the curved source gate and the substrate, and a plurality of curved doping strips, wherein the curved drift region, the curved source gate and the substrate are connected to the curved source gate and the substrate. The concentric semi-circular ring structure of the channel drain end is arranged on the periphery of the curved channel drain end in turn, a plurality of curved doping strips are arranged in the curved drift region at intervals, and the extension direction of the center line of at least one curved doping strip is the same as that of the curved channel. The radii of the semicircular structures of the track parts are coincident. Thereby, charge balance can be achieved to improve the breakdown voltage and effectively reduce the source-drain on-resistance.