The invention discloses a slow lifting device which comprises a rack,
lifting equipment is arranged on the rack, a slow lifting groove is formed in the bottom end of the rack, the slow lifting groove is connected with a water inlet device, the water inlet device comprises a distributed water inlet
pipe arranged at the bottom of the slow lifting groove, a plurality of water inlet holes are formed in the distributed water inlet
pipe, and the water inlet holes are communicated with the slow lifting groove. The distributed water inlet
pipe is connected with a filter through a pipeline, an
exhaust valve is arranged at the top of the filter, an air draft device is arranged at the bottom of the slow lifting groove, and an air supply filtering device is arranged at the top of the rack. According to the slow lifting device and the method for cleaning the
photomask substrates without the dry spots, the slow lifting device is simple in structure and has the capability of cleaning the multiple
photomask substrates at a time, the working efficiency of the
photomask substrates is greatly improved, and meanwhile, the method for cleaning the photomask substrates without the dry spots has the advantages that the cost is low, and the working efficiency is high. The
watermark problem of the photomask substrate can be effectively avoided.