Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

12 results about "Light scatter measurement" patented technology

Multiangle light scattering (MALS) describes a technique for measuring the light scattered by a sample into a plurality of angles. It is used for determining both the absolute molar mass and the average size of molecules in solution, by detecting how they scatter light.

Modified conjugated diene polymer, method for producing modified conjugated diene polymer, bale, rubber composition, and tire

PCT designated stageWO2026075003A1Special tyresPolymer scienceLight scatter measurement
This modified conjugated diene polymer satisfies conditions (i) to (v) described below. Condition (i): The Mooney viscosity measured at 100ºC is 100 or more. Condition (ii): The glass transition temperature is -95°C to -45°C. Condition (iii): The content of silicon atoms is 170 ppm or more relative to the total amount of the modified conjugated diene polymer, and the mass ratio of the content of silicon atoms to the content of nitrogen atoms is 3 or more. Condition (iv): The modification rate is 70 mass% or more. Condition (v): The degree of branching (Bn) as determined by a GPC-light scattering measurement method with a viscosity detector is 6 or more.
Owner:ASAHI KASEI KOGYO KABUSHIKI KAISHA

Method for determining crystal defects in a workpiece made of monocrystalline silicon

The invention relates to a method for determining crystal defects in a workpiece made of monocrystalline silicon, comprising the following steps: (i) reactive ion etching at least one surface of the workpiece in a gas mixture comprising oxygen and one or more halogen-containing compounds selected from the group consisting of elemental halogen X2, hydrogen halide HX and nitrogen halide NHnX3-n, wherein X is selected from the group of Cl and Br, and 0 ≤ n ≤ 2, the flow rate of oxygen and of each of the one or more halogen-containing compounds is not less than 5 sccm and not more than 100 sccm, and the at least one surface of the workpiece to be etched is exposed to the gas mixture for no less than 10 seconds and no more than 20 minutes; and (ii) identifying defects on the etched surface of the workpiece by means of light scattering measurement.
Owner:SILTRONIC AG

Aerosol scattering measurement device and use method thereof

PendingCN121298536AScattering properties measurementsAngular scanLight scatter measurement
The invention discloses an aerosol scattering measurement device and a use method thereof, and belongs to the field of light scattering measurement, the aerosol scattering measurement device comprises an aerosol scattering cylinder, the top and the bottom of the aerosol scattering cylinder are fixedly connected with a top cover and a bottom cover respectively, and a measurement assembly is arranged outside the aerosol scattering cylinder. An aerosol circulation assembly is arranged in the aerosol scattering cylinder and comprises an input pipe which is fixedly connected to the interior of the top cover, and the axis of the input pipe coincides with the axis of the top cover; by arranging the rotatable arc-shaped detection mechanism and the modularized arc-shaped sleeve plate and utilizing a single photoelectric detector to be matched with a precise gear transmission system, full-automatic and multi-angle scanning measurement of scattered light signals is realized, the use number of detectors is remarkably reduced, and the device cost and complexity are greatly reduced; moreover, the angle measurement range is effectively expanded, and an angle scattering distribution diagram with higher spatial resolution is obtained.
Owner:CHINA JILIANG UNIV

Apparatus and method for measuring particle size of small particles in water by off-axis scanning light scattering

ActiveCN115420658BMaterial analysisBeam expanderLight scatter measurement
The application provides a water body small particle size suspended matter particle size heteroaxial scanning light scattering measurement device and method, which comprises a laser, a beam expander, a small hole, a Fourier lens, a sample cell, a rotating table and a photomultiplier tube; wherein the beam expander, the small hole, the Fourier lens, a diaphragm, the rotating table and the sample cell are sequentially arranged behind the laser; the rotating arm of the rotating table is provided with the photomultiplier tube; the laser emits a single beam of light as an excitation light source of the device, which irradiates the beam expander; the beam expander is used to change the beam diameter and divergence angle of the single beam of light; the beam expander is provided with the small hole and the Fourier lens behind the beam expander, and the small hole is arranged at the common focal point of the beam expander and the Fourier lens; the Fourier lens converges the light beam filtered through the small hole; the Fourier lens is provided with the diaphragm behind the Fourier lens, and the diaphragm is used to filter the edges of the converged light beam, so that the laser beam is more uniform; the diaphragm is provided with the rotating table and the sample cell behind the diaphragm.
Owner:HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES

Method for identifying metal impurities in a process for manufacturing wafers from semiconductor material

PendingDE102024002721A1Semiconductor materialsLight scatter measurement
Method for identifying metal impurities in a process for manufacturing wafers from semiconductor material, comprising the following steps: (A) Providing a test disk made of semiconductor material characterized in that it has defects which are capable of agglomerating impurities; (B) Performing at least one step of a process for manufacturing disks from semiconductor material using the test disk; (C) Identifying the positions and sizes of defects on the test disc using light scattering measurement; and (D) Investigate at least one of the defects identified in step (C) for the presence of at least one metal using at least one analytical method selected from mass spectrometry, energy-dispersive X-ray spectroscopy or electron energy loss spectroscopy.
Owner:SILTRONIC AG

Light scattering measurement device and light scattering measurement method

ActiveUS12638372B2Scattering properties measurementsLight scatter measurementRefractive index
Provided are a light scattering measurement device and a light scattering measurement method that specify a material of a particle included in a dispersion liquid including at least one type of particles. The light scattering measurement device includes a light source unit that irradiates the dispersion liquid including at least one type of particles with measurement light, a parameter setting unit that sets at least one of a scattering angle or a measurement wavelength as a measurement parameter, a scattered light measurement unit that obtains a plurality of pieces of scattering intensity data by measuring a scattering intensity of scattered light emitted from the dispersion liquid by the measurement light a plurality of times while changing a value of the measurement parameter a plurality of times, and a calculation unit that calculates scattering intensity time variation characteristic data and scattering intensity parameter-dependent data from the scattering intensity data, and specifies a material of each type of particle of the particles of the dispersion liquid specified by fitting the scattering intensity time variation characteristic data and the scattering intensity parameter-dependent data using a theoretical formula or a simulation based on a theory of electromagnetic wave behavior that defines a relationship of a refractive index, a particle diameter, and the scattering intensity.
Owner:FUJIFILM CORP

Reflective surface light scattering measurement system and method for micro-scale restricted channels

PendingCN122042605AFlow propertiesSurface/boundary effectLight scatter measurementEngineering
The invention discloses a reflective surface light scattering measurement system and method for a micro-scale limited channel, and belongs to the technical field of fluid interface thermal physical property measurement. The measuring system comprises an optical path measuring system and an adjustable micro-scale channel structure, the light path measurement system comprises a reflective light path measurement module and a signal processing module, and the adjustable micro-scale channel structure comprises a micro-channel construction module and a multi-dimensional adjustable platform; according to the system, a micro-scale limited channel is formed by two base blocks which are oppositely arranged, a multi-dimensional adjustable platform is combined, the parallelism of the opposite surfaces of the channel is kept, meanwhile, continuous adjustment of a channel gap within a preset range is achieved, and therefore fluid interface environments under different limited conditions are constructed. According to the method, continuous adjustment of micron-order width can be realized in a micro-scale limited channel, surface wave signals are acquired at a high signal-to-noise ratio through a small-angle reflective light scattering system, and in-situ measurement of the interface property of the fluid is quickly and accurately realized.
Owner:TAIYUAN UNIVERSITY OF TECHNOLOGY

Line for manufacturing semiconductor substrate, method for manufacturing semiconductor substrate, method for inspecting semiconductor substrate, method for processing semiconductor substrate, and method for evaluating processing of semiconductor substrate

PCT designated stageWO2026071134A1Polycrystalline material growthAfter-treatment detailsLight scatter measurementControl system
The present invention achieves good and stable substrate quality in processing of a semiconductor substrate. Provided is a line for manufacturing a semiconductor substrate, the line including a line body and a line control system. The line body includes a processing device for processing the semiconductor substrate, a light scattering measurement device for obtaining measurement values of the intensity of scattered light from the semiconductor substrate by means of a light scattering method, and a conveyance device for conveying the semiconductor substrate. The line control system includes a conveyance control unit which controls the conveyance device on the basis of the measurement values obtained by the light scattering measurement device.
Owner:KWANSEI GAKUIN EDUCTIONAL FOUND +2

Light scattering measurement based on multiple light sources

Techniques are described herein for air quality sensing. In some examples, the techniques are implemented as an apparatus including first and second light sources, a light detector having a detector output, and a processing circuit having a processing input coupled to the detector output and a processing output. The first light source is configured to generate a first light signal having a first wavelength. The second light source is configured to generate a second light signal having a second wavelength different from the first wavelength. The light detector is configured to generate a first detection signal at the detector output responsive to the first light signal and a second detection signal at the detector output responsive to the second light signal. The processing circuit is configured to generate a third signal representative of an air quality measurement at the processing output responsive to the first and second detection signals.
Owner:TEXAS INSTRUMENTS INC

A method, system, and storage medium for monitoring thermal stability of a complex emulsifier

The application relates to the technical field of composite emulsifier monitoring, and discloses a thermal stability monitoring method and system of a composite emulsifier and a storage medium. The method comprises the following steps: performing oil-water interfacial tension dynamic measurement and particle size distribution analysis on initial emulsion of the composite emulsifier to obtain initial characteristic parameters; constructing a multi-parameter light scattering measurement platform and performing measurement parameter calibration to obtain light scattering measurement calibration parameters; loading the initial emulsion into the multi-parameter light scattering measurement system, and performing thermal cycle processing according to the light scattering measurement calibration parameters to obtain multi-angle scattering signal data; calculating thermal response characteristic data based on the multi-angle scattering signal data and the initial characteristic parameters, and calculating multi-stage thermal stability scores based on the thermal response characteristic data; and generating a formula parameter optimization scheme based on the multi-stage thermal stability scores. The application can monitor the stability change of the composite emulsifier in real time during the thermal treatment process, and improves the monitoring efficiency and the optimization accuracy of the formula parameters.
Owner:ZHEJIANG XINSHENG OIL TECH CO LTD

A light scattering pendant drop shape parameter measurement system and method

PendingCN122108869AUsing optical meansMaterial analysisFast Fourier transformLight scatter measurement
The application discloses a light scattering suspended drop shape parameter measurement system and method, and belongs to the technical field of fluid characteristic research. The method comprises the following steps: using a monochromatic coherent laser beam, expanding the laser beam into an incident light with a beam width of 3-5 times of the diameter of the suspended drop to uniformly irradiate the suspended drop; adopting a combined bilinear CCD detector to respectively collect first-order rainbow signals and second-order rainbow signals generated by the suspended drop scattering; performing fast Fourier transform filtering on the collected signals, reconstructing a scattering angle distribution diagram after filtering out high-frequency components; extracting the positions and intensities of multiple groups of scattering peak values in the scattering angle distribution diagram, calculating the radius of the suspended drop through the position interval of the multiple groups of peak values, and calculating the vertical direction curvature radius of the suspended drop through the ratio of the multiple groups of peak values of the first-order rainbow and the second-order rainbow. The method breaks through the limitation that the existing light scattering measurement method can only be applied to spherical liquid drops / circular liquid columns, and successfully expands the light scattering measurement technology to the shape parameter measurement of non-spherical liquid drops.
Owner:XIDIAN UNIV