The invention relates to a spectrum and
electron beam combined detection method and device for particles on the surface of a
wafer, and the method comprises the steps: scanning the surface of the
wafer on a sample stage by using a
scattered light pre-detection unit, obtaining a
pollutant position coordinate set, and inputting the coordinate set into a positioning
control unit; pulse lasers emitted by the two pulse lasers are respectively broadened to a
picosecond level through the
pulse stretcher and then are combined, and are focused to the surface of the
pollutant through the objective lens to excite an anti-Stokes optical
signal, so that
spectral data are obtained, and the components of the organic
pollutant are identified; and in combination with the morphology
feature data and the pollutant component data, outputting a target pollutant component state analysis result. By exciting an anti-Stokes
light signal enhanced by a nonlinear effect, avoiding a
fluorescence interference wave band and filtering
stray light in combination with the band-pass
optical filter group, the
signal-to-
noise ratio of a spectral
signal is greatly improved, and the problem of
fluorescence interference is effectively solved. Sample pollutant component information can be obtained more quickly and comprehensively, and the defect that conventional detection equipment can only detect the particle size is overcome.