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78results about How to "Reduce redeposition" patented technology
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Method for controlling etch process repeatability
ActiveUS7078312B1Reducing and eliminating chamber loadingReducing and eliminating and redepositionSemiconductor/solid-state device manufacturingChemical vapor deposition coatingHigh densityHydrogen
Plasma etch processes incorporating etch chemistries which include hydrogen. In particular, high density plasma chemical vapor deposition-etch-deposition processes incorporating etch chemistries which include hydrogen that can effectively fill high aspect ratio (typically at least 3:1, for example 6:1, and up to 10:1 or higher), narrow width (typically sub 0.13 micron, for example 0.1 micron or less) gaps while reducing or eliminating chamber loading and redeposition and improving wafer-to-wafer uniformity relative to conventional deposition-etch-deposition processes which do not incorporate hydrogen in their etch chemistries.
Owner:NOVELLUS SYSTEMS
Spraying liquid bunch electrolysis-laser composite processing method and apparatus thereof
InactiveCN1919514ASolve processing problemsEfficient removalLaser beam welding apparatusElectrolysisLaser processing
The invention discloses a spraying liquid beam electrolytic-laser compound manufacturing method and device, which comprises the following steps: utilizing layer generating device to produce laser beam on the working piece, manufacturing hole, seam and groove, generating high-speed spraying liquid removing material with the same shaft of laser beam through spraying liquid beam device. The device contains layer, working piece assembling chuck, power and spraying liquid beam device, wherein the spraying liquid beam device concludes assembling seat of spraying device, insulating switching seat, cathode, focal lens, protective lens, insulating sleeve and sprayer.
Owner:NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
Hydrogen-based phosphosilicate glass process for gap fill of high aspect ratio structures
InactiveUS7001854B1Increase flow rateReduced side-wall dielectric redepositionSemiconductor/solid-state device manufacturingDopantHydrogen
Chemical vapor deposition processes are employed to fill high aspect ratio (typically at least 3:1), narrow width (typically 1.5 microns or less and even sub 0.13 micron) gaps with significantly reduced incidence of voids or weak spots. This deposition process involves the use of hydrogen and a phosphorus dopant precursor as process gasses in the reactive mixture of a plasma containing CVD reactor. The process gas also includes dielectric forming precursor molecules such as silicon and oxygen containing molecules.
Owner:NOVELLUS SYSTEMS
Utilizing Sidewall Spacer Features to Form Magnetic Tunnel Junctions in an Integrated Circuit
InactiveUS20080211055A1Easily controlled deposition and etchingReduce redepositionSolid-state devicesSemiconductor/solid-state device manufacturingEtchingEngineering
Novel methods for reliably and reproducibly forming magnetic tunnel junctions in integrated circuits are described. In accordance with aspects of the invention, sidewall spacer features are utilized during the processing of the film stack. Advantageously, these sidewall spacer features create a tapered masking feature which helps to avoid byproduct redeposition during the etching of the MTJ film stack, thereby improving process yield. Moreover, the sidewall spacer features may be used as encapsulating layers during subsequent processing steps and as vertical contacts to higher levels of metallization.
Owner:GLOBALFOUNDRIES INC
Dental Laser System and Treatment Method
ActiveUS20110189628A1Increase temperatureReduce redepositionTeeth fillingDental toolsEngineeringResidual energy
An improved dental laser system has been developed to cut enamel quickly and precisely, without detrimental residual energy, to provide a replacement for conventional high speed rotary burrs and commercially available dental laser systems.
Owner:CONVERGENT DENTAL INC
Utilizing sidewall spacer features to form magnetic tunnel junctions in an integrated circuit
ActiveUS20070166840A1Easily controlled deposition and etchingReduce redepositionSolid-state devicesSemiconductor/solid-state device manufacturingEtchingEngineering
Novel methods for reliably and reproducibly forming magnetic tunnel junctions in integrated circuits are described. In accordance with aspects of the invention, sidewall spacer features are utilized during the processing of the film stack. Advantageously, these sidewall spacer features create a tapered masking feature which helps to avoid byproduct redeposition during the etching of the MTJ film stack, thereby improving process yield. Moreover, the sidewall spacer features may be used as encapsulating layers during subsequent processing steps and as vertical contacts to higher levels of metallization.
Owner:TAIWAN SEMICON MFG CO LTD
Gap fill for high aspect ratio structures
InactiveUS7067440B1Efficient growth processIncrease flow rateSemiconductor/solid-state device manufacturingChemical vapor deposition coatingHydrogenGas phase
Chemical vapor deposition processes are employed to fill high aspect ratio (typically at least 3:1), narrow width (typically 1.5 microns or less and even sub 0.15 micron) gaps with significantly reduced incidence of voids or weak spots. This deposition process involves the use of hydrogen as a process gas in the reactive mixture of a plasma containing CVD reactor. The process gas also includes dielectric forming precursor molecules such as silicon and oxygen containing molecules.
Owner:NOVELLUS SYSTEMS
Inductive magnetic head with non-magnetic seed layer gap structure and method for the fabrication thereof
InactiveUS20050219745A1Easy to PlatingDesirable magnetic flux flow characteristicElectrical transducersManufacture head surfaceMagnetic polesEngineering
A magnetic head including first and a second magnetic poles with a write gap layer disposed therebetween. In a first embodiment the write gap layer includes a non-magnetic, non-conductive first sublayer which is preferably comprised of Ta or Ti which is deposited upon the first magnetic pole to act as an adhesion layer. The write gap layer then includes a second sublayer which is formed of a non-magnetic, electrically conductive material which is preferably comprised of Rh or Ru. A P2 pole tip is electroplated upon the second sublayer, where the electrically conductive second sublayer is utilized to conduct electroplating current. In an alternative embodiment the write gap layer includes a third sublayer that is etchable in a reactive ion etch (RIE) process, and formed between the first and second sublayers. The third sublayer is preferably comprised of Ta or Ti.
Owner:WESTERN DIGITAL TECH INC
Enzyme Solubility in Liquid Detergent and Use of Detergent Composition
InactiveUS20160097022A1Improve fabric softnessPrevention reductionSurface-active detergent compositionsNon-surface-active detergent compositionsSolubilityHydrogen
The present invention concerns a method for increasing the solubility of an enzyme in a liquid detergent composition comprising one or more enzymes, an anionic surfactant and a solvent system, which liquid detergent composition has a Hansen Solubility Parameter hydrogen bonding contribution (δh) in the range of 2-35. In addition, the invention concerns a liquid detergent composition and use of the detergent composition.
Owner:NOVOZYMES AS
Detergent composition comprising a surfactant system and a pyrophosphate
InactiveUS7854770B2Improve the level ofReduce redepositionInorganic/elemental detergent compounding agentsOrganic detergent compounding agentsPhosphatePyrophosphate
A detergent composition comprising:from 0.01% to 90% by weight of a surfactant system,one or more detergency builder(s), comprising a phosphate builder, and the phosphate builder containing pyrophosphate,wherein the composition comprises at most 12% by weight of phosphate builder(s) and the phosphate builder(s) comprise(s) at least 40% by weight of pyrophosphate(s).
Owner:PROCTER & GAMBLE CO
Polypeptides
ActiveUS20180187175A1Improve washing effectReduce redepositionHydrolasesDetergent mixture composition preparationNucleotideBiochemistry
Owner:NOVOZYMES AS
Cleaning compositions comprising enzymes
ActiveUS20190161707A1Improve fabric softnessPrevention reductionHydrolasesDetergent compounding agentsHexosaminidase activityGlycosidase activity
The present invention relates to compositions, methods and use of a mixture of enzymes having DNase activity and an enzyme having hexosaminidase activity.
Owner:NOVOZYMES AS
Detergent Composition
ActiveUS20180216040A1Prevention or reduction of dye transferDecrease tendencyDetergent compounding agentsGlycosylasesGalactanase activityChemistry
Owner:NOVOZYMES AS
Yanbai laundry powder
InactiveCN101376869ALow costNo side effectsInorganic non-surface-active detergent compositionsPhosphateLinear alkylbenzene sulfonate
The invention discloses salt-white laundry powder which is manufactured by the materials like linear alkylbenzene sulfonate, liquid sodium hydroxide, 4A zeolite, sodium carbonate, sodium sulfate, sodium chloride, Na2SiO3, sodium carboxymethyl cellulose, and the like. The salt-white laundry powder is fast dissolved, saves dosage, has a high decontamination capacity, effectively removes various besmirches and has the characteristics of sterilization, whitening, gentle property, harmless to hands and clothes, and the like. Proved by experiment, the washing cleanliness of the clothes is improved by 30 to 35 percent than the washing effect of the existing phosphate-free laundry powder.
Owner:中盐东兴盐化股份有限公司 +1
Inductive magnetic head with non-magnetic seed layer gap structure and method for the fabrication thereof
InactiveCN1677496AIdeal Magnetic Flux Flow CharacteristicsReduce redepositionManufacture head surfaceHeads using thin filmsMagnetic polesConductive materials
The present invention discloses a magnetic head, including a first and a second magnetic pole, and a write gap layer placed between the two poles. In the first embodiment, the write gap layer includes a non-magnetic, non-conductive first layer, which is preferably composed of Ta or Ti, and deposites on the first pole as the role of a bonding layer. The write gap layer further includes a second layer layer, which is formed by a non-magnetic, non-conductive material, preferably composed of Rh or Ru. The P2 pole sharp is plated on the second layer, in which the conductive second layer is used to conduct the plating current. In another embodiment, the write gap layer includes a third layer, which can be etched in an active ion etching (RIE) process, and is formed between the first layer and the second layer. The third layer is preferably composed of Ta or Ti.
Owner:HITACHI GLOBAL STORAGE TECH NETHERLANDS BV
Inductive magnetic head with non-magnetic seed layer gap structure and method for the fabrication thereof
InactiveUS7265942B2Reduce redepositionReduce processing timeElectrical transducersManufacture head surfaceMagnetic polesEngineering
A magnetic head including first and a second magnetic poles with a write gap layer disposed therebetween. In a first embodiment the write gap layer includes a non-magnetic, non-conductive first sublayer which is preferably comprised of Ta or Ti which is deposited upon the first magnetic pole to act as an adhesion layer. The write gap layer then includes a second sublayer which is formed of a non-magnetic, electrically conductive material which is preferably comprised of Rh or Ru. A P2 pole tip is electroplated upon the second sublayer, where the electrically conductive second sublayer is utilized to conduct electroplating current. In an alternative embodiment the write gap layer includes a third sublayer that is etchable in a reactive ion etch (RIE) process, and formed between the first and second sublayers. The third sublayer is preferably comprised of Ta or Ti.
Owner:WESTERN DIGITAL TECH INC
Chemical machine polishing liquor for KTP crystal
The invention discloses a chemical mechanic buffing liquid of titanium potassium oxide phosphate, which comprises the following parts: 10-90 percent nanometer SiO2 sol, 0.5-10 percent inorganic alkaline and organic alkaline, 0.5-10 percent non-ionic surfactant, 0.5-10 percent chelant and deionized water. The invention can prevent surface fish tail effectively, which improves the surface flatness.
Owner:HEBEI UNIV OF TECH
Polypeptides for Cleaning or Detergent Compositions
InactiveUS20150353871A1Improvement of textile-softnessReduction of dye transferNon-surface-active detergent compositionsDetergent compounding agentsAmylasePolynucleotide
The present invention relates to cleaning or detergent compositions comprising polypeptides exhibiting beta-glucanase activity and one or more amylases and their use thereof in cleaning or detergent applications and processes such as cleaning hard-surfaces, dish wash and laundering. The invention also relates to polynucleotides encoding the polypeptides as well as methods of producing the polypeptides.
Owner:NOVOZYMES AS
Detergent composition
InactiveUS20180105772A1Improve the immunityDifferent propertyHydrolasesSurface-active detergent compositionsCombinatorial chemistryA deoxyribonuclease
The present invention concerns a detergent comprising a deoxyribonuclease (DNase). The present invention further relates to methods and uses of the detergent comprising a deoxyribonuclease (DNase) for laundering.
Owner:NOVOZYMES AS
Method for manufacturing semiconductor device, and method for processing etching-target film
ActiveUS20090123875A1Reduce redepositionImprove efficiencyPhotomechanical apparatusSemiconductor/solid-state device manufacturingResistDevice material
The present invention provides a method for processing an etching-target film, which can achieve both of a highly precise dry etching process and a reduction of LER. A method for processing an etching-target film, comprises: forming, in sequence from the bottom, an organic mask layer 40, a silicon-containing layer 50 and a resist layer 70, over an etching-target film; forming a predetermined pattern in the resist layer 70 by a photolithography process; etching the silicon-containing layer 50 through a mask of the resist layer 70 by employing a first etching gas; etching the organic mask layer 40 through a mask of the etched silicon-containing layer 50 by employing a second etching gas; and etching the etching-target film through a mask of the etched organic mask layer 40 by employing a third etching gas, wherein the first etching gas contains trifluoroiodomethane (CF3I).
Owner:RENESAS ELECTRONICS CORP
Laundry detergent composition containing amphoteric polymer
InactiveCN109790494AImprove oil repellencyEnhanced oil repellencyOrganic detergent compounding agentsLaundry detergentMonomer
The invention relates to a solid laundry detergent composition containing an amphoteric polymer, said amphoteric polyemer being characterized in that least 30% of its monomeric units are betaine unitsrepresented by the following formula (I): H2C=C(R1)-C(0)0-(CH2)n-N+(R2)(R3)-(CH2)p-X (I) wherein: R1 represents a hydrogen atom or a linear or branched Ci to C6 alkyl group; R2 and R3, independentlyof each other, represent an alkyl, hydroxyalkyl or aminoalkyl group in which the alkyl group is a linear or branched C1 to C6 alkyl;n is an integer in the range of 1 to 4; p is an integer in the rangeof 2 to 8; X represents COO". The inventors have discovered that laundry detergent compositions containing the aforementioned amphoteric polymer are capable of increasing the oil repellency of fabrics.
Owner:UNILEVER NV
Surfactant-free detergent composition comprising an anti-soil redeposition agent
InactiveUS7407924B2Reduce redepositionEasily redepositedInorganic/elemental detergent compounding agentsOrganic detergent compounding agentsInorganic saltsSynthetic Detergents
Washing is carried out using a detergent composition having main detergency obtained through an alkaline inorganic salt and further including at least an anti-soil redeposition agent. There is provided a clothes washing method, and a detergent composition for the same, that uses a detergent having detergency equivalent to or greater than that of synthetic detergents containing a surface active agent as the main detergency ingredient and also has excellent anti-soil redeposition efficiency wherein main detergency is obtained by an alkaline inorganic salt.
Owner:MIZ CO LTD
Corrosion inhibitor composition for magnesium or magnesium alloys
InactiveUS20180320271A1Reduce environmental problemsInhibiting the corrosion of such metalsAnodisationMetallic material coating processesMg alloysPhysical chemistry
The present invention relates to novel corrosion inhibitor compositions for magnesium or magnesium alloys and to a process for inhibiting the corrosion of such metals using such compositions. The corrosion inhibitor composition comprises a compound comprising a carboxyl group preventing the re-deposition of noble impurities which significantly decreases the corrosion rate by complexing said noble impurities, e.g. iron, nickel and copper.
Owner:HELMHOLTZ ZENT GEESTHACHT ZENT FUER MATERIAL UND KUESTENFORSCHUNG
Use of polypeptides
InactiveUS20190292493A1Prevention reductionReduce redepositionOrganic detergent compounding agentsDetergent mixture composition preparationMicrobiologyBiological membrane
The present invention relates to the use of a polypeptide having DNase activity for preventing biofilm on a textile, wherein said textile is unused or unworn. In another aspect, the present invention relates to a composition for preventing, reducing or removing biofilm and / or malodour, comprising a polypeptide having DNase activity and a malodour control component. In another aspect, the present invention relates to a method for preventing biofilm and / or the malodour formation on a textile.
Owner:NOVOZYMES AS
Environment-friendly phosphorus-free washing powder and preparation process thereof
ActiveCN111548866AImprove washabilityEnvironmentally friendlyInorganic/elemental detergent compounding agentsNon-ionic surface-active compoundsPhysical chemistrySodium silicate
The invention relates to an environment-friendly phosphorus-free washing powder and a preparation process thereof, and belongs to the technical field of washing powder. The environment-friendly phosphorus-free washing powder comprises the following components in parts by weight: 10-30 parts of AES; 20 to 40 parts of baking soda; 1-5 parts of sodium silicate; 1-5 parts of a maleic acid-acrylic acidpolymer; 20 to 50 parts of anhydrous sodium sulfate; 0 to 2 parts of CMC-Na; 0-10 parts of sodium percarbonate; 0 to 3 parts of JFC; and 0-3 parts of an additive; wherein sodium percarbonate is coated with a stabilizer for improving the stability of sodium percarbonate. The washing powder is more environment-friendly on the premise that the dirt-removing performance is guaranteed.
Owner:浙江美生日化用品有限公司
Detergent Compositions Comprising Metalloproteases
InactiveUS20160145540A1Promote resultsImprove propertiesBiochemical fibre treatmentNon-surface-active detergent compositionsProteinase activityPolynucleotide
The present invention relates to the use of and compositions comprising isolated polypeptides having protease activity and polynucleotides encoding the polypeptides. The invention also relates to cleaning compositions, and the use of the polypeptides in cleaning processes.
Owner:NOVOZYMES AS
Detergent composition comprising xanthan lyase and endoglucanase variants
PendingUS20210102184A1Extended half-lifeImprove stabilityDetergent mixture composition preparationDetergent compounding agentsGlucanaseBiochemistry
The present invention relates to a detergent composition comprising endoglucanase variants and xanthan lyase variants and methods for use of said compositions.
Owner:HENKEL KGAA
Cleaning compositions comprising enzymes
ActiveUS11414652B2Prevention reductionReduce redepositionHydrolasesDetergent compounding agentsHexosaminidase activityDNase activity
The present invention relates to compositions, methods and use of a mixture of enzymes having DNase activity and an enzyme having hexosaminidase activity.
Owner:NOVOZYMES AS
Spraying liquid bunch electrolysis-laser composite processing method and apparatus thereof
InactiveCN100388997CStrong glow dischargeAvoid generatingLaser beam welding apparatusElectrolysisLaser processing
The invention discloses a spraying liquid beam electrolytic-laser compound manufacturing method and device, which comprises the following steps: utilizing layer generating device to produce laser beam on the working piece, manufacturing hole, seam and groove, generating high-speed spraying liquid removing material with the same shaft of laser beam through spraying liquid beam device. The device contains layer, working piece assembling chuck, power and spraying liquid beam device, wherein the spraying liquid beam device concludes assembling seat of spraying device, insulating switching seat, cathode, focal lens, protective lens, insulating sleeve and sprayer.
Owner:NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
Neutral cellulase catalytic core and method of producing same
InactiveUS20090017162A1Maintain good propertiesReduce redepositionFungiBacteriaHigh level expressionCellulase
The present invention relates to the cloning and high level expression of novel cellulase proteins or derivatives thereof in the in a host cell. Further aspects of the present invention relate to transformants that express the novel cellulases, and expression vectors comprising the DNA gene fragments or variants thereof that code for the novel cellulases derived from Actinomycete using genetic engineering techniques. The present invention is also directed to novel cellulase compositions and methods of use therefore in industrial processes. In particular, the present invention is related to treating textiles with a novel cellulase derived from Actinomycete spp. The present invention also relates to the use of cellulase derived from Actinomycete spp. to enhance the digestibility of animal feed, in detergents, in the treatment of pulp and paper and in the production of starch and treatment of by-products thereof.
Owner:DANISCO US INC
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