12results about How to "Avoid mechanical stress" patented technology

The invention provides a drainage robot and an automatic drainage method thereof, and relates to the technical field of drainage robots, the drainage robot comprises a vehicle body, and an electric push rod is fixedly mounted on the top surface of the vehicle body. The submersible pump is driven by the electric push rod to vertically move, the submersible pump can be automatically placed in a water source, the pump does not need to be manually placed in the water source, the operation steps are simplified, the labor burden is relieved, and after drainage operation is completed, through cooperative work of the friction wheel, the friction disc and the sponge column component, the water drainage efficiency is improved. The surface of the submersible pump and a water inlet pore plate are automatically cleaned, stains on the surface of the pump and the pore plate can be effectively removed, the situation that normal work of equipment is affected or drainage performance is reduced due to dirt accumulation is avoided, the manual maintenance frequency of the equipment is reduced through the automatic cleaning function, the efficient operation state of the drainage equipment can be kept, and the service life of the drainage equipment is prolonged. And the service life of the equipment is prolonged, so that the long-term maintenance cost is reduced.

The invention relates to an environment-friendly process method for improving the surface metal cleaning efficiency of a silicon wafer, and belongs to the technical field of semiconductor silicon wafer processing, and the process method comprises the following operation steps: S1, pre-cleaning and activation: placing the silicon wafer in a first cleaning tank, introducing ozone into ultrapure water, and processing in cooperation with low-frequency ultrasound; and S2, main cleaning and complexing: placing the silicon wafer subjected to pre-cleaning and activating treatment in a second cleaning tank, and treating the silicon wafer in a dilute citric acid solution in cooperation with high-frequency ultrasound. And S3, overflow rinsing: placing the silicon wafer subjected to main cleaning and complexing treatment in a third cleaning tank. And S4, drying: carrying out drying treatment on the silicon wafer subjected to the overflow rinsing treatment. Through the synergistic effect of physical stripping, chemical oxidation and complexing dissolution, under the condition that highly toxic chemicals such as hydrofluoric acid are not used, the cleanliness of metal on the surface of the silicon wafer reaches the ppt level, and the problems that traditional RCA cleaning is serious in environmental pollution and high in operation risk are effectively solved.

The utility model discloses a regulating valve support structure for thermal energy source belongs to regulating valve support structure field, including installation bottom plate, the upper surface fixed connection of installation bottom plate has damping mechanism, the middle part of installation bottom plate upper surface is equipped with the A sliding slot of sliding connection support mechanism, the support mechanism is including A slider, the outer surface sliding connection of A slider is in the inside of A sliding slot, the upper surface fixed connection of A slider has A connecting plate, through the cooperation of above -mentioned each device, through the support mechanism of setting, when supporting regulating valve, according to the position and height of regulating valve will support mechanism adaptation adjustment, can accurately place support in the best position, ensure that regulating valve and its connecting pipeline get even and enough support, effectively avoid stress concentration problem, for the pipeline expansion caused by temperature change, adjustable support can provide necessary displacement space, prevent the additional mechanical stress produced thereby.

The invention relates to an online automatic flat film thickness adjusting die head and an adjusting method thereof.The online automatic flat film thickness adjusting die head comprises a front die body and a rear die body, and a melt runner is formed between the front die body and the rear die body; a front lip and a rear lip are respectively arranged at the lower ends of the front mold body and the rear mold body, a lip gap is formed between the front lip and the rear lip, and heating pipes are uniformly inserted in the front mold body and / or the rear mold body at intervals along the width direction of the flat film; by adjusting the temperature of the heating pipe in the corresponding area, the fluidity of the melt in the area is changed, and the thickness of the flat film flowing out of the area corresponding to the lip seam is adjusted. According to the invention, the local heating temperature is independently controlled, and the viscosity and fluidity of the melt in the corresponding area are changed, so that the discharging amount of the lip seam is finely adjusted to adjust the thickness of the flat film. The adjustment mode based on thermal expansion and rheological properties can realize continuous, stepless and trace thickness adjustment, and can effectively cope with production occasions with extremely high requirements on film thickness uniformity.

The invention discloses a quasi-real friction test bench of a radial plunger tilt cylinder hydraulic motor friction pair, which comprises a hydraulic loading system and a rack, and also comprises an eccentric shaft and a first servo motor which are arranged on the rack, and the eccentric shaft comprises an upper end fixing shaft and a lower end fixing shaft which are connected to the rack through respective rolling bearings; the lower end fixing shaft is coaxially connected with the first servo motor, the upper end fixing shaft and the lower end fixing shaft are coaxial, and the eccentric shaft further comprises an adjustable eccentric shaft with the distance between the axis and the axis of the fixing shaft adjustable. Two tilt cylinders needing to be subjected to a real friction test are symmetrically arranged on the rack; the device further comprises a micro swing angle generating mechanism used for simulating reciprocating swing friction between a radial plunger swing cylinder hydraulic motor crank and the swing cylinder. The quasi-real friction test bed is high in pertinence, can perform a quasi-real friction test on the radial plunger tilt cylinder hydraulic motor friction pair for a long time, and can obtain related data of friction performance of the radial plunger tilt cylinder hydraulic motor friction pair under different working conditions.

The invention discloses a component-limited insect culture medium containing nanoparticles, and relates to the technical field of culture medium preparation, and the component-limited insect culture medium is composed of saccharides, amino acids, inorganic salts, vitamins, organic acids and trace elements. The chemical component limited culture medium comprises 10-15 g / L of saccharides, 15-25 g / L of amino acid, 6.5-15.0 g / L of inorganic salt, 0.01-0.5 g / L of vitamins, 0.2-2.0 g / L of organic acid, 0.001-0.01 g / L of trace elements and nano-particles, and the mass of the nano-particles accounts for 0.01%-0.1% of the total mass of the culture medium. The culture medium is free of serum and animal source components, the nano-particles are added into the serum-free culture medium, higher batch stability is achieved, and the culture medium is suitable for large-scale production. The recovery and passage requirements of various insect cells can be met.

The invention discloses carbon dioxide near-dry fracturing equipment and a method thereof, and relates to the technical field of geology. Through the arrangement of the connecting part stabilizing mechanisms, the connecting parts of the pipelines are limited in the positioning rods on the two sides of the hollow pipe, the structural strength of the connecting parts is improved, the connecting parts can better resist mechanical stress caused by internal pressure changes, carbon dioxide is prevented from expanding when being transmitted through the pipelines, and the service life of the pipelines is prolonged. The internal pressure rise causes larger separating force to the joint, and the force can be effectively counteracted through the limitation of the positioning rod on the pipeline, so that the connection stability is ensured, the joint is effectively protected, the joint is ensured not to loosen or leak under high pressure difference, leakage and accidents are reduced, and the service life of the pipeline is prolonged. And furthermore, the hollow pipe is arranged in a hollow mode and is relatively light, the installation convenience of the stabilizing mechanism at the connecting position is improved, the stabilizing mechanism is easier to disassemble and replace in the subsequent maintenance process, and the maintenance time and cost are reduced.

The application discloses a kind of electrochemical auxiliary ohmic contact wafer resistivity nondestructive testing equipment and nondestructive testing method, the electrochemical auxiliary ohmic contact wafer resistivity nondestructive testing equipment includes: shell, two probes, first electrolyte and integrated control system;The cavity is formed in the shell, the insulating clamp is equipped in the shell, the insulating clamp is used to clamp the sidewall of the wafer to be measured, to fix wafer;Two probes are respectively arranged at the upper and lower ends of wafer;And the probe is spaced apart from wafer, and the probe is formed with flow port;The first electrolyte is located between probe and wafer;The flow port is used to flow the first electrolyte to between probe and wafer;The integrated control system has positive and negative poles, and the positive and negative poles of integrated control system are respectively connected with two probes.The application has the advantages of avoiding damaging wafer while saving process steps, improving detection efficiency.

The invention discloses a method for manually stripping an In column of an 8-inch reading circuit. The method comprises the following steps: putting a low-corrosivity organic solvent into a specially designed quartz soaking tank to remove photoresist; fixing an 8-inch reading circuit chip on a special clamp, holding a clamp handle by hand to vertically place the clamp and the chip into the quartz soaking tank, and enabling the chip to be completely immersed in the stripping liquid; inclining the clamp towards one surface with the reading circuit, wherein the front surface of the reading circuit faces downwards; after soaking for 4 hours, a medical injector is used for sucking stripping liquid to spray and wash the edge of the front surface of the reading circuit on the clamp, so that In on the surface is bulged and is separated from the chip, and tweezers are used for clamping away the bulged In; after stripping is completed, the front face and the back face of the reading circuit are washed; finally, putting the chip into a drying oven, and drying at 100 DEG C for 10 minutes; scratch and deformation of the In column are obviously reduced, and stripping efficiency and yield are improved. Through inclined clamp design and pressure control, In particle falling and mechanical stress are avoided.

The utility model discloses a double -sided marking device, including base, be provided with feeding mechanism and discharging mechanism on the base, be provided with conveying mechanism between feeding mechanism and discharging mechanism, still be provided with adjusting mechanism positioning device and reset mechanism along the conveying direction of conveying mechanism on the base, be provided with marking mechanism between positioning device and reset mechanism, the utility model has the beneficial effect that through feeding and discharging and conveying mechanism, realize full -automatic marking, reduce manual intervention, utilize laser to directly carve on material surface, make the mark have wear -resisting, corrosion -resistant and so on The advantage compares with traditional marking mode and need not ink or chemical reagent, and the mark is not easy to fade or fall off, reduces environmental pollution, meets the environmental protection requirement, and laser marking speed is fast, can promote the marking efficiency, and laser carries out marking, need not direct contact material, can avoid mechanical stress, reduces material deformation or damage.

The present invention provides a method for preparing a nickel-cobalt nanowire electrode material capable of achieving high mass loading, belonging to the technical field of supercapacitor electrode materials. The method comprises: 2 6H 2 O and CoCl 2 6H 2 O was dissolved in deionized water and then dispersed by ultrasonic and mixed with the prepared NaBH 4 The solutions are mixed, reacted under an external AC magnetic field and a certain temperature, and then a black powder sample is obtained by magnetic separation technology. Finally, after washing and drying, a nickel-cobalt nanowire electrode material with high mass loading is obtained. The preparation method of the present invention is simple to operate. By dynamically adjusting the direction and intensity of the magnetic field, the arrangement of the nanowires can be precisely controlled, making the synthesized nanowire structure more uniform and regular, reducing the curvature of the material, and thus significantly improving the wettability of the electrolyte. The material we prepared has a mass loading of 10 mg cm ‑2 It still has excellent electrochemical properties, and is further moving towards electrode materials that meet the needs of actual production and industrialization.

The invention belongs to the technical field of photovoltaic panels, and discloses a photovoltaic panel reflector capable of being automatically adjusted according to the illumination angle and an adjusting method.The photovoltaic panel reflector comprises a supporting plate, a driving assembly and a rectangular plate are fixedly mounted at the upper end of the supporting plate, and a mounting plate is fixedly mounted at the top of the driving assembly; a photovoltaic panel body is hinged to the top of the mounting plate, and an illumination detector is fixedly mounted at one end of the mounting plate. Through cooperation of structures such as a fixed part and a movable block, the situation that a photovoltaic panel can be adjusted according to the illumination angle is achieved, a control system starts a driving motor, the driving motor drives a gear to rotate, and meanwhile, a connecting plate is driven to move; the connecting plate drives the connecting piece and the moving block to rotate in the inner wall of the fixing piece, the moving block drives the mounting plate and the photovoltaic panel body to rotate, and when the mounting plate and the photovoltaic panel body rotate, the angle of the photovoltaic panel body is adjusted.