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94results about How to "Error tolerance" patented technology

Method and arrangement for controlling access to sensitive data stored in an apparatus, by another apparatus

In a method and arrangement for control of the access to sensitive data stored in a first apparatus a first user of a first apparatus is notified of an access by the second apparatus to sensitive data stored in the first apparatus, and the notification is transmitted to the second apparatus. A first unique identification of the first user is requested by the first apparatus. A second unique identification of a second user of the second apparatus by the second apparatus. A check of the constellation (acquired via the requests) of the first and second users is made using a predetermined association file, the association file associating one or more allowed second users with each first user. Enablement of access of the second apparatus to the sensitive data stored in the first apparatus is prevented when the check of the association establishes an allowed constellation of first and second users. Access of the second apparatus to the sensitive data stored in the first apparatus is prevented when the check of the association establishes no allowed constellation of first and second users or access of the second apparatus to the sensitive data stored in the first apparatus has not been declared by the first user.
Owner:SIEMENS HEALTHCARE GMBH

Method for producing a double-layer or triple-layer sound-absorbing panel and corresponding sound-absorbing panel

A method for producing a double-layer or triple-layer sound-absorbing panel (10) is specified, said panel consisting of a support panel (20) and at least one cover panel or coating (30, 35) of the support panel (20), the cover panel or coating (30, 35) being fixedly connected to the support panel (20). In this case, an open-pore (121) support panel is provided as the support panel (20) and the sound-absorbing panel (10) is arranged on each side (12, 13) provided with a cover panel or coating (30, 35) with a device opposing said side emitting a laser beam, the upper face (12) of said panel (10) being subjected to the laser beam, which is designed to burn away material from the cover panel or coating (30, 35) facing said laser beam over the depth in the direction of the laser beam in a plurality of holes (31). In this case, the laser beam acting on the panel (10) is designed such that the waist of the laser beam is focused on a plane parallel to the lower face of the cover panel or top layer (30, 35) such that the holes (31) are continuous through the cover panel or top layer (30, 35), and a lower hole opening / hole end (33) is produced in the support panel (20) itself so that the surroundings are connected to the open-pore support panel (20) via an air connection (121).
Owner:AKUSTIK & INNOVATION

Method and apparatus for measuring scattered light on an optical system

ActiveUS20100208254A1Meaningful scattered light measurement resultsEfficient processRadiation pyrometrySpectrum investigationReference structureOptic system
A method of measuring scattered light on an optical system includes: providing a first measuring field and a second measuring field, both measuring fields respectively being either of a first light manipulation type or a second light manipulation type, which first light manipulation type is configured to cause incoming light to enter the optical system and which second light manipulation type is configured to prevent incoming light from entering the optical system, and both measuring fields respectively having a second light manipulation type reference structure and a respective measuring structure, which measuring structures are of the second light manipulation type in the case where the measuring fields are of the first light manipulation type, and are first light manipulation type regions of the measuring fields in the case where the measuring fields are of the second light manipulation type, wherein the measuring structures of the respective measuring fields are offset in different directions in relation to the respective reference structure, imaging the first measuring field with the optical system into an image plane and measuring a first light intensity produced herewith at a location in the region of the image of the reference structure of the first measuring field, and imaging the second measuring field with the optical system into the image plane and measuring a second light intensity produced herewith at a location in the region of the image of the reference structure of the second measuring field.
Owner:CARL ZEISS SMT GMBH
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