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44results about How to "Impart stability" patented technology

Glenoid component installation procedure and tooling for shoulder arthroplasty

A method for implanting a glenoid component during shoulder arthroplasty is disclosed. In the method, a template is placed against a surface of a glenoid cavity of a scapula, and a bone marking tool is inserted through a cut-out guide in the template. The bone marking tool is used to create a bone mark on the surface of the glenoid cavity. A drill is aligned with the bone mark and a first pilot hole is drilled in the surface of the glenoid cavity. A locating pin of a first drill jig is placed in the first pilot hole, and a drill is inserted through a guide hole of the first drill jig to drill a second pilot hole in the surface of the glenoid cavity. Bone material is removed between the first pilot hole and the second pilot hole to create a slot in the surface of the glenoid cavity between the first pilot hole and the second pilot hole. A keel of a glenoid component is positioned in the slot, and the glenoid component is secured in the scapula. A kit is also provided for use with the method. The kit includes a glenoid component including a body having a first articulating surface and a second surface opposite the first articulating surface. The first articulating surface is dimensioned for engaging a head of a humerus or a humeral implant. The second surface is dimensioned for being secured to a scapula. The glenoid component further includes a keel extending away from the second surface. The kit also includes a transparent template having a cut-out guide dimensioned to receive a bone marking tool. The template preferably has an indication of a centerline of the template. The kit also includes a first drill jig having a locating pin and a guide hole dimensioned to receive a drill bit, and a cutting tool having a follower pin and a cutting surface.
Owner:THE GENERAL HOSPITAL CORP

Toner for developing electrostatic images

The present invention is to provide a toner which can maintain a desired function of an external additive (a function to impart charge stability and flowability to the toner) under a severe usage environment such as high temperature and high humidity (H/H), which has an excellent initial charging speed, which has stable charging ability and flowability over time, which maintains reproducibility of thin lines and is unlikely to cause a deterioration in image quality due to fog or the like even after a large number of prints are continuously printed, and which has excellent printing durability. Also, the present invention is to provide a toner for developing electrostatic images, comprising external additives, and colored resin particles comprising a binder resin and a colorant, wherein the external additives contain external additive A and external additive B, wherein external additive A is fatty acid metal salt particles, and a content of the fatty acid metal salt particles is in the range from 0.01 to 0.5 part by weight with respect to 100 parts by weight of the colored resin particles, and wherein external additive B is spherical colloidal silica particles having a number average primary particle diameter of 30 to 80 nm and being surface-treated with a silane compound having an alkyl group of 8 to 20 carbons, and a content of the spherical colloidal silica particles is in the range from 0.3 to 2.0 parts by weight with respect to 100 parts by weight of the colored resin particles.
Owner:ZEON CORP

Solvent-resistant asymmetric hollow fiber gas separation membrane, and method for production thereof

An asymmetric hollow fiber gas separation membrane obtained by subjecting an asymmetric hollow fiber polyimide membrane to a heat treatment having a maximum temperature of from 350 to 450° C., wherein the asymmetric hollow fiber polyimide membrane is formed with a polyimide essentially having a repeating unit represented by a general formula (1);
is excellent in a solvent resistance and a thermal stability, and as well has such a mechanical strength that a tensile elongation at break is not less than 10% as a hollow fiber membrane. In the general formula (1), 20 to 80 mol % of A is a tetravalent unit based on a biphenyl structure represented by formula (2), 20 to 80 mol % of A is a tetravalent unit based on a diphenylhexafluoropropane structure represented by formula (3), and 0 to 30 mol % of A is a tetravalent unit based on a phenyl structure represented by formula (4); and in the general formula (1), 30 to 70 mol % of R is a divalent unit represented by formula (5) and/or formula (6), and 30 to 70 mol % of R is a divalent unit having one or two other aromatic rings than formula (5) or (6),
    • wherein, R1 and R2 are a hydrogen atom or an organic group, and n is 0, 1 or 2,
    • wherein, R1 and R2 are a hydrogen atom or an organic group, X is —CH2— or —CO—, and n is 0, 1 or 2.
Owner:UBE IND LTD

Solvent-resistant asymmetric hollow fiber gas separation membrane, and method for production thereof

An asymmetric hollow fiber gas separation membrane obtained by subjecting an asymmetric hollow fiber polyimide membrane to a heat treatment having a maximum temperature of from 350 to 450° C., wherein the asymmetric hollow fiber polyimide membrane is formed with a polyimide essentially having a repeating unit represented by a general formula (1);is excellent in a solvent resistance and a thermal stability, and as well has such a mechanical strength that a tensile elongation at break is not less than 10% as a hollow fiber membrane. In the general formula (1), 20 to 80 mol % of A is a tetravalent unit based on a biphenyl structure represented by formula (2), 20 to 80 mol % of A is a tetravalent unit based on a diphenylhexafluoropropane structure represented by formula (3), and 0 to 30 mol % of A is a tetravalent unit based on a phenyl structure represented by formula (4); and in the general formula (1), 30 to 70 mol % of R is a divalent unit represented by formula (5) and / or formula (6), and 30 to 70 mol % of R is a divalent unit having one or two other aromatic rings than formula (5) or (6),wherein, R1 and R2 are a hydrogen atom or an organic group, and n is 0, 1 or 2,wherein, R1 and R2 are a hydrogen atom or an organic group, X is —CH2— or —CO—, and n is 0, 1 or 2.
Owner:UBE IND LTD
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