84results about How to "Reduce interconnection" patented technology

A micro electro-mechanical (MEMS) device assembly is provided. The MEMS device assembly includes a first substrate that has a plurality of electronic devices, a plurality of first bonding regions, and a plurality of second bonding regions. The MEMS device assembly also includes a second substrate that is bonded to the first substrate at the plurality of first bonding regions. A third substrate having a recessed region and a plurality of standoff structures is disposed over the second substrate and bonded to the first substrate at the plurality of second bonding regions. The plurality of first bonding regions provide a conductive path between the first substrate and the second substrate and the plurality of the second bonding regions provide a conductive path between the first substrate and the third substrate.

A package stack has at least two packages of area array types (AAT), each having connecting pads. A flexible cable having conductive patterns is provided between the AAT packages and electrically connected to the connecting pads of the packages.

A three-dimensional semiconductor memory device having the object of decreasing the interconnection capacitance that necessitates electrical charge and discharge during data transfer and thus decreasing power consumption is provided with: a plurality of memory cell array chips, in which sub-banks that are the divisions of bank memory are organized and arranged to correspond to input/output bits, are stacked on a first semiconductor chip; and interchip interconnections for connecting the memory cell arrays such that corresponding input/output bits of the sub-banks are the same, these interchip interconnections being provided in a number corresponding to the number of input/output bits and passing through the memory cell array chips in the direction of stacking.

A method for forming a copper interconnection structure includes the steps of forming an opening in an insulating layer, forming a copper alloy layer including a metal element on an inner surface of the opening, and conducting a heat treatment on the copper alloy layer so as to form a barrier layer. An enthalpy of oxide formation for the metal element is lower than the enthalpy of oxide formation for copper. The heat treatment is conducted at temperatures ranging from 327° C. to 427° C. and for a time period ranging from 1 minute to 80 minutes.

In one embodiment of the present invention, a unit circuit of a shift register includes a bootstrap circuit configured with a transistor T1, a transistor T2 and a capacitor, a transistor T3, a transistor T4, and a reset signal generation circuit. By use of two-phase clock signals whose high level periods do not overlap with each other, the reset signal generation circuit generates a reset signal which is at a high level in a normal state and changes to a low level when an input signal turns into the high level. During a period that the reset signal is at the high level, transistors perform discharge of a node and pull-down of an output signal. Thus, it is possible to obtain a shift register which performs discharge of a node and pull-down of an output signal and achieves a small area and low power consumption without using an output signal from a subsequent circuit.

A Thin Film Transistor (TFT) reduces interconnection resistance of source/drain electrodes, prevents contamination from an active layer, reduces contact resistance between a pixel electrode and the source/drain electrodes, smoothly supplies hydrogen to the active layer and has high mobility, on-current characteristics, and threshold voltage characteristics The TFT includes an active layer having a channel region and source/drain regions, a gate electrode supplying a signal to the channel region, source/drain electrodes respectively connected to the source/drain regions and including at least one of Ti, a Ti alloy, Ta, and a Ta alloy; and an insulating layer interposed between the source/drain electrodes and the active layer and including silicon nitride.

An improved microelectronic assembly (100) and packaging method includes a device package for housing a semiconductor die or chip, (105), an array of passive electronic components (305-355) operating in cooperation with the flip chip semiconductor die (105) and housed inside the device package to decouple noise from input signals, and a heat spreader (195) disposed between a top surface of the semiconductor die (105) and a package cover (185). The semiconductor die (105) is configured as a flip chip die and the device package includes a package substrate (110) configured as a ball grid array. The improved microelectronic device (100) reduces parasitic inductance in electrical interconnections between the semiconductor die and an electrical system substrate (115) and reduces signal noise in mixed signal high frequency analog to digital converters operating at clock rates above 1 GHz.

The invention provides a semiconductor device and a forming method, a starting circuit and a switching power source of the semiconductor device. The switching power source comprises the starting circuit. The semiconductor device comprises a P-type semiconductor substrate, an N-type drift region, an oxide layer, an intrinsic polycrystalline silicon layer, a doping polycrystalline silicon layer and a metal plug, wherein a source electrode and a drain electrode of a negative threshold field-effect tube are arranged at the two ends of the N-type drift region, the source electrode and the drain electrode are exposed out of the oxide layer, the intrinsic polycrystalline silicon layer is arranged at one end, close to the source electrode, of the oxide layer, and the doping polycrystalline silicon layer is arranged at one end, close to the drain electrode, of the oxide layer. The intrinsic polycrystalline silicon layer and the oxide layer form a grid electrode of the negative threshold field-effect tube, the doping polycrystalline silicon layer forms a resistor connected with the grid electrode, and the metal plug is connected with the drain electrode of the negative threshold field-effect tube and is adjacent to the doping polycrystalline silicon layer. In the semiconductor device, the resistor connected with the drain electrode and the grid electrode of the negative threshold field-effect tube is formed at the position, arranged between the drain electrode and the grid electrode, of the semiconductor substrate and shares the metal plug with the drain electrode, the area of a chip is saved, metal interconnection is reduced through port sharing, and the reliability of the semiconductor device is improved.

A substrate processing apparatus has a plating apparatus configured to plate a substrate to deposit a metal on a surface of the substrate and an additional process apparatus configured to perform an additional process on the substrate. The plating apparatus has a substrate placement stage on which the substrate to be transferred to the additional process apparatus is placed. The additional process apparatus has an additional process unit configured to perform the additional process on the substrate and a substrate transfer device operable to transfer the substrate between the substrate placement stage of the plating apparatus and the additional process unit. The substrate processing apparatus can perform an additional process in addition to a plating process without lowering a throughput of the apparatus and can upgrade the additional process at a low cost.

The present invention is a method for manufacturing a semiconductor device having a conductor and an insulating film on a substrate, the method including the steps of forming the conductor on the substrate, forming the insulating film on the conductor, removing the insulating film on the conductor, and blowing an organosilane gas and a hydrogen gas to reduce an oxidized region on the conductor, wherein the oxidized region on the conductor is formed when the insulating film is removed.

The invention relates to a method, call setup device (10) and computer program product for controlling telephone call setup for an associated user and having access to different communication networks. The call setup device (10) comprises a data receiving unit (52) receiving a first data message (DM1) from the user comprising callee identifying information and user identifying information, and a control unit (48) having access to call placing units (12, 14, 58), each connected to corresponding networks (24/32) and providing telephone call setup via these networks. The control unit analyses the callee and user identifying information, determines a preferred call setup scheme based on said analysis, orders a call placing unit to set up a first telephone call to a user terminal, orders a call placing unit to set up a second telephone call to a callee terminal, and orders an interconnection of the first and the second call.

A new method and package is provided for the mounting of semiconductor devices that have been provided with small-pitch Input/Output interconnect bumps. Fine pitch solder bumps, consisting of pillar metal and a solder bump, are applied directly to the I/O pads of the semiconductor device, the device is then flip-chip bonded to a substrate. Dummy bumps may be provided for cases where the I/O pads of the device are arranged such that additional mechanical support for the device is required.

A new method and package is provided for the mounting of semiconductor devices that have been provided with small-pitch Input/Output interconnect bumps. Fine pitch solder bumps, consisting of pillar metal and a solder bump, are applied directly to the I/O pads of the semiconductor device, the device is then flip-chip bonded to a substrate. Dummy bumps may be provided for cases where the I/O pads of the device are arranged such that additional mechanical support for the device is required.

The invention provides an inventory replenishment scheduling method and system, and the method comprises the steps: analyzing the stock amount of a store in the next month according to the recorded actual sales volume of the store and the current stock of the store and a distribution warehouse; after a purchasing center confirms the influence of a fluctuation factor on the next month stock amount,summarizing a month reservation order and generating a headquarters purchasing month reservation order; and enabling the purchasing center to export the month reservation order to a supplier, so thata central warehouse dispatches and distributes the month reservation order according to the month purchasing order of the supplier. By means of the scheme, the problem that deviation is likely to exist in manual intervention in the existing replenishment scheduling process is solved, manual intervention can be reduced, and it is guaranteed that the replenishment scheduling process is reasonable,efficient and accurate.

A 3D semiconductor device including: a first die, comprising a first die area and a plurality of first die top contacts; a second die, comprising a second die area and a plurality of first bottom contacts; and a third die, comprising a third die area and a plurality of second bottom contacts, wherein said first die area is greater than the sum of said second die area and said third die area, wherein said second die and said third die are both placed on top of said first die laterally with respect to each other, wherein said plurality of first bottom contacts are connected to said first die top contacts, and wherein said plurality of second bottom contacts are connected to said first die top contacts.

Provided are a method of fabricating a microlens using selective etching of a compound semi-conductor and a method of fabricating a photoelectric device having the microlens. The formation of the microlens includes patterning a compound semiconductor layer and removing a lateral surface of the compound semiconductor layer to form a roughly hemispheric lens. The lateral surface of the compound semiconductor layer is removed by a digital alloy method. In particular, the lateral surface of the compound semiconductor layer is removed by a wet etching process.