The invention provides a control equipment for an atomic layer deposition instrument. The control equipment comprises a single-chip microcomputer control system, a temperature control module and a protection module, wherein the single-chip microcomputer control system comprises a single-chip microcomputer, a program input unit, a time control unit, a signal control unit, a performing unit and a display unit, the program input unit, the time control unit, the signal control unit and the display unit are respectively connected with the single-chip microcomputer, an output end of the signal control unit is connected with a performing element through the performing unit, the temperature control module is connected with the single-chip microcomputer and the performing element, and the protection module comprises a temperature protection unit connected with the single-chip microcomputer and a power-off protection unit. Through the control equipment, complexity in employing multistage indirect control performing units of a computer or an industrial control computer can be avoided, onsite control is realized by directly employing the single-chip microcomputer, the atomic layer deposition instrument taking the control equipment as core has functions of fixed-time controllable pumping of precursors in various types, system temperature, overheating and power-off protection and alarming, and thereby manufacturing cost is greatly reduced.