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5 results about "Carbon Dioxide Snow" patented technology

Carbon dioxide snow the solid formed by rapid evaporation of liquid carbon dioxide, giving a temperature of about −79°C (−110°F). It has been used in cryotherapy to freeze the skin, thus producing local anesthesia and arrest of blood flow.

Dry carbon dioxide snow cleaning system

This utility model belongs to the field of dry cleaning technology and discloses a dry carbon dioxide snowflake cleaning system. It includes a liquid carbon dioxide unit, a compressed gas unit, and a nozzle. The liquid carbon dioxide unit provides a stable supply of liquid carbon dioxide. The compressed gas unit includes a first compressed gas supply component, a first switching valve, and a heating element. Along the flow direction of the compressed gas, the first compressed gas supply component, the first switching valve, and the heating element are sequentially connected. The nozzle is provided with a first inlet, a second inlet, and a cleaning port. The liquid carbon dioxide unit is connected to the first inlet via a first pipe, and the heating element is connected to the second inlet via a second pipe. The cleaning port is connected to both the first and second inlets, allowing liquid carbon dioxide and compressed gas to be sprayed from the cleaning port to clean the surface of the part to be cleaned. The dry carbon dioxide snowflake cleaning system provided by this utility model saves energy and improves the service life of the heating element.
Owner:盛欣科智能装备(江苏)有限公司

A nozzle assembly for carbon dioxide snow cleaning

The utility model discloses a nozzle assembly for carbon dioxide snow cleaning, which comprises a spray seat, a carbon dioxide inlet connecting hole, an auxiliary gas inlet hole and a spray connecting hole are arranged on the spray seat, and a first channel and a second channel are further arranged in the spray seat; a carbon dioxide inlet joint is detachably connected with the carbon dioxide inlet connecting hole; a nozzle is detachably connected with the spray connecting hole at one end, and a spray hole is arranged at the other end of the nozzle; a core pipe is arranged in the first channel and the spray channel, and an auxiliary gas ejection gap is arranged between the core pipe and the inner wall of the spray hole. Liquid carbon dioxide enters from the carbon dioxide inlet joint and is converted into carbon dioxide snow particles in the carbon dioxide conversion channel in the core pipe, which are sprayed out; the auxiliary gas flows from the outside of the core pipe to the spray channel of the nozzle, and the carbon dioxide snow particles sprayed out by the core pipe are shot at the surface of the object to be cleaned by the auxiliary gas. The nozzle assembly has a simple structure and is easy to process, assemble, use and maintain.
Owner:佛山微迈科技有限公司

Semiconductor package cleaning device based on carbon dioxide snow jet

PendingCN122161363ASemiconductor packageDry ice
The application relates to the technical field of semiconductor package cleaning equipment, in particular to a semiconductor package cleaning device based on carbon dioxide snow jet, which comprises a tool seat, wherein a negative pressure channel is arranged on the tool seat; a middle frame is arranged above the tool seat, and a negative pressure sewage outlet is arranged around the middle frame; a top frame is detachably arranged on the top of the middle frame, a lifting seat is arranged on the top frame, an air uniformizing cavity is arranged in the side wall around the lifting seat, the input hole of the air uniformizing cavity is upwardly penetrated through the lifting seat, connected with the output end of a dry ice cleaning machine through a pipeline, the output hole of the air uniformizing cavity is transversely penetrated through the side wall around the lifting seat and is connected with a nozzle, the tool seat, the middle frame and the top frame are combined to form a closed cleaning cavity in the inside, and the lifting stroke of the lifting seat is greater than the sum of the height of the middle frame and the top frame. The application is favorable for solving the problems that some existing semiconductor packages are not provided with suitable stain recycling structures in the cleaning process, secondary pollution is easily caused, and cleaning operation seriously relies on artificial operation and the automation degree is low.
Owner:XIAMEN JUNMO CORE SEMICON CO LTD

Snow cleaning system

The utility model belongs to the technical field of industrial cleaning, and discloses a snow cleaning system which comprises a controller, a hose, an air pipe, an electromagnetic valve, a throttling valve and a cleaning nozzle, two ends of the hose are respectively communicated with the controller and the electromagnetic valve and used for conveying liquid carbon dioxide, and two ends of the air pipe are respectively communicated with the controller and the cleaning nozzle and used for conveying compressed air. The electromagnetic valve, the throttling valve and the cleaning nozzle are sequentially connected, the liquid carbon dioxide can be subjected to phase change in the cleaning nozzle to form snowflake-shaped carbon dioxide, the snowflake-shaped carbon dioxide and the compressed air can be mixed to form mixed snowflake-shaped fluid, and the mixed snowflake-shaped fluid can be sprayed out through a spraying head of the cleaning nozzle. By controlling the conveying proportion of the compressed air and the carbon dioxide, the proportion of the mixed snowy fluid can be changed, so that the cleaning effect is guaranteed at the moment, meanwhile, the use of the carbon dioxide is correspondingly reduced, the application range is expanded, the whole structure is simple, the operation is convenient, and the safety and the stability in the operation process can be effectively improved.
Owner:SHANGHAI PANYUNHUI INTELLIGENT TECHNOLOGY CO LTD

An on-line full-automatic semiconductor cleaning device

The application discloses an online full-automatic semiconductor cleaning device, and relates to the technical field of semiconductor cleaning, which comprises a rack, double cleaning chambers arranged on the rack, vacuum chuck mechanisms and carbon dioxide snow cleaning mechanisms arranged on the inner sides of the two double cleaning chambers, and two anti-recontamination assemblies. A high-speed airflow dynamic isolation barrier composed of directional airflow is formed between the spray head and the cleaned area and the uncleaned area by the air wall element, so that the pollutants are blocked from flying to the cleaned area, and the dispersed pollutants are actively guided and gathered to a specific collection position for effective capture. For the area that is difficult to cover by the exhaust system, the air wall provides local enhanced airflow control to compensate for the limitations of the fixed exhaust system, greatly reduces the recontamination risk, and reduces the phenomenon of post-circuit short circuit or open circuit and damage to the precision structure caused by the unqualified surface cleanliness after cleaning.
Owner:CORE CORE (SUZHOU) SEMICON TECH CO LTD