2 results about "Intensity function" patented technology

An overlay metrology system is disclosed. The overlay metrology system may include a controller having one or more processors. The processor may be configured to execute program instructions to cause the processor to receive a pupil image of collected light from an overlay target and to receive a known phase distribution of an illumination beam to be introduced to the overlay target. The processor may model an intensity function related to the pupil image, the known phase distribution, and one or more eccentricity shift parameters of a structure of the overlay target. The processor may fit the pupil image to the intensity function that depends on the known phase distribution and the eccentricity shift parameter. The processor may generate overlay measurements based on the fit.

A learning method to be executed by a computer according to one embodiment includes of acquiring event history information representing a history of a predetermined event; and training, by using the acquired event history information, parameters of an intensity function in which a trigger function is set to be a function represented by a composite function of a first function and a predetermined second function; and a derivative of the first function, the first function being represented by a neural network that models a temporal change in influence of the event.